ORION NanoFab: Helium, Neon & Gallium FIB

ORION NanoFab File:Image1.jpg Instrument Type Microscopy Techniques High-Resolution He Imaging, He/Ne/Ga-FIB Etching He & Ne Ion Lithography Cross-sectioning Staff Manager Matthew S. Hunt, PhD Staff Email matthew.hunt@caltech.edu Staff Phone 626-395-5994 Reserve time on FBS Request training via FBS User Dashboard Lab Location BXXX Steele Lab Phone 626-395-1548 Manufacturer ZEISS (Carl Zeiss AG) Model {{{Model}}} File:Image2.jpg

Description

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SEM Applications

• Ultra-High-Resolution Imaging (Immersion Mode)
• High-Resolution Imaging (Field-Free Mode)
• Secondary Electron (SE) & Backscattered Electron (BSE) Imaging
• Everhart-Thornley Detector (ETD) & Through-the-Lens Detector (TLD)
• Platinum deposition via Gas Injection System (GIS)

Ga-FIB Applications

• Directly etch patterns into material
• Cutting & Imaging Cross-Sections
• TEM Lamella Sample Preparation using an Omniprobe for Liftout
• Platinum & SiO_x deposition via GIS
• Enhanced etch with XeF₂ via GIS
• Automated patterning with RunScript program & AutoScript language

Resources

SOPs & Troubleshooting

• SEM SOPs (Short Version | Long Version)
• Ga-FIB SOPs (Short Version | Long Version)
• TEM Lamella Sample Preparation SOPs (Short Version | Long Version)
• Cutting & Imaging Cross-Sections SOP
• Troubleshooting Guide

Video Tutorials

• Getting Started | Basic SEM Alignment
• Astigmatism Correction (Details | On Right-Angle Features | Stigmator Alignment)
• Eucentric Height: What it means, When to use it & How to get there
• TEM Lamella Sample Prep (Playlist)
• Cutting & Imaging Cross-sections (Playlist)
• Milling Non-Conductive Samples using Charge Compensation
• Perfecting Ga-FIB Alignments
• Adjusting TLD Voltage to Capture SE vs. BSE Signal

Graphical Handouts

• SEM Concepts
• Ga-FIB Concepts
• SEM & Ga-FIB Alignments
• Guide to Optimizing SEM Imaging

Presentations

• Scanning Electron Microscopy: Principles, Techniques & Applications
• Gallium Focused Ion Beam Microscopy: Principles, Techniques & Applications

Manufacturer Manuals

• Nova NanoLab Operation Manual
• Gas Injection Systems – Deposition of Platinum (Technical Note)
• Gas Injection Systems – Deposition of SiOx (Technical Note)
• Gas Injection Systems – Etching with IEE aka XeF2 Etch (Technical Note)
• Gas Injection Systems – Beam Chemistries Presentation
• Scripting – AutoScript Language Manual (year 2000 Technical Note: most complete)
• Scripting – AutoScript Language Manual (year 2005 Technical Note: less complete, still useful)
• Scripting – RunScript Manual

Specifications

Manufacturer Specifications

• Nova 600 NanoLab Data Sheet (not all parameters apply to our instrument, see below for details specific to the KNI's Nova 600)

Scanning Electron Microscope (SEM) Specifications

• 0.5 to 30.0 kV
• Apertures: 10 mm, 15 mm, 20 mmm, 30 mm
• etc.

Gallium Focused Ion Beam (Ga-FIB) Specifications

• 5.0 to 30.0 kV
• 10 pA - 20 nA
• etc.