DWL-66: Direct-Write Laser System: Difference between revisions

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m (Adjusted text to refer to FBS instead of LabRunr, and removed link to Equipment Status under Resources since the status can be viewed directly by users in FBS)
 
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|RoomLocation = B217 Steele
|RoomLocation = B217 Steele
|LabPhone = 626-395-1536
|LabPhone = 626-395-1536
|PrimaryStaff = [[Bert Mendoza]]
|PrimaryStaff = [[Alex Wertheim]]
|StaffEmail = bertm@caltech.edu
|StaffEmail = alexw@caltech.edu
|StaffPhone = 626-395-4075
|StaffPhone = 626-395-3371
|Manufacturer = Heidelberg Instruments
|Manufacturer = Heidelberg Instruments
|Model = DWL-66
|Model = DWL-66
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== Resources ==
== Resources ==
===== SOPs =====
===== SOPs =====
* [https://caltech.box.com/s/miia23ob94wsdomfb2bi00d4cfhdeuao Operation SOP]
* [https://caltech.box.com/s/y86tagq2ajxt16wnj5bmqwupas1f1bs7 Operation SOP]
====== FBS Reservation Rules:======
{| class="wikitable"
|-
!  !! Advanced Res (days) !! Limit per Res (hrs) !! Limit per week (hrs)
|-
| Weekday || 7 || 4 || 12
|-
| Weeknight || 7 || 6 || 18
|-
| Weekend || 14 || 6 || 18
|}
'''  For reservations that DO NOT follow the reservation policy, email the tool manager BEFORE scheduling.'''
''  Your reservation can be cancelled at any time by the tool manager if it does not follow the tool reservation policy.''
 
===== Optical Lithography Resources =====
* [[Optical Lithography Resources | Optical Lithography Resources Page]]


===== Manufacturer Manuals =====
===== Manufacturer Manuals =====
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== Specifications ==
== Specifications ==
* Exposure: 442 nm wavelength HeCd laser
* Exposure: 442 nm wavelength HeCd laser
== Related Instrumentation in the KNI ==
===== Electron Beam Lithography =====
* [[EBPG 5200: 100 kV Electron Beam Lithography|EBPG 5200: 100 kV Electron Beam Lithography]]
* [[EBPG 5000+: 100 kV Electron Beam Lithography | EBPG 5000+: 100 kV Electron Beam Lithography]]
* [[Quanta 200F: SEM, ESEM, Lithography & Probe Station | Quanta 200F: SEM with 1-30 kV Electron Beam Lithography]]
* [[Tecnai TF-20: 200 kV TEM, STEM, EDS, EELS, EFTEM & Lithography | Tecnai TF-20: TEM & STEM with 80-200 kV Electron Beam Lithography]]
===== Ion Beam Lithography =====
* [[ORION NanoFab: Helium, Neon & Gallium FIB | ORION NanoFab: Helium (5-40 kV), Neon (5-35 kV) & Gallium (1-30 kV) Focused Ion Beam Lithography & Microscopy]]
===== Optical Lithography =====
* [[Contact Mask Aligners: MA6 & MA6/BA6 | Contact Mask Aligners: Suss MicroTec models MA6 & MA6/BA6]]
* [[Wafer Stepper | i-Line Wafer Stepper: GCA model 6300]]
* [[CNI-PV 2.1: Nano Imprint Lithography | Nano Imprint Lithography: NILT CNI-PV 2.1]]
* [[Nanoscribe PPGT: Microscale 3D Printer | Two-Photon Lithography (aka Microscale 3D Printing): Nanoscribe Photonic Professional GT]]
* [[Optical Lithography Resources]]

Latest revision as of 22:55, 15 April 2024

DWL-66 Direct-Write Laser System
Heidelberg-DWL-66.jpg
Instrument Type Lithography
Techniques Direct Patterning,
Pattern Alignment,
Wafer and Mask Patterning
Staff Manager Alex Wertheim
Staff Email alexw@caltech.edu
Staff Phone 626-395-3371
Reserve time on FBS
Request training via FBS User Dashboard
Lab Location B217 Steele
Lab Phone 626-395-1536
Manufacturer Heidelberg Instruments
Model DWL-66

Description

The Heidelberg Instruments DWL-66 is a tool for mask making and for direct patterning of wafers by the use of a HeCd laser. Precise control of the laser head and alignment produces 800-nm resolution lithography. The DWL 66 is an extremely high-resolution imaging system where over half a million dpi (dots per inch) is achieved using a 40-nm writeable address grid for exposing chrome plates or wafers.

Applications
  • Direct Writing
  • Grayscale Writing

Resources

SOPs
FBS Reservation Rules:
Advanced Res (days) Limit per Res (hrs) Limit per week (hrs)
Weekday 7 4 12
Weeknight 7 6 18
Weekend 14 6 18

For reservations that DO NOT follow the reservation policy, email the tool manager BEFORE scheduling. Your reservation can be cancelled at any time by the tool manager if it does not follow the tool reservation policy.

Optical Lithography Resources
Manufacturer Manuals

Specifications

  • Exposure: 442 nm wavelength HeCd laser

Related Instrumentation in the KNI

Electron Beam Lithography
Ion Beam Lithography
Optical Lithography
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