CHA: Electron Beam Evaporator: Difference between revisions
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|ImageTwo = | |ImageTwo = | ||
|InstrumentType = [[Equipment_List#Deposition|Deposition]] | |InstrumentType = [[Equipment_List#Deposition|Deposition]] | ||
|RoomLocation = | |RoomLocation = B235C Steele | ||
|LabPhone = 626-395-1539 | |LabPhone = 626-395-1539 | ||
|PrimaryStaff = [[Alex Wertheim]] | |PrimaryStaff = [[Alex Wertheim]] |
Revision as of 21:09, 27 May 2019
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Description
The CHA Mark 40 electron beam evaporator is a cryopumped six-pocket electron beam deposition system that is optimized for processing multiple wafers with a planetary substrate holder configuration. This tool offers precise control of electron beam evaporation processes for metal films.
Applications
- Metal & Oxide Deposition
- Lift-off
- Etch Hard-mask Formation
Resources
SOPs & Troubleshooting
Video Tutorials
Specifications
Hardware Specifications
- Typical base pressure: 1E-6 to 1E-7 Torr
- All dry pumping system (cryo & dry mechanical pump)
- Evaporation Source: 1x single emitter, 6-pocket e-beam evaporation source