Provided Chemicals: Difference between revisions
Jump to navigation
Jump to search
| Line 23: | Line 23: | ||
* [https://caltech.box.com/s/p0ipw68eugayo2skq1hqgnj7vdl8m46f Citric Acid] | * [https://caltech.box.com/s/p0ipw68eugayo2skq1hqgnj7vdl8m46f Citric Acid] | ||
* [https://caltech.box.com/s/s7sy48utmmndn20pxn4izq6e433hkcj8 Copper Etchant APS-100] | * [https://caltech.box.com/s/s7sy48utmmndn20pxn4izq6e433hkcj8 Copper Etchant APS-100] | ||
* [https://caltech.box.com/s/2vdmpf5r9v2dd8ghwdaq32tnznhxdo0o Crystal Bond 555] | |||
* [https://caltech.box.com/s/fip81rmqz0x1pw031zqg7blun11617mv Dichloromethane (Methylene Chlorine)] | * [https://caltech.box.com/s/fip81rmqz0x1pw031zqg7blun11617mv Dichloromethane (Methylene Chlorine)] | ||
* [https://caltech.box.com/s/4yhh2gx40o6l94edtkh4q277brs18h69 EpoThin-2-Hardener] | |||
* [https://caltech.box.com/s/fvl33t0dxm7l58tlsu1rpsa5g19hkf8x EpoThin-2-Resin] | |||
* [https://caltech.box.com/s/0z0gpft6tm297fympdbwfbeopdddvi5u Gold Etchant TFA] | * [https://caltech.box.com/s/0z0gpft6tm297fympdbwfbeopdddvi5u Gold Etchant TFA] | ||
* [https://caltech.box.com/s/y2o9z1zt1kor0we7erdkfyruxgyp82h7 Hexamethyldisilizane (HMDS)] | * [https://caltech.box.com/s/y2o9z1zt1kor0we7erdkfyruxgyp82h7 Hexamethyldisilizane (HMDS)] | ||
| Line 34: | Line 37: | ||
* [https://caltech.box.com/s/w1fp48vpymlru0675o28tuugig7bmevv MF 319 Developer] | * [https://caltech.box.com/s/w1fp48vpymlru0675o28tuugig7bmevv MF 319 Developer] | ||
* [https://caltech.box.com/s/mewj3293pbgyjj3zxupoj0uo9i4hv0c7 Nanostrip] | * [https://caltech.box.com/s/mewj3293pbgyjj3zxupoj0uo9i4hv0c7 Nanostrip] | ||
* [https://caltech.box.com/s/cmq0uvsm78jj0hxzp2q5bozdhrttz5sx PGMEA (Propylene glycol monomethyl ether acetate)] | * [https://caltech.box.com/s/cmq0uvsm78jj0hxzp2q5bozdhrttz5sx PGMEA (Propylene glycol monomethyl ether acetate)] | ||
* [https://caltech.box.com/s/44slar2g3q5cbe9vrpg5tq7viwq1v6vm Phosphoric Acid (H<sub>3</sub>PO<sub>4</sub>)] | * [https://caltech.box.com/s/44slar2g3q5cbe9vrpg5tq7viwq1v6vm Phosphoric Acid (H<sub>3</sub>PO<sub>4</sub>)] | ||
* [https://caltech.box.com/s/41wp3geih92ydmu1jrv5f4spms6j1utg Potassium Hydroxide] | * [https://caltech.box.com/s/41wp3geih92ydmu1jrv5f4spms6j1utg Potassium Hydroxide] | ||
* [https://caltech.box.com/s/lk6bhrkexyngr6gm8t3hosh7rckh05uj Release Agent] | |||
* [https://caltech.box.com/s/kqdon6279rxtna894s6qzgah7xn3p0ld Remover PG, Photoresist Remover (N-Methyl-2-Pyrrolidone)] | |||
* [https://caltech.box.com/s/clxx77yqllfxz7us1tmih29v3vhiyvnl S1805 Photoresist] | * [https://caltech.box.com/s/clxx77yqllfxz7us1tmih29v3vhiyvnl S1805 Photoresist] | ||
* [https://caltech.box.com/s/osts75gximolfc9o5sag2u1xwzyfrzpy S1813 Photoresist] | * [https://caltech.box.com/s/osts75gximolfc9o5sag2u1xwzyfrzpy S1813 Photoresist] | ||
Revision as of 23:07, 20 July 2023
Chemicals Provided by the KNI with typical SDS
- 495 PMMA Series Resists in Anisole
- 495 PMMA Series Resists in Chlorobenzene
- 950 PMMA Series Resists in Anisole
- 950 PMMA Series Resists in Chlorobenzene
- Acetic Acid Glacial
- Acetone
- Aluminum Etchant Type A
- Aluminum Etchant Type D
- Ammonium Hydroxide (NH4OH)
- AZ 3330-F Photoresist
- AZ 400K Developer
- AZ 5214-E Photoresist
- AZ 726 MIF Developer
- AZ 9245 Photoresist
- AZ 9260 Photoresist
- AZ NLOF 2020 Photoresist
- AZ NLOF 2035 Photoresist
- AZ NLOF 2070 Photoresist
- AZ P4620 Photoresist
- CD 26 Developer
- Chromium Etchant CR-7S
- Citric Acid
- Copper Etchant APS-100
- Crystal Bond 555
- Dichloromethane (Methylene Chlorine)
- EpoThin-2-Hardener
- EpoThin-2-Resin
- Gold Etchant TFA
- Hexamethyldisilizane (HMDS)
- Hydrochloric Acid
- Hydrofluoric Acid Improved (BHF)
- Hydrogen Peroxide, 30% H2O2
- Isopropyl Alcohol (IPA)
- Methanol (Methyl alcohol)
- Methyl Isobutyl Ketone (MIBK, 4-Methyl-2-pentanone)
- MF 319 Developer
- Nanostrip
- PGMEA (Propylene glycol monomethyl ether acetate)
- Phosphoric Acid (H3PO4)
- Potassium Hydroxide
- Release Agent
- Remover PG, Photoresist Remover (N-Methyl-2-Pyrrolidone)
- S1805 Photoresist
- S1813 Photoresist
- S1818 Photoresist
- SU-8 Developer
- Sulfuric Acid (H2SO4)
- Titanium Etchant TFT
- Titanium Etchant TFTN
- Tetramethylammonium Hydroxide 25% (TMAH)