Safety Data Sheets (SDS)

Find the Safety Data Sheet (SDS) for any approved material in the KNI Lab below (you can also browse the KNI's SDS Box Directory). If you would like to bring a new material into the lab that is not listed here, email Guy DeRose (derose@caltech.edu) and Bert Mendoza (bertm@caltech.edu) with the request and the SDS and a proposed process for that material, attached, for evaluation.

Gases

• 1,1,1,2-Tetraflouroethane (Matheson Tri-Gas)
• Air Compressed (Air Liquide)
• Argon, compressed (Matheson Tri-Gas)
• Boron Trichloride (Matheson Tri-Gas)
• Carbon Dioxide, Gas (Matheson Tri-Gas)
• Chlorine (Matheson Tri-Gas)
• Ethylene (Matheson Tri-Gas)
• Flourine in Krypton, Xenon, Argon, Nelium, Neon and/or Nitrogen (Spectra Gases)
• Fluoroform (Matheson Tri-Gas)
• Halocarbon 14 (Matheson Tri-Gas)
• Helium (Matheson Tri-Gas)
• Hydrogen (Matheson Tri-Gas)
• Hydrogen Bromide (Matheson Tri-Gas)
• Hydrogen Bromide 33% in AceticAcid (Science Lab)
• Methane / Argon Mixture (Matheson Tri-Gas)
• Methane, Compressed Gas (Matheson Tri-Gas)
• Nitrogen Triflouride (Matheson Tri-Gas)
• Nitrogen, Compressed Gas (Matheson Tri-Gas)
• Nitrogen, Cryogenic Liquid (Matheson Tri-Gas)
• Nitrous Oxide (Matheson Tri-Gas)
• Octoflourocyclobutane (Matheson Tri-Gas)
• Oxygen in Nitrogen (Linde Gas North America)
• Oxygen, Compressed Gas (Matheson Tri-Gas)
• Silane (Matheson Tri-Gas)
• Silane 5% Argon Balance (Matheson Tri-Gas)]
• Silane 5% Helium Balance (Matheson Tri-Gas)
• Silane 5% Nitrogen Balance (Matheson Tri-Gas)
• Silicon Tetrachloride (Matheson Tri-Gas)
• Sulfur Hexafluoride (Matheson Tri-Gas)
• Tetrafluoromethane (Matheson Tri-Gas)
• Tetrafluoromethane (Specialty Gases of America)
• Trifluoromethane (Matheson Tri-Gas)

