Equipment List

Lithography

Electron Beam Lithography

• Raith EBPG 5000+ (100 kV)
• Raith EBPG 5200 (100 kV)
• Quanta 200F SEM with NPGS (1-30 kV)

Ion Beam Lithography

• Zeiss ORION NanoFab (5-40 kV He & Ne, 1-30 kV Ga)

Photolithography

• Contact Mask Aligners: Suss Microtech models MA/BA6 & MA6/BA6
• i-Line Wafer Stepper: GCA model 6300
• Direct-Write Laser System: Heidelberg Instruments DWL-66
• Two-Photon Lithography (3D printing): Nanoscribe Photonic Professional GT

Deposition Equipment

Evaporation

• Kurt J Lesker Labline (Al, Au, Pt, Ti)
• CHA Industries Mark 40 (Metals & Oxides)
• Leica EM ACE600 Carbon Evaporator

Sputtering

• Dielectric Sputterer: AJA International ATC Orion 8
• Chalcogenide Sputterer: AJA International ATC Orion 5

Plasma- & Thermal-Enhanced Deposition

• Atomic Layer Deposition (ALD): Oxford Instruments FlexAL II
• Plasma-Enhanced Chemical Vapor Deposition (PECVD): Oxford Instruments System 100 PECVD
• Tube Furnaces: Tystar Tytan (Wet & Dry Oxidation and Annealing)