CHA: Electron Beam Evaporator: Difference between revisions

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(setup redirect to AJA orion evaporator)
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{{InstrumentInfobox|
#redirect [[AJA_Orion_ATC_Series_Electron_Beam_Evaporator]]
|InstrumentName = CHA Mk40 Evaporator
 
{{InstrumentInfoboxOneImage|
|InstrumentName = CHA Evaporator
|HeaderColor = #F2682A
|HeaderColor = #F2682A
|ImageOne = Research-Image.jpg
|ImageOne = CHA-Industries-Mark-40_E-Beam-Evaporator.jpg
|ImageTwo = Instrument-Image.jpg
|ImageTwo =  
|InstrumentType = [[Equipment_List#Deposition|Deposition]]
|InstrumentType = [[Equipment_List#Deposition|Deposition]]
|RoomLocation = B123 Steele
|RoomLocation = B235C Steele
|LabPhone = 626-395-1539
|LabPhone = 626-395-1539
|PrimaryStaff = [[Alex Wertheim]]
|PrimaryStaff = [[Alex Wertheim]]
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|StaffPhone = 626-395-3371
|StaffPhone = 626-395-3371
|Manufacturer = CHA Industries
|Manufacturer = CHA Industries
|Techniques = E-beam evaporation
|Model = Mark 40
|EmailList = cha-labline@caltech.edu
|Techniques = E-beam Evaporation
|EmailList = kni-cha
|EmailListName =  E-beam Evaporator
|EmailListName =  E-beam Evaporator
}}
}}
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===== Applications =====
===== Applications =====
* Metal & Oxide deposition
* Metal & Oxide Deposition
* Lift-off
* Lift-off
* Etch hard-mask formation
* Etch Hard-mask Formation


== Resources ==
== Resources ==
===== Equipment Status =====
* [https://labrunr.caltech.edu/Equipment_2.aspx LabRunr Equipment Status] (Select Ebeam_CHA from the dropdown menu)
===== SOPs & Troubleshooting =====
===== SOPs & Troubleshooting =====
* [https://caltech.box.com/s/4i2s0kvp6euf2ngx38cr99etfm0gagh0 KNI SOP]
* [https://caltech.box.com/s/4i2s0kvp6euf2ngx38cr99etfm0gagh0 KNI SOP]
* [https://caltech.box.com/s/alx89163hok9gqg5vocsvhk0y74xd5xh Troubleshooting Guide]
* [https://caltech.box.com/s/alx89163hok9gqg5vocsvhk0y74xd5xh Troubleshooting Guide]
* [https://caltech.box.com/s/qp616ky1g083wqfeb1nokp4jtnqjifkc QCM Crystal Sensor Replacement Instructions]
* [https://caltech.box.com/s/e0oelbvt8cj4fg9bemitidnwee068qrn E-beam Process Maintenance Guide]
* [https://caltech.box.com/s/0ulhxthe9i465bpzinugiiefmfy6t0rb Materials Filling and Crucible Swap Instructions]
Use the process maintenance guide above for help with assessing and maintaining evaporation crucibles.
=== Tool Reservation Rules ===
{| class="wikitable"
|-
!  !! Advanced Reservation (days) !! Limit per Reservation (hrs) !! Limit per week (hrs)
|-
| Weekday || 7 || 6 || 12
|-
| Weeknight || 7 || 12 || 12
|-
| Weekend || 14 || 12 || 12
|}


===== Video Tutorials =====
===== Video Tutorials =====
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===== Hardware Specifications =====
===== Hardware Specifications =====
* Typical base pressure: 1E-6 to 1E-7 Torr
* Typical base pressure: 1E-6 to 1E-7 Torr
* All dry pumping system (cryo + dry mechanical pump)
* All dry pumping system (cryo & dry mechanical pump)
* Evaporation Source: 1x single emitter, 6-pocket e-beam evaporation source
* Evaporation Source: 1x single emitter, 6-pocket e-beam evaporation source
== Related Instrumentation in the KNI ==
===== Sputtering Systems =====
* [[ATC Orion 8: Chalcogenide Sputter System|ATC Orion 8: Chalcogenide Sputter System]]
* [[ATC Orion 8: Dielectric Sputter System|ATC Orion 8: Dielectric Sputter System]]
===== Electron Beam Evaporation Systems =====
* [[Labline: Electron Beam Evaporator|Labline: Electron Beam Evaporator]]
===== Chemical Vapor Deposition =====
* [[FlexAL II: Atomic Layer Deposition (ALD)|FlexAL II: Atomic Layer Deposition (ALD)]]
* [[Plasma-Enhanced Chemical Vapor Deposition (PECVD)|Plasma-Enhanced Chemical Vapor Deposition (PECVD)]]

Latest revision as of 23:58, 27 July 2023

Redirect to:

CHA Evaporator
CHA-Industries-Mark-40 E-Beam-Evaporator.jpg
Instrument Type Deposition
Techniques E-beam Evaporation
Staff Manager Alex Wertheim
Staff Email alexw@caltech.edu
Staff Phone 626-395-3371
Reserve time on FBS
Request training via FBS User Dashboard
Lab Location B235C Steele
Lab Phone 626-395-1539
Manufacturer CHA Industries
Model Mark 40

Description

The CHA Mark 40 electron beam evaporator is a cryopumped six-pocket electron beam deposition system that is optimized for processing multiple wafers with a planetary substrate holder configuration. This tool offers precise control of electron beam evaporation processes for metal films.

Applications
  • Metal & Oxide Deposition
  • Lift-off
  • Etch Hard-mask Formation

Resources

Equipment Status
SOPs & Troubleshooting

Use the process maintenance guide above for help with assessing and maintaining evaporation crucibles.

Tool Reservation Rules

Advanced Reservation (days) Limit per Reservation (hrs) Limit per week (hrs)
Weekday 7 6 12
Weeknight 7 12 12
Weekend 14 12 12
Video Tutorials

Specifications

Hardware Specifications
  • Typical base pressure: 1E-6 to 1E-7 Torr
  • All dry pumping system (cryo & dry mechanical pump)
  • Evaporation Source: 1x single emitter, 6-pocket e-beam evaporation source

Related Instrumentation in the KNI

Sputtering Systems
Electron Beam Evaporation Systems
Chemical Vapor Deposition
Retrieved from "https://www.lab.kni.caltech.edu/index.php?title=CHA:_Electron_Beam_Evaporator&oldid=3280"