Liquids

• 1,2 - Dichlorobenzene (Aldrich Chemical Co. )
• 1,2 - Dichlorobenzene (Alfa Aesar, A Johnson Matthey Co.)
• 2-Propanol (Alfa Aesar, A Johnson Matthey Co.)
• 2401 Developer (Rohm & Haas Electonic materials LLC)
• 4-Methyl-2-Pentanone, Omnisolve (EMD Chemicals)
• 495 PMMA Series Resist in Anisole (Micro-Chem)
• 495 PMMA Series Resist in Chlorobenezene (Micro-Chem)
• 5-Ethylidene-2-Norborne (Sigma-Aldrich)
• 500F Spin-on Glass (Filmtronics)
• 950 PMMA Series Resist in Anisole (Micro-Chem)
• 950 PMMA Series Resist in Chlorobenezene (Micro-Chem)
• Accuglass T-11 (Honeywell Electronic Materials)
• Acetic Acid Glacial (J.T. Baker)
• Acetone (Honeywell, Burdick & Jackson)
• Acetone (Mallinckrodt Baker)
• Acetone, HPLC (EMD Chemicals)
• Adhesion Promoter AP3000 (Dow Chemicals)
• AF Amorphous Flouropolymer Solutions (DuPont)
• Aluminum Etchant Type A (Transene Company Inc.)
• Ammonium Hydroxide, 25% NH₃ (Alfa Aesar, A Johnson Matthey Co.)
• Ammonium Hydroxide water solution (Fisher Scientific)
• Amyl Acetate (Mallinckrodt Baker)
• Anisole (Alfa Aesar, A Johnson Matthey Co.)
• aquaSAVE-53 za (Mitsubishi Rayon Co., LTD)
• aquaSAVE-57xs (Mitsubishi Rayon Co., LTD)
• AZ 12XT-20PL-10 Photoresist (AZ Electronic Materials)
• AZ 400K Developer (AZ Electronic Materials)
• AZ 726 MIF Developer (AZ Electronic Materials)
• AZ 5214-E Photoresist (AZ Electronic Materials)
• AZ 9260 Photoresist (520CPS) (EMD Performance Materials Corp)
• AZ NLOF 2020 Photoresist (AZ Electronic Materials)
• AZ P4330-RS Photoresist (AZ Electronic Materials)
• AZ P4620 Photoresist (AZ Electronic Materials)
• AZ P4903 Photoresist (Clariant Corporation)
• B-1200 Spin on Glass / BCB (Desert Silicon, L.L.C. )
• Bromine (Science Lab)
• Bromine Water (Fisher Scientific)
• Buffered HF Improved (Transene Company Inc.)
• Buffer HF, Siloxide Etchant (Transene Company Inc.)
• Buffered Oxide Etch (Mallinckrodt Baker)
• Buffered Oxide Etchant 6:1 (KMG Electronic Chemicals)
• CA-40 (Cyantek Corp)
• CC-300.40S developer (Cyantek Corp)
• Chlorobenzene (Alfa Aesar, A Johnson Matthey Co.)
• Chloroform (Mallinckrodt Baker)
• Chloroform, Omnisolve (EMD Chemicals)
• Chlorotrimethylsilane (Alfa Aesar, A Johnson Matthey Co.)
• Chromium Etchant (Sigma-Aldrich)
• Chromium Etchant CR-7S (Cyantek Corp)
• Citric Acid 1.0 Molar Solution (Aqua Solutions Inc.)
• Citric Acid 20% W/V (Fisher Scientific)
• Citric Acid Monohydrate (Fisher Scientific)
• Copper Etchant APS-100 (Transene Company Inc.)
• Copper Etchant CE-100, CE-200 (Transene Company Inc.)
• Cyclopentanone (Alfa Aesar, A Johnson Matthey Co.)
• Cylclotene 4022-35 (Dow Chemicals)
• Cylclotene 4024-40 (Dow Chemicals)
• Cytop CTL - 809 (Asahi Glass Co., LTD)
• Developer DS2100 (Dow Chemicals)
• Developer for Photoresist ma-D 525 (Micro Resist Technology)
• Dichloromethane (Alfa Aesar, A Johnson Matthey Co.)
• Dichloromethane, Omnisolv (EMD Chemicals)
• Dicyclopentadiene (Sigma-Aldrich)
• Dow Corning High Vacuum Grease (Dow Chemicals)
• EBR PG-Positive Radiation Resist Edge Bead Remover (Micro-Chem)
• Elevate Gold 7990 Make Up (Technic, Inc.)
• Elevate Gold 7990 RTU (Technic, Inc.)
• Ethyl Acetate (Honeywell, Burdick & Jackson)
• Gelest OE 42 (Gelest, Inc)
• Gelest OE 43 (Gelest, Inc)
• GOLD (1) Trisodium Disulphite (Kojima Chemicals Co., LTD)
• Hexamethyldisilizane (Alfa Aesar, A Johnson Matthey Co.)
• Hexamethyldisilizane (Mallinckrodt Baker)
• Hydrobromic Acid 44-50% in Water (Fisher Scientific)
• Hydrochloric Acid (Columbus Chemical Industries, Inc)
• Hydrogen Bromide, 33% Solution in Acetic Acid (Science Lab)
• Hydrogen Peroxide, 30% (Fisher Scientific)
• Hydrogen Peroxide, 30% (Seastar Chemcals)
• Hysol 1C Varian Epoxy Adhesive (Fisher Scientific)
• Ink-N AQ (Henkel Corporation)
• Iodine (Science Lab)
• Isobutyl Alcohol (Mallinckrodt Baker)
• Isopropyl Alcohol (90%-100%) (Mallinckrodt Baker)
• JM 60000 Make Up (Technic, Inc)
• JM 6000 Secondary (Technic, Inc.)
• L 4798 / pH=4,01 (Si Analytics)
• L 4798 / pH=6,87 (Si Analytics)
• L 4798 / pH=9,18 (Si Analytics)
• Liquid Detergent (Labconco)
• Liquid Citric Acid, 50% (HydroChem Industrial Services)
• LOR A Series Resist (Micro-Chem)
• LOR B Series Resist (Micro-Chem)
• ma-D 525 Developer (MicroResist Technology GmbH)
• ma-N 2400 Negative Tone Photoresist (MicroResist Technology GmbH)
