The KNI Lab at Caltech - User contributions [en]

New Members

2026-05-20T18:55:03Z

Tkimoto: /* External Users */

==Joining the KNI Lab==
The KNI Laboratory (KNI Lab) is an open-access facility for Caltech and JPL students and researchers, as well as external academic, government and industry users. Equipment and resource use is billed on a per hour basis. Customers are invoiced monthly for their use. You can find information on our [[Usage_Rates | usage rates here]].

If you have general process questions or technical questions about KNI Lab resources, please email Associate Director of Technical Operations [mailto:derose@caltech.edu Dr. Guy DeRose]. Provide as much detail as possible to ensure an efficient and timely response.

Note: There are additional requirements for external users to join the KNI Lab (see below). Please allow more time for processing.

==Step 1: Submit Your KNI New User Form==
Please fill out this online form:
* [https://airtable.com/app2vjzgp8AJpuC3A/pagHxiNohQX8G65DZ/form New Member Registration Form]
External researchers: Please read over the sections below for additional requirements to join the KNI Lab.

==Step 2: Submit Your Process Description Form (if needed)==
After you have submitted your new user form, you may contact [mailto:derose@caltech.edu Guy DeRose] for general process questions. Attach the
[https://caltech.box.com/s/kxkb44hdjhkw8rbj3pl9v6lh29h6b166 KNI Lab New Process Description form] to your email inquiry.

==Step 3: Safety Training==
All new lab users are required to attend the KNI New Member Lab Safety Training Session, as well as Caltech's Laboratory Safety Orientation which is managed by Caltech's Environmental Health and Safety (EHS) department. Caltech EHS Laboratory Safety Orientation is required if you are using '''any''' lab on campus.

After submitting your new user form, you will receive an email from the KNI with details and information to prepare for the KNI-specific safety training session. These sessions are held weekly, every Friday at 1 pm via Zoom.

EHS Laboratory Safety Orientation is offered via Zoom twice a month. If you have not taken EHS Lab Safety Orientation yet, instructions to register for this training can be found here: [https://www.safety.caltech.edu/root-pages/lab-safety-orientation Caltech's EHS Lab Safety Orientation]

''Note: You may start and complete KNI safety training before completing the EHS safety training. However, you '''must''' complete EHS Laboratory Safety Orientation in order to complete your onboarding and gain access to the KNI Lab.''

==Step 4: Setting Up Your Lab User Accounts & Access==
After you complete the KNI Lab New Member Safety Training, you will receive an email from KNI with further instructions on setting up your KNI Lab user accounts. You will need to coordinate a time to stop by her office and have your ID card scanned so that it is registered in our lab management system. This will allow you to swipe into the KNI Lab's entrance as well as login to the Lab's [https://mh-fbs1.caltech.edu/ tool reservation system (FBS)].

All KNI Lab users are required to join:

1. '''KNI Lab Slack workspace''' to keep up with timely and important lab and tool-specific updates, and

2. '''Priority Software's''' '''FBS platform''', the user and tool management software system for the KNI Laboratory.

Be sure to complete your FBS User account activation when you receive the FBS Welcome Email. If you have any trouble logging into our FBS Facility page ("Kavli Nanoscience Institute (KNI"), email kni@caltech.edu.

Read the [https://caltech.box.com/s/vzxxbvgcgh5pijrf77bqga0bv8mzubad FBS User SOP] for instructions on how to request training, schedule & change tool reservations, setting up your User account, notifications, and billing details.
All KNI Lab users are also signed up to the kni-notice email list.

All KNI Lab users are also added to the kni-notice email list for lab-wide updates.

==Step 5: Tool-Specific Training==
Requests for specific equipment training must be submitted through the [https://mh-fbs1.caltech.edu/ User Activity Dashboard] in FBS. From the User Dashboard, scroll down to find the name of the tool you need to use, click the "Request Training" link and provide any useful information about why you need to use the tool. Be sure to include your availability for the next two weeks for staff coordination.

After you submit your initial tool training request, the KNI technical staff member in charge of the tool will contact you to schedule your first training session. Once a day/time has been agreed upon, you may go to the FBS Calendar (scheduler) and initiate an "Assisted Use" reservation. The staff member will receive an email notification and approve the reservation.

