Rapid Thermal Processor: Difference between revisions
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|RoomLocation = B235 Steele | |RoomLocation = B235 Steele | ||
|LabPhone = 626-395-1539 | |LabPhone = 626-395-1539 | ||
|PrimaryStaff = [[ | |PrimaryStaff = [[Alex Wertheim]] | ||
|StaffEmail = | |StaffEmail = alexw@caltech.edu | ||
|StaffPhone = 626-395- | |StaffPhone = 626-395-3371 | ||
|Manufacturer = Surface | |Manufacturer = Surface Science Integration | ||
|Model = Solaris 150 | |Model = Solaris 150 | ||
|Techniques = Rapid Thermal Processing | |Techniques = Rapid Thermal Processing | ||
|RequestTraining = | |RequestTraining = alexw@caltech.edu | ||
|EmailList = kni-metrology | |EmailList = kni-metrology | ||
|EmailListName = Metrology | |EmailListName = Metrology | ||
Latest revision as of 23:10, 24 September 2025
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Description
The Solaris 150 is a manual loading Rapid Thermal Processor system that can process up to 6 inch substrates. The system is designed for silicon implant annealing and monitoring and compound semiconductor implant activation and ohmic alloying.
Applications
- Temperature range from room temperature to 1200 degrees C.
- Processing gasses available:
- Nitrogen
- Argon
- Forming Gas (5% H2 in N2)
Resources
SOPs
Manuals