• MCC Primer 80/20 (Micro-Chem)
• Megaposit 26A Developer (Rohm & Haas Electonic materials LLC)
• Megaposit SPR 220 (0.7-7.0) Photo Resist (Shipley Company)
• Megaposit SPR 220-3.0 Positive Photoresist (Rohm & Haas Electonic materials LLC)
• Megaposit SPR 220-7.0 Positive Photoresist (Rohm & Haas Electonic materials LLC)
• Megaposit SPR 955CM-0.9 Positive Photoresist (Rohm and Haas Electronic Materials)
• Methanol (Honeywell)
• Methyl Isobutyl Ketone (MIBK, 4-Methyl-2-pentanone) (Mallinckrodt Baker)
• Methylene Chlorine (Dichloromethane) (Burdick & Jackson Inc)
• Microposit 319 Developer (Rohm & Haas Electonic materials LLC)
• Microposit 322 Developer (Rohm & Haas Electonic materials LLC)
• Microposit CD 26 Developer (Rohm & Haas Electonic materials LLC)
• Microposit S1813 Photoresist (Shipley Company)
• Microposit S1818 Photoresist (Rohm & Haas Electronic materials LLC)
• MMA (8.5) MAA Copolymer Series Resist (Micro-Chem)
• N-Methylpyrrolidone (Honeywell, Burdick & Jackson)
• Nano-strip (Cyantek Corp)
• Nano-strip (KMG Electronic Chemicals)
• Negative Resist NR9-1000PY (Futurrex, Inc)
• Negative Resist NR9-3000PY (Futurrex, Inc)
• Negative Resist NR71-1000P (Futurrex, Inc)
• Negative resist NR71-3000P (Futurrex, Inc)
• Neutralizing Acid Rinse (Labconco)
• Nitric Acid (Columbus Chemical)
• Nitrogen, Cryogenic Liquid (Matheson Tri-Gas)
• OmniCoat-Organic Polymer Solution (Micro-Chem)
• Overcoat-G IPA-DAA (Cambrios Technologies)
• Overcoat-P PGME TH (Cambrios Technologies)
• Pentaerythritol Tetraacrylate (Sigma-Aldrich)
• Phosphoric Acid (Columbus Chemical Industries, Inc)
• Phosphoric Acid (Sigma-Aldrich)
• PI-2562, Polyimide Coating (HD MicroSystems)
• PI-2611, Polyimide Precursor Coatings, Polyamic Acid (HD MicroSystems)
• PMGI SF Series Resists (MicroChem)
• Poly(ethylene glycol) Diacrylate (Sigma-Aldrich)
• Poly(3,4-ethylenedioxythiophene)-poly(styrenesulfonate) (Sigma-Aldrich)
• Potassium Hydroxide 20% (EMD Chemicals)
• Potassium Hydroxide (Fisher Scientific)
• Primary Stripper A (Dow Chemical)
• ProTEK B1-25 (Brewer Science)
• ProTEK B3 Primer (Brewer Science)
• ProTEK B3-25 (Brewer Science)
• ProTEK Primer (Brewer Science)
• ProTEK PSB Primer (Brewer Science)
• ProTEK PSB-23 (Brewer Science)
• ProTEK Remover 100 (Brewer Science)
• PRX-127 Plasma Etch Polymer Remover (Rohm & Haas Electronic materials LLC)
• Remover PG, Photoresist Remover (Micro-Chem)
• Resist Developer RD6 (Futurrex, Inc)
• Resist Remover RR5 (Futurrex, Inc)
• Resist Remover RR41 (Futurrex, Inc)
• Rinse T1100 (Dow Chemicals)
• Silicone Potting Compound (GE Silicones)
• Silquest A-174 (Momentive Performance Materials)
• Silquest A-174NT Silane (Momentive Performance Materials)
• SIPR-7126M-20 (Shin-Etsu Chemical Co., Ltd.)
• SU-8 2000 Series Resists (MicroChem)
• SU-8 Developer (Micro-Chem)
• SU-8 Series Resists (MicroChem)
• Sulfuric Acid (Seastar Chemcals)
• SurPass 3000 (DisChem Inc)
• SurPass 4000 (DisChem Inc)
• Sylgard 184 Silcone Elastomer Curing Agent (Dow Corning)
• Sylgard 184 Silcone Elastomer kit - Base (Dow Corning)
• Sylgard 527 A Silicone Dielectric Gel (Dow Corning)
• Sylgard 527 B Silicone Dielectric Gel (Dow Corning)
• Solder NF Acid (70%) (Technic, Inc.)
• Solder NF TIN Concentrate (300/G/L) (Technic, Inc.)
• Telfon (Dupont Fluoroproducts)
• tert-Butyl Methyl Ether (Sigma-Aldrich)
• Thermalbond 4951 A (Aavid Thermalloy, LLC)
• Thermalbond 4951 B (Aavid Thermalloy, LLC)
• Titanium Etchant TFT (Transene Company Inc.)
• Titanium Etchant TFTN (Transene Company Inc.)
• TMAH 25% - Tetramethylammonium Hydroxide (Moses Lake Industries, Inc.)
• TMCS-trimethylsilyl Chloride (Pierce Biotechnology)
• Toluene (BDH)
• Trichloroethylene (Fisher Scientific)
• Triethylchlorosilane (Alfa Aesar, A Johnson Matthey Co.)
• Triton X-100 (Science Lab)
• WiDE -15B (Brewer Scientific)
• XA-1 (Kanto Chemical Co., Inc)
• XA-2 (Kanto Chemical Co., Inc)
• Xp MicroSpray Positive Photoresist Spray (Micro Chem)
• XP MicroSpray SU-8 Photoresist Spray (Micro Chem)
• XR-1541-002 E-Beam Resist in MIBK Silicone Resin Solution (Dow Corning)
• XR-1541-006 E-Beam Resist in MIBK Silicone Resin Solution (Dow Corning)
• Xylene, for Histology and Cytology (EMD Chemicals)
• ZED-N50 (Zeon Chemicals)
• ZEP 520A (Zeon Chemicals)
• ZEP520A-7, ZEP520A (Nippon Zeon)

