EBPG 5200: 100 kV Electron Beam Lithography: Difference between revisions

From the KNI Lab at Caltech
Jump to navigation Jump to search
No edit summary
No edit summary
Line 15: Line 15:
|EmailListName =  EBPG
|EmailListName =  EBPG
}}
}}
= Description =
== Description ==
Lorem ipsum dolor sit amet, consectetur adipiscing elit, sed do eiusmod tempor incididunt ut labore et dolore magna aliqua. Ut enim ad minim veniam, quis nostrud exercitation ullamco laboris nisi ut aliquip ex ea commodo consequat. Duis aute irure dolor in reprehenderit in voluptate velit esse cillum dolore eu fugiat nulla pariatur.
Lorem ipsum dolor sit amet, consectetur adipiscing elit, sed do eiusmod tempor incididunt ut labore et dolore magna aliqua. Ut enim ad minim veniam, quis nostrud exercitation ullamco laboris nisi ut aliquip ex ea commodo consequat. Duis aute irure dolor in reprehenderit in voluptate velit esse cillum dolore eu fugiat nulla pariatur.
===== Type1 Applications =====
===== Type1 Applications =====
Line 26: Line 26:
* Application3
* Application3


= Resources =
== Resources ==
===== SOPs & Troubleshooting =====
===== SOPs & Troubleshooting =====
* SOP Type  ([https://caltech.box.com/s/4yv8f5att77k3zq1rm6p0mqhkd8quslh Short Version] | [https://caltech.box.com/s/xwjdudqdl793gkc5kl71zez5nnc5y2xb Long Version])
* SOP Type  ([https://caltech.box.com/s/4yv8f5att77k3zq1rm6p0mqhkd8quslh Short Version] | [https://caltech.box.com/s/xwjdudqdl793gkc5kl71zez5nnc5y2xb Long Version])
Line 47: Line 47:
* [https://caltech.box.com/s/j0t3w6i53jhfjcva8i4qvlatdh7t1tzw Manual 2]
* [https://caltech.box.com/s/j0t3w6i53jhfjcva8i4qvlatdh7t1tzw Manual 2]


= Specifications =
== Specifications ==
===== Manufacturer Specifications =====
===== Manufacturer Specifications =====
* [https://caltech.box.com/s/nmws6w7643ne8mraljjar6c4epw0anpp Manufacturuer Data Sheet]
* [https://caltech.box.com/s/nmws6w7643ne8mraljjar6c4epw0anpp Manufacturuer Data Sheet]

Revision as of 21:49, 24 April 2019

EBPG 5200
File:EBPG-5200-Research-Image.jpg
Instrument Type Lithography
Techniques Technique One, Technique Two
Technique Three, Technique Four
Staff Manager Guy A. DeRose, PhD
Staff Email derose@caltech.edu
Staff Phone 626-395-3423
Reserve time on FBS
Request training via FBS User Dashboard
Lab Location B233B Steele
Lab Phone 626-395-1531
Manufacturer Raith
Model {{{Model}}}
EBPG-5200-Instrument-Image.jpg

Description

Lorem ipsum dolor sit amet, consectetur adipiscing elit, sed do eiusmod tempor incididunt ut labore et dolore magna aliqua. Ut enim ad minim veniam, quis nostrud exercitation ullamco laboris nisi ut aliquip ex ea commodo consequat. Duis aute irure dolor in reprehenderit in voluptate velit esse cillum dolore eu fugiat nulla pariatur.

Type1 Applications
  • Application1
  • Application2
  • Application3
Type2 Applications
  • Application1
  • Application2
  • Application3

Resources

SOPs & Troubleshooting
Video Tutorials
Graphical Handouts
Presentations
Manufacturer Manuals

Specifications

Manufacturer Specifications
Mode 1 Specifications
  • Voltage Range: 0.5 to 30.0 kV
  • Aperture Sizes: 10 mm, 15 mm, 20 mmm, 30 mm
  • etc.
Mode 2 Specifications
  • Voltage Range: 5.0 to 30.0 kV
  • Current Range: 10 pA - 20 nA
  • etc.
Retrieved from "https://www.lab.kni.caltech.edu/index.php?title=EBPG_5200:_100_kV_Electron_Beam_Lithography&oldid=762"