CHA: Electron Beam Evaporator

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• AJA Orion ATC Series Electron Beam Evaporator

CHA Evaporator Instrument Type Deposition Techniques E-beam Evaporation Staff Manager Alex Wertheim Staff Email alexw@caltech.edu Staff Phone 626-395-3371 Reserve time on FBS Request training via FBS User Dashboard Lab Location B235C Steele Lab Phone 626-395-1539 Manufacturer CHA Industries Model Mark 40

Description

The CHA Mark 40 electron beam evaporator is a cryopumped six-pocket electron beam deposition system that is optimized for processing multiple wafers with a planetary substrate holder configuration. This tool offers precise control of electron beam evaporation processes for metal films.

Applications

• Metal & Oxide Deposition
• Lift-off
• Etch Hard-mask Formation

Resources

Equipment Status

• LabRunr Equipment Status (Select Ebeam_CHA from the dropdown menu)

SOPs & Troubleshooting

• KNI SOP
• Troubleshooting Guide
• QCM Crystal Sensor Replacement Instructions
• E-beam Process Maintenance Guide
• Materials Filling and Crucible Swap Instructions

Use the process maintenance guide above for help with assessing and maintaining evaporation crucibles.

Tool Reservation Rules

	Advanced Reservation (days)	Limit per Reservation (hrs)	Limit per week (hrs)
Weekday	7	6	12
Weeknight	7	12	12
Weekend	14	12	12

Video Tutorials

• CHA Training

Specifications

Hardware Specifications

• Typical base pressure: 1E-6 to 1E-7 Torr
• All dry pumping system (cryo & dry mechanical pump)
• Evaporation Source: 1x single emitter, 6-pocket e-beam evaporation source

Related Instrumentation in the KNI

Sputtering Systems

• ATC Orion 8: Chalcogenide Sputter System
• ATC Orion 8: Dielectric Sputter System

Electron Beam Evaporation Systems

• Labline: Electron Beam Evaporator

Chemical Vapor Deposition

• FlexAL II: Atomic Layer Deposition (ALD)
• Plasma-Enhanced Chemical Vapor Deposition (PECVD)