Rapid Thermal Processor: Difference between revisions

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|RoomLocation = B235 Steele
|RoomLocation = B235 Steele
|LabPhone = 626-395-1539
|LabPhone = 626-395-1539
|PrimaryStaff = [[Alireza Ghaffari]]
|PrimaryStaff = [[Alex Wertheim]]
|StaffEmail = alireza@caltech.edu
|StaffEmail = alexw@caltech.edu
|StaffPhone = 626-395-3984
|StaffPhone = 626-395-3171
|Manufacturer = Surface science integration
|Manufacturer = Surface science integration
|Model = Solaris 150
|Model = Solaris 150
|Techniques = Rapid Thermal Processing
|Techniques = Rapid Thermal Processing
|RequestTraining = alireza@caltech.edu
|RequestTraining = alexw@caltech.edu
|EmailList = kni-metrology
|EmailList = kni-metrology
|EmailListName = Metrology
|EmailListName = Metrology

Revision as of 23:09, 24 September 2025

Solaris Rapid Thermal Processor
RTP.jpeg
Instrument Type Metrology
Techniques Rapid Thermal Processing
Staff Manager Alex Wertheim
Staff Email alexw@caltech.edu
Staff Phone 626-395-3171
Reserve time on FBS
Request training via FBS User Dashboard
Lab Location B235 Steele
Lab Phone 626-395-1539
Manufacturer Surface science integration
Model Solaris 150

Description

The Solaris 150 is a manual loading Rapid Thermal Processor system that can process up to 6 inch substrates. The system is designed for silicon implant annealing and monitoring and compound semiconductor implant activation and ohmic alloying.

Applications
  • Temperature range from room temperature to 1200 degrees C.
  • Processing gasses available:
    • Nitrogen
    • Argon
    • Forming Gas (5% H2 in N2)

Resources

SOPs


Manuals