To schedule additional (second, third, etc.) training sessions, follow the same procedure: first submit the request from the FBS User Dashboard tool list, and after a day/time is set with the staff member, go to the FBS Calendar to initiate an "Assisted Use" reservation for the agreed-upon day/time.

Refer to our [https://lab.kni.caltech.edu/Equipment_List Equipment List] page for details on all of the resources in the KNI Lab.

''Note: Users are only charged for equipment use time during training sessions. There is no additional fee (i.e. staff time) for training sessions.''

==External Users==
Non-Caltech Academic, Government, and For-profit/Commercial researchers are considered external users. There is a separate procedure to set up an external user's KNI Lab access. Refer to the [https://caltech.box.com/s/urw7mwljz8jxv2d3s036h6kwx2mb8se8 External Lab User Membership Checklist] to ensure timely processing. All documentation must be completed and approved before KNI Lab access is granted.

'''Please''' '''begin by filling out the [https://airtable.com/app2vjzgp8AJpuC3A/pagHxiNohQX8G65DZ/form New User Form]'''. A purchase order and your CV are required.

'''Note''': all external users are required to hold a formal appointment at Caltech. If you do not have one (e.g. Visitor, External Affiliate, VURP, etc.), KNI will arrange an External Affiliate appointment for you. The appointment process is handled by Caltech HR and goes through reviews by Caltech offices, including Research Security and Compliance. Please be aware that the appointment setup and review process may take a few weeks.

If you have any questions, please contact [mailto:kni@caltech.edu kni@caltech.edu].

==KNI Member Offboarding==
Users who no longer need to use the KNI Lab must send a notification email to [mailto:kni@caltech.edu kni@caltech.edu] and complete the offboarding process before their last day. Please review the [https://caltech.box.com/s/qapv4ytu4uhyszz538rz4k55mvdihyix KNI Member Offboarding SOP]. The SOP lists items such as Stored Items, Chemicals, Stored Data/Files, etc, which should to be addressed before your membership ends.

New Members

2026-05-15T19:27:45Z

Tkimoto: /* Step 4: Setting Up Your Lab User Accounts & Access */

==Joining the KNI Lab==
The KNI Laboratory (KNI Lab) is an open-access facility for Caltech and JPL students and researchers, as well as external academic, government and industry users. Equipment and resource use is billed on a per hour basis. Customers are invoiced monthly for their use. You can find information on our [[Usage_Rates | usage rates here]].

If you have general process questions or technical questions about KNI Lab resources, please email Associate Director of Technical Operations [mailto:derose@caltech.edu Dr. Guy DeRose]. Provide as much detail as possible to ensure an efficient and timely response.

Note: There are additional requirements for external users to join the KNI Lab (see below). Please allow more time for processing.

==Step 1: Submit Your KNI New User Form==
Please fill out this online form:
* [https://airtable.com/app2vjzgp8AJpuC3A/pagHxiNohQX8G65DZ/form New Member Registration Form]
External researchers: Please read over the sections below for additional requirements to join the KNI Lab.

==Step 2: Submit Your Process Description Form (if needed)==
After you have submitted your new user form, you may contact [mailto:derose@caltech.edu Guy DeRose] for general process questions. Attach the
[https://caltech.box.com/s/kxkb44hdjhkw8rbj3pl9v6lh29h6b166 KNI Lab New Process Description form] to your email inquiry.

==Step 3: Safety Training==
All new lab users are required to attend the KNI New Member Lab Safety Training Session, as well as Caltech's Laboratory Safety Orientation which is managed by Caltech's Environmental Health and Safety (EHS) department. Caltech EHS Laboratory Safety Orientation is required if you are using '''any''' lab on campus.

After submitting your new user form, you will receive an email from the KNI with details and information to prepare for the KNI-specific safety training session. These sessions are held weekly, every Friday at 1 pm via Zoom.

