User contributions for Matthew
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27 May 2019
- 19:5619:56, 27 May 2019 diff hist −7 Labline: Electron Beam Evaporator No edit summary
- 19:5619:56, 27 May 2019 diff hist +26 CHA: Electron Beam Evaporator No edit summary
- 19:5419:54, 27 May 2019 diff hist 0 N File:CHA-Industries-Mark-40 E-Beam-Evaporator.jpg No edit summary current
- 19:4919:49, 27 May 2019 diff hist +32 m Labline: Electron Beam Evaporator No edit summary
- 19:4619:46, 27 May 2019 diff hist +9 m Nanoscribe PPGT: Microscale 3D Printer No edit summary
- 19:4219:42, 27 May 2019 diff hist +26 DWL-66: Direct-Write Laser System No edit summary
- 19:4019:40, 27 May 2019 diff hist +5 m Wafer Stepper No edit summary
- 19:3619:36, 27 May 2019 diff hist +8 m Contact Mask Aligners: MA6 & MA6/BA6 No edit summary
- 19:3219:32, 27 May 2019 diff hist +89 m ORION NanoFab: Helium, Neon & Gallium FIB No edit summary
- 19:2819:28, 27 May 2019 diff hist −136 m Tecnai TF-20: 200 kV TEM, STEM, EDS, EELS, EFTEM & Lithography No edit summary
- 19:2519:25, 27 May 2019 diff hist +3 m Quanta 200F: SEM, ESEM, Lithography & Probe Station No edit summary
- 19:2419:24, 27 May 2019 diff hist +2 m EBPG 5200: 100 kV Electron Beam Lithography No edit summary
- 19:2319:23, 27 May 2019 diff hist +2 m EBPG 5000+: 100 kV Electron Beam Lithography No edit summary
- 19:2319:23, 27 May 2019 diff hist +20 m EBPG 5000+: 100 kV Electron Beam Lithography No edit summary
- 19:2119:21, 27 May 2019 diff hist −1 m EBPG 5000+: 100 kV Electron Beam Lithography →Sample Prep and Writing SOPs
- 19:2119:21, 27 May 2019 diff hist −2 m EBPG 5200: 100 kV Electron Beam Lithography →Sample Prep and Writing SOPs
- 19:2119:21, 27 May 2019 diff hist +61 m EBPG 5200: 100 kV Electron Beam Lithography No edit summary
- 19:2019:20, 27 May 2019 diff hist −537 m EBPG 5000+: 100 kV Electron Beam Lithography No edit summary
- 19:1719:17, 27 May 2019 diff hist +102 m EBPG 5200: 100 kV Electron Beam Lithography No edit summary
- 19:1019:10, 27 May 2019 diff hist −5 m Equipment List →Metrology
- 19:0919:09, 27 May 2019 diff hist −5 m Equipment List →Scanning Probe Microscopes
- 19:0819:08, 27 May 2019 diff hist +1,095 N Dektak 3ST: Profilometer Created page with "{{InstrumentInfoboxOneImage| |InstrumentName = Veeco Dektak 3ST Profilometer |HeaderColor = #F5A81C |ImageOne = Dektak-3ST-Profilometer.jpg |ImageTwo = |InstrumentType = Eq..."
- 19:0519:05, 27 May 2019 diff hist −10 m Equipment List →Dry Etching
- 18:5618:56, 27 May 2019 diff hist −65 Equipment List →Deposition
- 18:5518:55, 27 May 2019 diff hist +1,019 N Parylene Coater Created page with "{{InstrumentInfoboxOneImage| |InstrumentName = Para Tech LabTop 3000 Parylene Coater |HeaderColor = #F5A81C |ImageOne = LabTop-3000-Parylene-Coater.jpg |ImageTwo = |Instrumen..."
- 18:5418:54, 27 May 2019 diff hist +4,152 N Plasma-Enhanced Chemical Vapor Deposition (PECVD) Created page with "{{InstrumentInfoboxOneImage| |InstrumentName = PECVD |HeaderColor = #FFE2B9 |ImageOne = PECVD_Oxford-System-100.jpg |ImageTwo = |InstrumentType = Equipment_List#Deposition|..."
