CHA: Electron Beam Evaporator

CHA Mk40 Evaporator File:Research-Image.jpg Instrument Type Deposition Techniques E-beam evaporation Staff Manager Alex Wertheim Staff Email alexw@caltech.edu Staff Phone 626-395-3371 Reserve time on FBS Request training via FBS User Dashboard Lab Location B123 Steele Lab Phone 626-395-1539 Manufacturer CHA Industries Model {{{Model}}} File:Instrument-Image.jpg

Description

The CHA Mark 40 electron beam evaporator is a cryopumped six-pocket electron beam deposition system that is optimized for processing multiple wafers with a planetary substrate holder configuration. This tool offers precise control of electron beam evaporation processes for metal films.

Applications

• Metal & Oxide deposition
• Lift-off
• Etch hard-mask formation

Resources

SOPs & Troubleshooting

• KNI SOP
• Troubleshooting Guide

Video Tutorials

• CHA Training

Specifications

Hardware Specifications

• Typical base pressure: 1E-6 to 1E-7 Torr
• All dry pumping system (cryo + dry mechanical pump)
• Evaporation Source: 1x single emitter, 6-pocket e-beam evaporation source