EHS Laboratory Safety Orientation is offered via Zoom twice a month. If you have not taken EHS Lab Safety Orientation yet, instructions to register for this training can be found here: [https://www.safety.caltech.edu/root-pages/lab-safety-orientation Caltech's EHS Lab Safety Orientation]

''Note: You may start and complete KNI safety training before completing the EHS safety training. However, you '''must''' complete EHS Laboratory Safety Orientation in order to complete your onboarding and gain access to the KNI Lab.''

==Step 4: Setting Up Your Lab User Accounts & Access==
After you complete the KNI Lab New Member Safety Training, you will receive an email from KNI with further instructions on setting up your KNI Lab user accounts. You will need to coordinate a time to stop by her office and have your ID card scanned so that it is registered in our lab management system. This will allow you to swipe into the KNI Lab's entrance as well as login to the Lab's [https://mh-fbs1.caltech.edu/ tool reservation system (FBS)].

All KNI Lab users are required to join:

1. '''KNI Lab Slack workspace''' to keep up with timely and important lab and tool-specific updates, and

2. '''Priority Software's''' '''FBS platform''', the user and tool management software system for the KNI Laboratory.

Be sure to complete your FBS User account activation when you receive the FBS Welcome Email. If you have any trouble logging into our FBS Facility page ("Kavli Nanoscience Institute (KNI"), email kni@caltech.edu.

Read the [https://caltech.box.com/s/vzxxbvgcgh5pijrf77bqga0bv8mzubad FBS User SOP] for instructions on how to request training, schedule & change tool reservations, setting up your User account, notifications, and billing details.
All KNI Lab users are also signed up to the kni-notice email list.

All KNI Lab users are also added to the kni-notice email list for lab-wide updates.

==Step 5: Tool-Specific Training==
Requests for specific equipment training must be submitted through the [https://mh-fbs1.caltech.edu/ User Activity Dashboard] in FBS. From the User Dashboard, scroll down to find the name of the tool you need to use, click the "Request Training" link and provide any useful information about why you need to use the tool. Be sure to include your availability for the next two weeks for staff coordination.

After you submit your initial tool training request, the KNI technical staff member in charge of the tool will contact you to schedule your first training session. Once a day/time has been agreed upon, you may go to the FBS Calendar (scheduler) and initiate an "Assisted Use" reservation. The staff member will receive an email notification and approve the reservation.

To schedule additional (second, third, etc.) training sessions, follow the same procedure: first submit the request from the FBS User Dashboard tool list, and after a day/time is set with the staff member, go to the FBS Calendar to initiate an "Assisted Use" reservation for the agreed-upon day/time.

Refer to our [https://lab.kni.caltech.edu/Equipment_List Equipment List] page for details on all of the resources in the KNI Lab.

''Note: Users are only charged for equipment use time during training sessions. There is no additional fee (i.e. staff time) for training sessions.''

==External Users==
Non-Caltech Academic, Government, and For-profit/Commercial researchers are considered external users.

Additional documents are required to set up an external user's KNI Lab access. Refer to the [https://caltech.box.com/s/urw7mwljz8jxv2d3s036h6kwx2mb8se8 External Lab User Membership Checklist] to ensure timely processing. All documentation must be completed and approved before KNI Lab access is granted.

If you are interested in joining the KNI Lab as an external user, '''please fill out the [https://airtable.com/app2vjzgp8AJpuC3A/pagHxiNohQX8G65DZ/form New User Form]'''. A purchase order and your CV are required.

'''Note''': all external users are required to hold a formal appointment at Caltech. If you do not have one (e.g. Visitor, External Affiliate, VURP, etc.), KNI will arrange an External Affiliate appointment for you. The appointment process is handled by Caltech HR and goes through reviews by Caltech offices, including Research Security and Compliance. Please be aware that the appointment setup and review process may take a few weeks.

If you have any questions, please contact kni@caltech.edu.

==KNI Member Offboarding==
Users who no longer need to use the KNI Lab must send a notification email to [mailto:kni@caltech.edu kni@caltech.edu] and complete the offboarding process before their last day. Please review the [https://caltech.box.com/s/qapv4ytu4uhyszz538rz4k55mvdihyix KNI Member Offboarding SOP]. The SOP lists items such as Stored Items, Chemicals, Stored Data/Files, etc, which should to be addressed before your membership ends.

