Process Recipe Library

You can browse the available recipes below, by lab area. You can also browse directly within the KNI's Box directory. Note that the vast majority of recipes are being made publicly available; only a select few are password-protected for members of the Caltech community:

1. All Content (requires login with a caltech.edu email address)
2. Publicly available content (no login required)

Lithography Process Recipes

Electron Beam Lithography

• Meeting for Advanced EBeam Lithography (MAEBL) MAEBLpedia - no login required
• KNI Introduction to BEAMER
• How to Spin Photoresist onto Wafers and Pieces (Video)
• ZEP 520A Resist: Procedure for spinning, writing & development (Caltech-only access)
• HSQ Resist: Procedure for spinning, writing & development (Caltech-only access)
• Performing Aligned EBL Patterning Steps with NPGS on an SEM | Alignment Template Files
• Bi-Layer PMMA Resist Spinning Recipe
• ma-N Chrome Mask Writing/Etching Recipe

Helium Ion Beam Lithography

• Helium Ion Beam Lithography (HIBL) – Parameter Guide

Neon Ion Beam Lithography

• Ne-FIB Hard Mask Lithography on ALD Films – Parameter Guide

Optical Lithography

• AZ5214 Photoresist Recipe
• Suss Mask Aligner - Double Side Alignment using AZ5214 Resist
• AZ9260 Photoresist Recipe
• AZ nLof 2000 Photoresist Recipe
• NR9-1000PY Photoresist Recipe
• S1813 Photoresist Recipe
• SU-8 Photoresist Recipe
• Lift-Off with LOR7B & S1805 Photoresist Recipe

Deposition Process Recipes

Sputtering

• SnO₂ sputtering recipe
• NbO_x sputtering recipe
• TiO₂ sputtering recipe
• AlN sputtering recipe
• Al₂O₃ sputtering recipe
• Guide to maintaining a plasma using gradual pressure changes

Chemical Vapor Deposition (CVD)

• PECVD amorphous Si recipe
• PECVD SiO2 (350 C) recipe

Etching Process Recipes

Dry Etching

• Aluminum Etch via Chlorine/Methane/Hydrogen
• Comparison of etch rates using different sample-fixing oils
• In-situ (dielectric sputter) RF plasma etch of thermal SiO2
• Comparison of Pseudo-Bosch ICP-RIE Etch of SiO2-SiNx
• Al2O3 Etch in Oxford ICP and Plasmatherm RIE

Wet Etching

• HF etching of SiO2 deposited via wet thermal oxidation
• HF etching of SiO2 deposited via PECVD

Microscopy Process Recipes

Focused Ion Beam (FIB) Systems

• Cutting & Imaging Cross-sections with SEM/Ga-FIB
• Preparing TEM Lamella Samples with SEM/Ga-FIB
  • Process Recipe for TEM Lamella prep for Thin Films on Si Substrates
• Helium Ion Beam Lithography (HIBL) – Parameter Guide
• Ne-FIB Hard Mask Lithography on ALD Films – Parameter Guide
• Helium Ion Beam Imaging with the Electron Flood Gun – Parameter Guide
• Source Rebuild Guide for ORION NanoFab He- & Ne-FIB

Scanning Electron Microscopes (SEMs)

• Environmental SEM (ESEM) Imaging Guide (for biological and highly non-conductive specimens)
• Performing Aligned EBL Patterning Steps with NPGS on an SEM | Alignment Template Files

Transmission Electron Microscopes (TEMs)

• STEM mode EDS on TF-20 TEM (emphasis on high-resolution 2D mapping)
• Procedure to Evaluate Selected Area Electron Diffraction (SAED) Patterns
  • All Resources for SAED Evaluation, including DPs captured of standard samples

Thermal Processing

Wet Oxidation

• Wet Oxidation at 1000C on Tystar Tube Furnaces

Multi-Technique Fabrication Processes

• Si-W notched nanopillar fabrication