EBPG 5000+: 100 kV Electron Beam Lithography: Difference between revisions
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== Resources == | == Resources == | ||
===== SOPs | ===== General SOPs ===== | ||
* | * [https://caltech.box.com/s/qzhf1h1su3a1vadl6p76mg6tav49uisn EBPG SOP] | ||
* [https://caltech.box.com/s/cwp88iw2q5t8eygl114zs8ywlhraxo16 EBPG reservation and use policy] | * [https://caltech.box.com/s/cwp88iw2q5t8eygl114zs8ywlhraxo16 EBPG reservation and use policy] | ||
===== Sample Prep and Writing SOPs ===== | ===== Sample Prep and Writing SOPs ===== | ||
* [https://caltech.box.com/s/ys4qbxnsqfqbrdo4dm7t48z1z9dljuwi EBPG High Resolution Mode SOP] | * [https://caltech.box.com/s/ys4qbxnsqfqbrdo4dm7t48z1z9dljuwi EBPG High Resolution Mode SOP] |
Revision as of 00:50, 20 May 2019
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Description
The Raith EBPG 5000+ is a dedicated direct-write Electron Beam Pattern Generator that is used to pattern large areas by high resolution electron beam lithography. This instrument has substrate holders to handle 2, 4, and 6" wafers, piece parts from a couple of mm to 6" diameter, and 3" and 5" mask plates. While this instrument can be set to operate at 20, 50, or 100 keV, it is normally set for 100 keV operation.
Opertional Applications
- Non-aligned electron beam lithography
- Aligned (AKA direct-write) electron beam lithography
Scientific / Technical Applications
- Nanophotonics
- Nano-optics
- Waveguides
Resources
General SOPs
Sample Prep and Writing SOPs
- EBPG High Resolution Mode SOP
- EBPG 5200 Piece part prep SOP
- EBPG Marker definition Procedure
- EBPG JOY Marker Procedure
- EBPG Disable marker height check SOP
- EBPG Remote Access SOP
Troubleshooting SOPs
- Troubleshooting Guide
- Information Archive Beam
- Lindgren MACS SOP
- SAEHT not initialized SOP
- EBPG Emergency air cylinder SOP
- EBPG SAEHT no route to host recovery SOP
- EBPG hotbox slave communications fault recovery SOP
Video Tutorials
Graphical Handouts
Presentations
Manufacturer Manuals
Specifications
Manufacturer Specifications
Specifications
- Voltage Range: 20, 50 or 100 kV
- Current Range: 50 pA - >200 nA
- Main Field size: Up to 1mm x 1mm
- Main Field resolution: 20 bit
- Maximum writing frequency: 100 MHz
- Aperture Sizes: 200um, 300um, 400um
- etc.