Rapid Thermal Processor: Difference between revisions
Jump to navigation
Jump to search
| Line 18: | Line 18: | ||
}} | }} | ||
== Description == | == Description == | ||
The Solaris 150 is a manual loading Rapid Thermal Processor system that can process up to 6 inch substrates. The | The Solaris 150 is a manual loading Rapid Thermal Processor system that can process up to 6 inch substrates. The system is designed for silicon implant annealing and monitoring and compound semiconductor implant activation and ohmic alloying. | ||
===== Applications ===== | ===== Applications ===== | ||
*Temperature range from room temperature to 1200 degrees C. | *Temperature range from room temperature to 1200 degrees C. | ||
Revision as of 21:11, 29 June 2023
|
Description
The Solaris 150 is a manual loading Rapid Thermal Processor system that can process up to 6 inch substrates. The system is designed for silicon implant annealing and monitoring and compound semiconductor implant activation and ohmic alloying.
Applications
- Temperature range from room temperature to 1200 degrees C.
- Processing gasses available:
- Argon
- Nitrogen
- Forming Gas
Resources
SOPs
- SOP coming soon.
Manuals
- Manual coming soon.