New Members

2026-05-15T19:22:59Z

Tkimoto: /* Step 4: Setting Up Your Lab User Accounts & Access */

==Joining the KNI Lab==
The KNI Laboratory (KNI Lab) is an open-access facility for Caltech and JPL students and researchers, as well as external academic, government and industry users. Equipment and resource use is billed on a per hour basis. Customers are invoiced monthly for their use. You can find information on our [[Usage_Rates | usage rates here]].

If you have general process questions or technical questions about KNI Lab resources, please email Associate Director of Technical Operations [mailto:derose@caltech.edu Dr. Guy DeRose]. Provide as much detail as possible to ensure an efficient and timely response.

Note: There are additional requirements for external users to join the KNI Lab (see below). Please allow more time for processing.

==Step 1: Submit Your KNI New User Form==
Please fill out this online form:
* [https://airtable.com/app2vjzgp8AJpuC3A/pagHxiNohQX8G65DZ/form New Member Registration Form]
External researchers: Please read over the sections below for additional requirements to join the KNI Lab.

==Step 2: Submit Your Process Description Form (if needed)==
After you have submitted your new user form, you may contact [mailto:derose@caltech.edu Guy DeRose] for general process questions. Attach the
[https://caltech.box.com/s/kxkb44hdjhkw8rbj3pl9v6lh29h6b166 KNI Lab New Process Description form] to your email inquiry.

==Step 3: Safety Training==
All new lab users are required to attend the KNI New Member Lab Safety Training Session, as well as Caltech's Laboratory Safety Orientation which is managed by Caltech's Environmental Health and Safety (EHS) department. Caltech EHS Laboratory Safety Orientation is required if you are using '''any''' lab on campus.

After submitting your new user form, you will receive an email from the KNI with details and information to prepare for the KNI-specific safety training session. These sessions are held weekly, every Friday at 1 pm via Zoom.

EHS Laboratory Safety Orientation is offered via Zoom twice a month. If you have not taken EHS Lab Safety Orientation yet, instructions to register for this training can be found here: [https://www.safety.caltech.edu/root-pages/lab-safety-orientation Caltech's EHS Lab Safety Orientation]

''Note: You may start and complete KNI safety training before completing the EHS safety training. However, you '''must''' complete EHS Laboratory Safety Orientation in order to complete your onboarding and gain access to the KNI Lab.''

==Step 4: Setting Up Your Lab User Accounts & Access==
After you complete the KNI Lab New Member Safety Training, you will receive an email from KNI with further instructions on setting up your KNI Lab user accounts. You will need to coordinate a time to stop by her office and have your ID card scanned so that it is registered in our lab management system. This will allow you to swipe into the KNI Lab's entrance as well as login to the Lab's [https://mh-fbs1.caltech.edu/ tool reservation system (FBS)].

All KNI Lab users are required to join:
1. KNI Lab Slack workspace to keep up with timely and important lab and tool-specific updates, and
2. FBS, the KNI Lab user and tool management software system.

Be sure to complete your FBS User account activation when you receive the FBS Welcome Email. If you have any trouble logging into our FBS Facility page ("Kavli Nanoscience Institute (KNI"), email kni@caltech.edu.

Read the [https://caltech.box.com/s/vzxxbvgcgh5pijrf77bqga0bv8mzubad FBS User SOP] for instructions on how to request training, schedule & change tool reservations, setting up your User account, notifications, and billing details.

All KNI Lab users are also signed up to the kni-notice email list.

==Step 5: Tool-Specific Training==
Requests for specific equipment training must be submitted through the [https://mh-fbs1.caltech.edu/ User Activity Dashboard] in FBS. From the User Dashboard, scroll down to find the name of the tool you need to use, click the "Request Training" link, then provide any useful information about why you need training on the specific tool -- also be sure to include your availability for the next two weeks.

After you submit your initial training request, the KNI technical staff member in charge of the tool will receive a notification and will contact you to schedule your first training session. Once a day/time has been agreed upon, you make go directly to the FBS Calendar (scheduler) and initiate an "Assisted Use" reservation. The staff member will receive an email notification and approve the reservation.