Solids

• 1,2-Di(4-pyridyl)ethylene (Sigma-Akdrich)
• Anode TIN Pure (Technic, Inc.)
• Alconox (Alconox)
• Aluminum Oxide, Powder and Pieces (Kurt J Lesker)
• Ammonium Biflouride Solution (J.T. Baker)
• Ammonium Persulfate, 98% (Acros Organics NV)
• Ammonium Persulfate, molecular biology grade (Research Organics)
• AZ 12XT-20PL-10 Photoresist (AZ Electronic Materials)
• Chloramine-T-trihydrate (Alfa Aesar, A Johnson Matthey Co.)
• Chromium Metal Pieces (Ted Pella, Inc.)
• Citric Acid monohydrate (Fisher)
• Dehydrated Victawet (SPI Supplies)
• Detergent powder-LabSolutions (Labconco Corp)
• Ferric Chloride, Hexahydrate GR (EMD Chemicals)
• Fomblin UT -18 Grease (Solvay Solexis, Inc.)
• Gallium 69 (FEI / Michigan Metals & Manufacturing, Inc)
• Gallium Metal (Arris International Corporation)
• KYNAR 740-PLT PVDF (Westlake Plastics Company)
• Mercury (II) Chloride (Sigma-Aldrich)
• Polystyrene Latex Sphere (Ted Pella, Inc.)
• Potassium Iodide (Science Lab)
• Silicic Acid (Alfa Aesar, A Johnson Matthey Co.)
• Silicon Powder and Pieces (Kurt J Lesker)
• Sodium Tetraborate, anhydrous (Alfa Aesar, A Johnson Matthey Co.)
• Sulfur Pieces (Alfa Aesar, A Johnson Matthey Co.)
• Xenon Difluoride (Pelchem Co., The Chemical Division of NECSA)
• Yittrium Silicate Garnet, Yttrium Oxyorthosilicate Monocrystal (Scientific Materials Corp.)