Tube Furnaces for Wet & Dry Processing: Difference between revisions
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|Model = Tytan Horizontal<br>Diffusion Furnace | |Model = Tytan Horizontal<br>Diffusion Furnace | ||
|Techniques = Oxidation, Annealing | |Techniques = Oxidation, Annealing | ||
|EmailList = kni-tystar | |EmailList = kni-tystar | ||
|EmailListName = Tystar | |EmailListName = Tystar | ||
}} | }} | ||
Revision as of 22:00, 20 February 2020
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Description
The system is designed for processing up to one-hundred, 150 mm (6") wafers per tube. Tube 1 is designated for wet & dry oxidation using a flask evaporator. Tube 2 is designated for dry oxidation and annealing.
Applications
- Dry & Wet oxidation
- Annealing