To schedule additional (second, third, etc.) training sessions, follow the same procedure: first submit the request from the FBS User Dashboard tool list, and after a day/time is set with the staff member, go to the FBS Calendar to initiate an "Assisted Use" reservation for the agreed-upon day/time.

Refer to our [https://lab.kni.caltech.edu/Equipment_List Equipment List] page for details on all of the resources in the KNI Lab.

''Note: Users are only charged for equipment use time during training sessions. There is no additional fee (i.e. staff time) for training sessions.''

==External Users==
Non-Caltech Academic, Government, and For-profit/Commercial researchers are considered external users.

Additional documents are required to set up an external user's KNI Lab access. Refer to the [https://caltech.box.com/s/urw7mwljz8jxv2d3s036h6kwx2mb8se8 External Lab User Membership Checklist] to ensure timely processing. All documentation must be completed and approved before KNI Lab access is granted.

If you are interested in joining the KNI Lab as an external user, '''please fill out the online [https://airtable.com/app2vjzgp8AJpuC3A/pagHxiNohQX8G65DZ/form New User Form]'''. Have a purchase order and your CV ready to upload.

'''Note''': all external users are required to hold a formal appointment at Caltech. If you do not have one (e.g. Visitor, External Affiliate, VURP, etc.), KNI will arrange an External Affiliate appointment for you. The appointment process is handled by Caltech HR and goes through reviews by Caltech offices, including Research Security and Compliance. Please be aware that the appointment setup and review process may take a few weeks.

If you have any questions, please contact kni@caltech.edu.

==KNI Member Offboarding==
Users who no longer need to use the KNI Lab must send a notification email to [mailto:kni@caltech.edu kni@caltech.edu] and complete the offboarding process before their last day. Please review the [https://caltech.box.com/s/qapv4ytu4uhyszz538rz4k55mvdihyix KNI Member Offboarding SOP]. The SOP lists items such as Stored Items, Chemicals, Stored Data/Files, etc, which should to be addressed before your membership ends.

New Members

2026-05-15T19:20:36Z

Tkimoto: /* Step 3: Safety Training */

==Joining the KNI Lab==
The KNI Laboratory (KNI Lab) is an open-access facility for Caltech and JPL students and researchers, as well as external academic, government and industry users. Equipment and resource use is billed on a per hour basis. Customers are invoiced monthly for their use. You can find information on our [[Usage_Rates | usage rates here]].

If you have general process questions or technical questions about KNI Lab resources, please email Associate Director of Technical Operations [mailto:derose@caltech.edu Dr. Guy DeRose]. Provide as much detail as possible to ensure an efficient and timely response.

Note: There are additional requirements for external users to join the KNI Lab (see below). Please allow more time for processing.

==Step 1: Submit Your KNI New User Form==
Please fill out this online form:
* [https://airtable.com/app2vjzgp8AJpuC3A/pagHxiNohQX8G65DZ/form New Member Registration Form]
External researchers: Please read over the sections below for additional requirements to join the KNI Lab.

==Step 2: Submit Your Process Description Form (if needed)==
After you have submitted your new user form, you may contact [mailto:derose@caltech.edu Guy DeRose] for general process questions. Attach the
[https://caltech.box.com/s/kxkb44hdjhkw8rbj3pl9v6lh29h6b166 KNI Lab New Process Description form] to your email inquiry.

==Step 3: Safety Training==
All new lab users are required to attend the KNI New Member Lab Safety Training Session, as well as Caltech's Laboratory Safety Orientation which is managed by Caltech's Environmental Health and Safety (EHS) department. Caltech EHS Laboratory Safety Orientation is required if you are using '''any''' lab on campus.

After submitting your new user form, you will receive an email from the KNI with details and information to prepare for the KNI-specific safety training session. These sessions are held weekly, every Friday at 1 pm via Zoom.

EHS Laboratory Safety Orientation is offered via Zoom twice a month. If you have not taken EHS Lab Safety Orientation yet, instructions to register for this training can be found here: [https://www.safety.caltech.edu/root-pages/lab-safety-orientation Caltech's EHS Lab Safety Orientation]

''Note: You may start and complete KNI safety training before completing the EHS safety training. However, you '''must''' complete EHS Laboratory Safety Orientation in order to complete your onboarding and gain access to the KNI Lab.''

