Critical Point Dryer

TA 915B: Critical Point Dryer [[image:|320x373px|center|]] Instrument Type Substrate processing Techniques Critical point drying Staff Manager Bert Mendoza Staff Email bertm@caltech.edu Staff Phone 626-395-4075 Reserve time on FBS Request training via FBS User Dashboard Lab Location B211 Steele Lab Phone 626-395-1538 Manufacturer Tousimis Model {{{Model}}}

Description

For the preparation of nano-electromechanical structures as well as for the preparation of biological specimens, we operate a critical point dryer that prevents surface tension damage in nanostructures when removing these from etching or sample preparation solutions. Critical point drying is also a very common technique for the preparation of cell and bacteria samples before imaging with an electron microscope.

Applications

• Application1
• Application2
• Application3

Resources

SOPs & Troubleshooting

• SOP
• Troubleshooting Guide

Manufacturer Manual

• Manual

Specifications

Manufacturer Specifications

• Manufacturer Data Sheet

Notable Specifications

• Voltage Range: 0.5 to 30.0 kV
• Aperture Sizes: 10 mm, 15 mm, 20 mmm, 30 mm
• etc.