CHA: Electron Beam Evaporator: Difference between revisions

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* [https://caltech.box.com/s/4i2s0kvp6euf2ngx38cr99etfm0gagh0 KNI SOP]
* [https://caltech.box.com/s/4i2s0kvp6euf2ngx38cr99etfm0gagh0 KNI SOP]
* [https://caltech.box.com/s/alx89163hok9gqg5vocsvhk0y74xd5xh Troubleshooting Guide]
* [https://caltech.box.com/s/alx89163hok9gqg5vocsvhk0y74xd5xh Troubleshooting Guide]
* [https://caltech.box.com/s/e0oelbvt8cj4fg9bemitidnwee068qrn E-beam process maintenance guide]
Use the process maintenance guide above for help with assessing and maintaining evaporation crucibles.


===== Video Tutorials =====
===== Video Tutorials =====

Revision as of 21:33, 30 August 2019

CHA Evaporator
CHA-Industries-Mark-40 E-Beam-Evaporator.jpg
Instrument Type Deposition
Techniques E-beam Evaporation
Staff Manager Alex Wertheim
Staff Email alexw@caltech.edu
Staff Phone 626-395-3371
Reserve time on FBS
Request training via FBS User Dashboard
Lab Location B235C Steele
Lab Phone 626-395-1539
Manufacturer CHA Industries
Model Mark 40

Description

The CHA Mark 40 electron beam evaporator is a cryopumped six-pocket electron beam deposition system that is optimized for processing multiple wafers with a planetary substrate holder configuration. This tool offers precise control of electron beam evaporation processes for metal films.

Applications
  • Metal & Oxide Deposition
  • Lift-off
  • Etch Hard-mask Formation

Resources

SOPs & Troubleshooting

Use the process maintenance guide above for help with assessing and maintaining evaporation crucibles.

Video Tutorials

Specifications

Hardware Specifications
  • Typical base pressure: 1E-6 to 1E-7 Torr
  • All dry pumping system (cryo & dry mechanical pump)
  • Evaporation Source: 1x single emitter, 6-pocket e-beam evaporation source
Retrieved from "https://www.lab.kni.caltech.edu/index.php?title=CHA:_Electron_Beam_Evaporator&oldid=1827"