Tube Furnaces for Wet & Dry Processing: Difference between revisions
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|ImageOne = Tystar-Tytan-Tube-Furnaces.jpg | |ImageOne = Tystar-Tytan-Tube-Furnaces.jpg | ||
|ImageTwo = | |ImageTwo = | ||
|InstrumentType = [[Equipment_List#Thermal_Processing|Thermal Processing]] | |InstrumentType = [[Equipment_List#Suppotr_Tools|Support Tools]],<br>[[Equipment_List#Thermal_Processing|Thermal Processing]] | ||
|RoomLocation = B235 Steele | |RoomLocation = B235 Steele | ||
|LabPhone = 626-395-1532 | |LabPhone = 626-395-1532 | ||
Revision as of 21:49, 27 May 2019
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Description
The system is designed for processing up to one-hundred, 150 mm (6") wafers per tube. Tube 1 is designated for wet & dry oxidation using a flask evaporator. Tube 2 is designated for dry oxidation and annealing.
Applications
- Dry & Wet oxidation
- Annealing