CHA: Electron Beam Evaporator: Difference between revisions

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{{InstrumentInfobox|
{{InstrumentInfoboxOneImage|
|InstrumentName = CHA Mk40 Evaporator
|InstrumentName = CHA Evaporator
|HeaderColor = #F2682A
|HeaderColor = #F2682A
|ImageOne = Research-Image.jpg
|ImageOne = CHA-Industries-Mark-40_E-Beam-Evaporator.jpg
|ImageTwo = Instrument-Image.jpg
|ImageTwo =  
|InstrumentType = [[Equipment_List#Deposition|Deposition]]
|InstrumentType = [[Equipment_List#Deposition|Deposition]]
|RoomLocation = B123 Steele
|RoomLocation = B123 Steele
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|StaffPhone = 626-395-3371
|StaffPhone = 626-395-3371
|Manufacturer = CHA Industries
|Manufacturer = CHA Industries
|Techniques = E-beam evaporation
|Model = Mark 40
|Techniques = E-beam Evaporation
|EmailList = cha-labline@caltech.edu
|EmailList = cha-labline@caltech.edu
|EmailListName =  E-beam Evaporator
|EmailListName =  E-beam Evaporator
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===== Applications =====
===== Applications =====
* Metal & Oxide deposition
* Metal & Oxide Deposition
* Lift-off
* Lift-off
* Etch hard-mask formation
* Etch Hard-mask Formation


== Resources ==
== Resources ==
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===== Hardware Specifications =====
===== Hardware Specifications =====
* Typical base pressure: 1E-6 to 1E-7 Torr
* Typical base pressure: 1E-6 to 1E-7 Torr
* All dry pumping system (cryo + dry mechanical pump)
* All dry pumping system (cryo & dry mechanical pump)
* Evaporation Source: 1x single emitter, 6-pocket e-beam evaporation source
* Evaporation Source: 1x single emitter, 6-pocket e-beam evaporation source

Revision as of 19:56, 27 May 2019

CHA Evaporator
CHA-Industries-Mark-40 E-Beam-Evaporator.jpg
Instrument Type Deposition
Techniques E-beam Evaporation
Staff Manager Alex Wertheim
Staff Email alexw@caltech.edu
Staff Phone 626-395-3371
Reserve time on FBS
Request training via FBS User Dashboard
Lab Location B123 Steele
Lab Phone 626-395-1539
Manufacturer CHA Industries
Model Mark 40

Description

The CHA Mark 40 electron beam evaporator is a cryopumped six-pocket electron beam deposition system that is optimized for processing multiple wafers with a planetary substrate holder configuration. This tool offers precise control of electron beam evaporation processes for metal films.

Applications
  • Metal & Oxide Deposition
  • Lift-off
  • Etch Hard-mask Formation

Resources

SOPs & Troubleshooting
Video Tutorials

Specifications

Hardware Specifications
  • Typical base pressure: 1E-6 to 1E-7 Torr
  • All dry pumping system (cryo & dry mechanical pump)
  • Evaporation Source: 1x single emitter, 6-pocket e-beam evaporation source