Tube Furnaces for Wet & Dry Processing: Difference between revisions
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(Created page with "{{InstrumentInfoboxOneImage| |InstrumentName = Tystar Tytan Tube Furnaces 1 & 2 |HeaderColor = #E6E7E8 |ImageOne = |ImageTwo = |InstrumentType = Equipment_List#Support_Too...") |
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* Dry/Wet oxidation | * Dry/Wet oxidation | ||
* Annealing | * Annealing | ||
== Resources == | |||
===== SOPs & Troubleshooting ===== | |||
* [https://caltech.box.com/s/98cjegiimwwivn6zr9ltig1shfb5m6bb KNI SOP] |
Revision as of 21:21, 24 May 2019
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Description
The system is designed for processing up to 100 ea. 150 mm (6") wafers per tube. Tube 1 is designated for Wet/Dry oxidation using Flask Evaporator. Tube 2 is designated for Dry oxidation/Anneal.
Applications
- Dry/Wet oxidation
- Annealing