EBPG 5000+: 100 kV Electron Beam Lithography

EBPG 5000+ Instrument Type Lithography Techniques Electron Beam Lithography Staff Manager Guy A. DeRose, PhD Staff Email derose@caltech.edu Staff Phone 626-395-3423 Reserve time on FBS Request training via FBS User Dashboard Lab Location B233C Steele Lab Phone 626-395-1531 /1540 Manufacturer Raith Lithography BV Model {{{Model}}}

Description

The Raith EBPG 5000+ is a dedicated direct-write Electron Beam Pattern Generator that is used to pattern large areas by high-resolution electron beam lithography. This instrument has substrate holders to handle 2, 4, and 6" wafers, piece parts from a couple of mm to 6" diameter, and 3" and 5" mask plates. While this instrument can be set to operate at 20, 50, or 100 keV, it is normally set for 100 keV operation (i.e. with an accelerating voltage of 100 kV, the average energy per electron is 100 keV).

Operational Applications

• Non-aligned electron beam lithography
• Aligned (aka direct-write) electron beam lithography

Scientific / Technical Applications

• Nanophotonics
• Nano-optics
• Waveguides

Resources

General SOPs

• EBPG SOP
• EBPG reservation and use policy

Sample Prep and Writing SOPs

• EBPG High Resolution Mode SOP
• EBPG 5200 Piece part prep SOP
• EBPG Marker definition Procedure
• EBPG JOY Marker Procedure
• EBPG Disable marker height check SOP
• EBPG Remote Access SOP (log into LabRunr and download SOP from EBPG 5000+ page)

Troubleshooting SOPs

• Troubleshooting Guide
• Information Archive Beam
• Lindgren MACS SOP
• SAEHT not initialized SOP
• EBPG Emergency air cylinder SOP
• EBPG SAEHT no route to host recovery SOP
• EBPG hotbox slave communications fault recovery SOP

Specifications

Manufacturer Specifications

• Layout Beamer Release Notes
• Layout Beamer Manual

Specifications

• Voltage Range: 20, 50 or 100 kV
• Current Range: 50 pA to 200 nA
• Main Field Size: Up to 1 mm x 1 mm
• Main Field Resolution: 20 bit
• Maximum Writing Frequency: 100 MHz
• Aperture Sizes: 200μm, 300μm, 400μm