CHA: Electron Beam Evaporator: Difference between revisions
Jump to navigation
Jump to search
(Created page with "{{InstrumentInfobox| |InstrumentName = CHA Mk40 Evaporator |HeaderColor = #F2682A |ImageOne = Research-Image.jpg |ImageTwo = Instrument-Image.jpg |InstrumentType = Equipment...") |
No edit summary |
||
Line 1: | Line 1: | ||
{{ | {{InstrumentInfoboxOneImage| | ||
|InstrumentName = CHA | |InstrumentName = CHA Evaporator | ||
|HeaderColor = #F2682A | |HeaderColor = #F2682A | ||
|ImageOne = | |ImageOne = CHA-Industries-Mark-40_E-Beam-Evaporator.jpg | ||
|ImageTwo = | |ImageTwo = | ||
|InstrumentType = [[Equipment_List#Deposition|Deposition]] | |InstrumentType = [[Equipment_List#Deposition|Deposition]] | ||
|RoomLocation = B123 Steele | |RoomLocation = B123 Steele | ||
Line 11: | Line 11: | ||
|StaffPhone = 626-395-3371 | |StaffPhone = 626-395-3371 | ||
|Manufacturer = CHA Industries | |Manufacturer = CHA Industries | ||
|Techniques = E-beam | |Model = Mark 40 | ||
|Techniques = E-beam Evaporation | |||
|EmailList = cha-labline@caltech.edu | |EmailList = cha-labline@caltech.edu | ||
|EmailListName = E-beam Evaporator | |EmailListName = E-beam Evaporator | ||
Line 19: | Line 20: | ||
===== Applications ===== | ===== Applications ===== | ||
* Metal & Oxide | * Metal & Oxide Deposition | ||
* Lift-off | * Lift-off | ||
* Etch | * Etch Hard-mask Formation | ||
== Resources == | == Resources == | ||
Line 34: | Line 35: | ||
===== Hardware Specifications ===== | ===== Hardware Specifications ===== | ||
* Typical base pressure: 1E-6 to 1E-7 Torr | * Typical base pressure: 1E-6 to 1E-7 Torr | ||
* All dry pumping system (cryo | * All dry pumping system (cryo & dry mechanical pump) | ||
* Evaporation Source: 1x single emitter, 6-pocket e-beam evaporation source | * Evaporation Source: 1x single emitter, 6-pocket e-beam evaporation source |
Revision as of 19:56, 27 May 2019
|
Description
The CHA Mark 40 electron beam evaporator is a cryopumped six-pocket electron beam deposition system that is optimized for processing multiple wafers with a planetary substrate holder configuration. This tool offers precise control of electron beam evaporation processes for metal films.
Applications
- Metal & Oxide Deposition
- Lift-off
- Etch Hard-mask Formation
Resources
SOPs & Troubleshooting
Video Tutorials
Specifications
Hardware Specifications
- Typical base pressure: 1E-6 to 1E-7 Torr
- All dry pumping system (cryo & dry mechanical pump)
- Evaporation Source: 1x single emitter, 6-pocket e-beam evaporation source