Optical Lithography Resources

Trove of lithography application notes:

https://www.microchemicals.com/downloads/application_notes.html

troubleshooting, photoresist procedures, liftoff, etching, etc.

KNI Photoresists

List of KNI Photoresists

• S1813 standard positive, withstands acid etching
• AZ5214, positive and image reversal negative, good for liftoff

Table of photoresist recipes from KNI papers:

Resist, parameters, notes

Resist	Wafer Prep	Spin	Thickness	Prebake	Exposure	Postbake	Flood	Developer	Development	Hardbake	Mask Aligner	Wattage	Notes
S1813	Dehydrate on hot plate	2000rpm	1um	100C 1min	12s	-	-	MF319	60s	-	Suss1 Ch1	15mW/cm^2	Measured 10/19 (Link KNI recipe doc here)
AZ5214	Dehydrate on hot plate	2000rpm	1um	100C 1min	12s	110C 1min	30s	MF319	60s	-	Suss1 Ch1	15mW/cm^2	Measured 10/19 (Link KNI recipe doc here)

SU8 Guide

BYU SU-8 Guide https://cleanroom.byu.edu/su8

Sizes provided by KNI: 2050, 2005, 2001, 2000.5

Other Photoresists

resist list https://cleanroom.byu.edu/resistmanufacturers

UCSB photoresist recipes:

https://www.nanotech.ucsb.edu/wiki/index.php/Lithography_Recipes#Photolithography_Recipes

https://www.nanotech.ucsb.edu/wiki/index.php/Contact_Alignment_Recipes

BYU Photoresist recipes https://cleanroom.byu.edu/photoresists

Resist	Wafer Prep	Spin	Thickness	Prebake	Exposure	Postbake	Flood	Developer	Development	Hardbake	Mask Aligner	Wattage	Notes
nLoF 2070	Dehydrate on hot plate	2000rpm	7um	100C 5min	120s	-	-	MF319	120s	-	Suss1 Ch1	15mW/cm^2	Measured 10/19 (Link KNI recipe doc here)

Photolithography Resources

Link to BYU photolithograph https://cleanroom.byu.edu/processes#Microfab_PhotoLith

link to definitions: https://kayakuam.com/techreferences/lithography-terms/ https://cleanroom.byu.edu/definitions

resolution https://pages.mtu.edu/~microweb/chap1/ch1-4-1.htm