EBPG 5200: 100 kV Electron Beam Lithography

EBPG 5200 File:EBPG-5200-Research-Image.jpg Instrument Type Lithography Techniques Electron Beam Lithography, Technique Two, Technique Three Staff Manager Guy A. Derose, PhD Staff Email derose@caltech.edu Staff Phone 626-395-3423 Reserve time on FBS Request training via FBS User Dashboard Lab Location B233B Steele Lab Phone 626-395-1531 Manufacturer Raith Model {{{Model}}}

Description & Applications

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Type1 Applications

• Application1
• Application2
• Application3

Type2 Applications

• Application1
• Application2
• Application3

Resources

SOPs & Troubleshooting

• SOP Type (Short Version | Long Version)
• KNI's SOP
• Other SOP1
• Other SOP2
• Troubleshooting Guide

Video Tutorials

• Video 1 | Video 2
• Video Series: (Part 1 | Part 2 | Part 3)

Graphical Handouts

• Handout 1
• Handout 2

Presentations

• Presentation 1
• Presentation 2

Manufacturer Manuals

• Manual 1
• Manual 2

Specifications

Manufacturer Specifications

• Manufacturuer Data Sheet

Mode 1 Specifications

• Voltage Range: 0.5 to 30.0 kV
• Aperture Sizes: 10 mm, 15 mm, 20 mmm, 30 mm
• etc.

Mode 2 Specifications

• Voltage Range: 5.0 to 30.0 kV
• Current Range: 10 pA - 20 nA
• etc.