==Step 4: Setting Up Your Lab User Accounts & Access==
After you complete the mandatory KNI Lab new user safety training, you will receive an email from KNI Administrator Sydney Garstang with further instructions on setting up your KNI Lab user accounts. You will need to coordinate a time to stop by her office and have your ID card scanned so that it is registered in our lab management system. This will allow you to swipe into the KNI Lab's entrance as well as login to the Lab's [https://mh-fbs1.caltech.edu/ tool reservation system (FBS)].

All KNI Lab users are required to join the KNI Lab Slack workspace for timely and important lab updates, as well as FBS, the KNI Lab's user and tool management software system. Be sure to complete your FBS User account activation when you receive the FBS Welcome Email. If you have any trouble logging into our FBS Facility page ("Kavli Nanoscience Institute (KNI"), email kni@caltech.edu.

Read the [https://caltech.box.com/s/vzxxbvgcgh5pijrf77bqga0bv8mzubad FBS User SOP] for instructions on how to request training, schedule & change tool reservations, setting up your User account, notifications, and billing details.

All KNI Lab users are also signed up to the kni-notice email list.

==Step 5: Tool-Specific Training==
Requests for specific equipment training must be submitted through the [https://mh-fbs1.caltech.edu/ User Activity Dashboard] in FBS. From the User Dashboard, scroll down to find the name of the tool you need to use, click the "Request Training" link, then provide any useful information about why you need training on the specific tool -- also be sure to include your availability for the next two weeks.

After you submit your initial training request, the KNI technical staff member in charge of the tool will receive a notification and will contact you to schedule your first training session. Once a day/time has been agreed upon, you make go directly to the FBS Calendar (scheduler) and initiate an "Assisted Use" reservation. The staff member will receive an email notification and approve the reservation.

To schedule additional (second, third, etc.) training sessions, follow the same procedure: first submit the request from the FBS User Dashboard tool list, and after a day/time is set with the staff member, go to the FBS Calendar to initiate an "Assisted Use" reservation for the agreed-upon day/time.

Refer to our [https://lab.kni.caltech.edu/Equipment_List Equipment List] page for details on all of the resources in the KNI Lab.

''Note: Users are only charged for equipment use time during training sessions. There is no additional fee (i.e. staff time) for training sessions.''

==External Users==
Non-Caltech Academic, Government, and For-profit/Commercial researchers are considered external users.

Additional documents are required to set up an external user's KNI Lab access. Refer to the [https://caltech.box.com/s/urw7mwljz8jxv2d3s036h6kwx2mb8se8 External Lab User Membership Checklist] to ensure timely processing. All documentation must be completed and approved before KNI Lab access is granted.

If you are interested in joining the KNI Lab as an external user, '''please fill out the online [https://airtable.com/app2vjzgp8AJpuC3A/pagHxiNohQX8G65DZ/form New User Form]'''. Have a purchase order and your CV ready to upload.

'''Note''': all external users are required to hold a formal appointment at Caltech. If you do not have one (e.g. Visitor, External Affiliate, VURP, etc.), KNI will arrange an External Affiliate appointment for you. The appointment process is handled by Caltech HR and goes through reviews by Caltech offices, including Research Security and Compliance. Please be aware that the appointment setup and review process may take a few weeks.

If you have any questions, please contact kni@caltech.edu.

==KNI Member Offboarding==
Users who no longer need to use the KNI Lab must send a notification email to [mailto:kni@caltech.edu kni@caltech.edu] and complete the offboarding process before their last day. Please review the [https://caltech.box.com/s/qapv4ytu4uhyszz538rz4k55mvdihyix KNI Member Offboarding SOP]. The SOP lists items such as Stored Items, Chemicals, Stored Data/Files, etc, which should to be addressed before your membership ends.

