III-V Etcher and Atomic Layer Etching (ALE): Oxford Instruments PlasmaPro 100 Cobra 300 ICP-RIE with ALE: Revision history

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1 October 2026

  • curprev 00:2100:21, 1 October 2026 Kmmckenz talk contribs 6,758 bytes +6,758 Created page with "{{InstrumentInfoboxOneImage| |InstrumentName = III-V, Metal & Si Etcher |HeaderColor = #FFE2B9 |ImageOne = ICP-RIE_III-V,Metal,Si-Etcher.jpg |ImageTwo = |InstrumentType = Etching |RoomLocation = B235 Steele |LabPhone = 626-395-1532 |PrimaryStaff = Kelly McKenzie |StaffEmail = kmmckenz@caltech.edu |StaffPhone = 626-395-5732 |Manufacturer = Oxford Instruments |Techniques = pseudo-Bosch & Cryogenic Si Etch<br>Compound Semiconductor Etching |E..."
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