- 18:5218:52, 27 May 2019 diff hist +4,447 N FlexAL II: Atomic Layer Deposition (ALD) Created page with "{{InstrumentInfoboxOneImage| |InstrumentName = Atomic Layer Deposition (ALD) |HeaderColor = #FFE2B9 |ImageOne = FlexAL-II-ALD.jpg |ImageTwo = |InstrumentType = Equipment_Li..."
- 18:4818:48, 27 May 2019 diff hist +1,402 N CHA: Electron Beam Evaporator Created page with "{{InstrumentInfobox| |InstrumentName = CHA Mk40 Evaporator |HeaderColor = #F2682A |ImageOne = Research-Image.jpg |ImageTwo = Instrument-Image.jpg |InstrumentType = Equipment..."
- 18:4718:47, 27 May 2019 diff hist +1,686 N Labline: Electron Beam Evaporator Created page with "{{InstrumentInfoboxOneImage| |InstrumentName = Labline E-beam Evaporator |HeaderColor = #F2682A |ImageOne = KJLC-Labline-Metal-Evaporator.jpg |ImageTwo = |InstrumentType = ..."
- 18:4318:43, 27 May 2019 diff hist −2 m Equipment List →Optical Lithography
- 18:4218:42, 27 May 2019 diff hist −40 Equipment List →Optical Lithography
- 18:4118:41, 27 May 2019 diff hist +1,373 N DWL-66: Direct-Write Laser System Created page with "{{InstrumentInfoboxOneImage| |InstrumentName = DWL-66 Direct-Write Laser System |HeaderColor = #FFFFFF |ImageOne = Heidelberg-DWL-66.jpg |ImageTwo = |InstrumentType = Equip..."
- 18:3818:38, 27 May 2019 diff hist +2,806 N Wafer Stepper Created page with "{{InstrumentInfoboxOneImage| |InstrumentName = Stepper |HeaderColor = #FFFFFF |ImageOne = I-Line-Wafer-Stepper GCA-6300.jpg |ImageTwo = |InstrumentType = Equipment_List#Lit..."
- 18:2918:29, 27 May 2019 diff hist +2,776 N Contact Mask Aligners: MA6 & MA6/BA6 Created page with "{{InstrumentInfoboxOneImage| |InstrumentName = Suss Contact Mask Aligner MA6/BA6 |HeaderColor = #FFFFFF |ImageOne = Mask-Aligner_Suss-MicroTec-MA6-BA6.jpg |ImageTwo = Instrume..."
- 04:0404:04, 27 May 2019 diff hist +27 Presentations No edit summary
- 03:4903:49, 27 May 2019 diff hist +1,023 Presentations →Microscopy Presentations
- 03:3503:35, 27 May 2019 diff hist +25 m Presentations →Safety Presentations
26 May 2019
- 22:2622:26, 26 May 2019 diff hist −12 Presentations No edit summary
- 22:2322:23, 26 May 2019 diff hist +128 m Presentations No edit summary
- 22:2022:20, 26 May 2019 diff hist 0 m EBPG 5200: 100 kV Electron Beam Lithography →Specifications
- 22:1922:19, 26 May 2019 diff hist −34 m EBPG 5200: 100 kV Electron Beam Lithography →Specifications
- 22:1922:19, 26 May 2019 diff hist −1 m EBPG 5200: 100 kV Electron Beam Lithography →Specifications
- 22:1822:18, 26 May 2019 diff hist −127 EBPG 5200: 100 kV Electron Beam Lithography →Specifications
- 22:0522:05, 26 May 2019 diff hist 0 m Wet Chemistry →Chemicals Provided by the KNI
- 22:0422:04, 26 May 2019 diff hist +51 m Wet Chemistry →Chemicals Provided by the KNI
- 22:0322:03, 26 May 2019 diff hist +21 Wet Chemistry →Chemicals Provided by the KNI
- 21:5221:52, 26 May 2019 diff hist +8 m Wet Chemistry →Approved Chemicals
- 21:5121:51, 26 May 2019 diff hist +47 m Wet Chemistry →Safety Data Sheets
- 21:5021:50, 26 May 2019 diff hist +1 m Wet Chemistry →Approved Chemicals
- 21:5021:50, 26 May 2019 diff hist +1 m Wet Chemistry →Approved Chemicals