EBPG 5000+: 100 kV Electron Beam Lithography: Difference between revisions

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== Description ==
== Description ==
The Raith EBPG 5000+ is a dedicated direct-write Electron Beam Pattern Generator that is used to pattern large areas by high resolution electron beam lithography. This instrument has substrate holders to handle 2, 4, and 6" wafers, piece parts from a couple of mm to 6" diameter, and 3" and 5" mask plates.  While this instrument can be set to operate at 20, 50, or 100 keV, it is normally set for 100 keV operation.
The Raith EBPG 5000+ is a dedicated direct-write Electron Beam Pattern Generator that is used to pattern large areas by high-resolution electron beam lithography. This instrument has substrate holders to handle 2, 4, and 6" wafers, piece parts from a couple of mm to 6" diameter, and 3" and 5" mask plates.  While this instrument can be set to operate at 20, 50, or 100 keV, it is normally set for 100 keV operation (i.e. with an accelerating voltage of 100 kV, the average energy per electron is 100 keV).
===== Opertional Applications =====
===== Operational Applications =====
* Non-aligned electron beam lithography
* Non-aligned electron beam lithography
* Aligned (AKA direct-write) electron beam lithography  
* Aligned (aka direct-write) electron beam lithography  


===== Scientific / Technical Applications =====
===== Scientific / Technical Applications =====
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* [https://caltech.box.com/s/ah2irxdmlw1x4xiodi8wdhxa6yn671uu EBPG JOY Marker Procedure]
* [https://caltech.box.com/s/ah2irxdmlw1x4xiodi8wdhxa6yn671uu EBPG JOY Marker Procedure]
* [https://caltech.box.com/s/6mqfko3fswi0rwrt8zfaj8nwjfr9v2c7 EBPG Disable marker height check SOP]
* [https://caltech.box.com/s/6mqfko3fswi0rwrt8zfaj8nwjfr9v2c7 EBPG Disable marker height check SOP]
* [https://labrunr.caltech.edu/Equipment_2.aspx EBPG Remote Access SOP]
* [https://labrunr.caltech.edu/Equipment_2.aspx EBPG Remote Access SOP] (log into '''LabRunr''' and download SOP from EBPG 5000+ page)
===== Troubleshooting SOPs =====
===== Troubleshooting SOPs =====
* [https://caltech.box.com/s/sz9pai0icsntnef6me23veiwtwdui0gm Troubleshooting Guide]
* [https://caltech.box.com/s/sz9pai0icsntnef6me23veiwtwdui0gm Troubleshooting Guide]
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* [https://caltech.box.com/s/pol1ceg2sbjsmbb6b5vtsw641hwj5r2l EBPG SAEHT no route to host recovery SOP]
* [https://caltech.box.com/s/pol1ceg2sbjsmbb6b5vtsw641hwj5r2l EBPG SAEHT no route to host recovery SOP]
* [https://caltech.box.com/s/1fe4803rl38fa7a7w50r77c4nf64818l EBPG hotbox slave communications fault recovery SOP]
* [https://caltech.box.com/s/1fe4803rl38fa7a7w50r77c4nf64818l EBPG hotbox slave communications fault recovery SOP]
===== Video Tutorials =====
* [https://youtu.be/UfF_ljwvepQ Video 1] | [https://youtu.be/luC-5TgNPsQ Video 2]
* Video Series: ([https://youtu.be/YeukVt1Fyi0 Part 1] | [https://youtu.be/WFfOi-rwlbA Part 2] | [https://youtu.be/1syySgnTEqU Part 3])
===== Graphical Handouts =====
* [https://caltech.box.com/s/14ffgscc39vhrvlyva0jbucsep7j6dvv Handout 1]
* [https://caltech.box.com/s/kxaxtslwol1o5a276f3lrqbhss8zvwje Handout 2]
===== Presentations =====
* [https://caltech.box.com/s/lulkj0pwm053akyya1shazg8wzgudq9f Presentation 1]
* [https://caltech.box.com/s/f4k8jan85n5lf6f2tutjx4rkfzjq7y68 Presentation 2]
===== Manufacturer Manuals =====
* [https://caltech.box.com/s/og4309108q4k2jwhkaxqtpiujg2al5iu Manual 1]
* [https://caltech.box.com/s/j0t3w6i53jhfjcva8i4qvlatdh7t1tzw Manual 2]


== Specifications ==
== Specifications ==
===== Manufacturer Specifications =====
===== Manufacturer Specifications =====
* [https://caltech.box.com/s/nmws6w7643ne8mraljjar6c4epw0anpp Manufacturer Data Sheet]
* [https://caltech.box.com/s/gvgy6vpty5g33qvf9pdef629770vmjiw Layout Beamer Release Notes]
* [https://caltech.box.com/s/6047un2cme4wwgs9ztvexjelp5x7e79p Layout Beamer Manual]
===== Specifications =====
===== Specifications =====
* Voltage Range: 20, 50 or 100 kV
* Voltage Range: 20, 50 or 100 kV
* Current Range: 50 pA - >200 nA
* Current Range: 50 pA to 200 nA
* Main Field size: Up to 1mm x 1mm
* Main Field Size: Up to 1 mm x 1 mm
* Main Field resolution: 20 bit
* Main Field Resolution: 20 bit
* Maximum writing frequency: 100 MHz
* Maximum Writing Frequency: 100 MHz
* Aperture Sizes: 200um, 300um, 400um
* Aperture Sizes: 200μm, 300μm, 400μm
* etc.

Revision as of 19:20, 27 May 2019

EBPG 5000+
EBPG-5000+.jpg
Instrument Type Lithography
Techniques Electron Beam Lithography
Staff Manager Guy A. DeRose, PhD
Staff Email derose@caltech.edu
Staff Phone 626-395-3423
Reserve time on FBS
Request training via FBS User Dashboard
Lab Location B233C Steele
Lab Phone 626-395-1531 /1540
Manufacturer Raith Lithography BV
Model {{{Model}}}

Description

The Raith EBPG 5000+ is a dedicated direct-write Electron Beam Pattern Generator that is used to pattern large areas by high-resolution electron beam lithography. This instrument has substrate holders to handle 2, 4, and 6" wafers, piece parts from a couple of mm to 6" diameter, and 3" and 5" mask plates. While this instrument can be set to operate at 20, 50, or 100 keV, it is normally set for 100 keV operation (i.e. with an accelerating voltage of 100 kV, the average energy per electron is 100 keV).

Operational Applications
  • Non-aligned electron beam lithography
  • Aligned (aka direct-write) electron beam lithography
Scientific / Technical Applications
  • Nanophotonics
  • Nano-optics
  • Waveguides

Resources

General SOPs
Sample Prep and Writing SOPs
Troubleshooting SOPs

Specifications

Manufacturer Specifications
Specifications
  • Voltage Range: 20, 50 or 100 kV
  • Current Range: 50 pA to 200 nA
  • Main Field Size: Up to 1 mm x 1 mm
  • Main Field Resolution: 20 bit
  • Maximum Writing Frequency: 100 MHz
  • Aperture Sizes: 200μm, 300μm, 400μm
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