New Members

2026-05-15T19:19:59Z

Tkimoto: /* Step 3: Safety Training */

==Joining the KNI Lab==
The KNI Laboratory (KNI Lab) is an open-access facility for Caltech and JPL students and researchers, as well as external academic, government and industry users. Equipment and resource use is billed on a per hour basis. Customers are invoiced monthly for their use. You can find information on our [[Usage_Rates | usage rates here]].

If you have general process questions or technical questions about KNI Lab resources, please email Associate Director of Technical Operations [mailto:derose@caltech.edu Dr. Guy DeRose]. Provide as much detail as possible to ensure an efficient and timely response.

Note: There are additional requirements for external users to join the KNI Lab (see below). Please allow more time for processing.

==Step 1: Submit Your KNI New User Form==
Please fill out this online form:
* [https://airtable.com/app2vjzgp8AJpuC3A/pagHxiNohQX8G65DZ/form New Member Registration Form]
External researchers: Please read over the sections below for additional requirements to join the KNI Lab.

==Step 2: Submit Your Process Description Form (if needed)==
After you have submitted your new user form, you may contact [mailto:derose@caltech.edu Guy DeRose] for general process questions. Attach the
[https://caltech.box.com/s/kxkb44hdjhkw8rbj3pl9v6lh29h6b166 KNI Lab New Process Description form] to your email inquiry.

==Step 3: Safety Training==
All new lab users are required to attend the KNI-specific lab safety training, as well as Caltech's Laboratory Safety Orientation which is managed by Caltech's Environmental Health and Safety (EHS) department. Caltech EHS Laboratory Safety Orientation is required if you are using '''any''' lab on campus.

After submitting your new user form, you will receive an email from the KNI with details and information to prepare for the KNI-specific safety training session. These sessions are held weekly, every Friday at 1 pm via Zoom.

EHS Laboratory Safety Orientation is offered via Zoom twice a month. If you have not taken EHS Lab Safety Orientation yet, instructions to register for this training can be found here: [https://www.safety.caltech.edu/root-pages/lab-safety-orientation Caltech's EHS Lab Safety Orientation]

''Note: You may start and complete KNI safety training before completing the EHS safety training. However, you '''must''' complete EHS Laboratory Safety Orientation in order to complete your onboarding and gain access to the KNI Lab.''

==Step 4: Setting Up Your Lab User Accounts & Access==
After you complete the mandatory KNI Lab new user safety training, you will receive an email from KNI Administrator Sydney Garstang with further instructions on setting up your KNI Lab user accounts. You will need to coordinate a time to stop by her office and have your ID card scanned so that it is registered in our lab management system. This will allow you to swipe into the KNI Lab's entrance as well as login to the Lab's [https://mh-fbs1.caltech.edu/ tool reservation system (FBS)].

All KNI Lab users are required to join the KNI Lab Slack workspace for timely and important lab updates, as well as FBS, the KNI Lab's user and tool management software system. Be sure to complete your FBS User account activation when you receive the FBS Welcome Email. If you have any trouble logging into our FBS Facility page ("Kavli Nanoscience Institute (KNI"), email kni@caltech.edu.

Read the [https://caltech.box.com/s/vzxxbvgcgh5pijrf77bqga0bv8mzubad FBS User SOP] for instructions on how to request training, schedule & change tool reservations, setting up your User account, notifications, and billing details.

All KNI Lab users are also signed up to the kni-notice email list.

==Step 5: Tool-Specific Training==
Requests for specific equipment training must be submitted through the [https://mh-fbs1.caltech.edu/ User Activity Dashboard] in FBS. From the User Dashboard, scroll down to find the name of the tool you need to use, click the "Request Training" link, then provide any useful information about why you need training on the specific tool -- also be sure to include your availability for the next two weeks.

After you submit your initial training request, the KNI technical staff member in charge of the tool will receive a notification and will contact you to schedule your first training session. Once a day/time has been agreed upon, you make go directly to the FBS Calendar (scheduler) and initiate an "Assisted Use" reservation. The staff member will receive an email notification and approve the reservation.

To schedule additional (second, third, etc.) training sessions, follow the same procedure: first submit the request from the FBS User Dashboard tool list, and after a day/time is set with the staff member, go to the FBS Calendar to initiate an "Assisted Use" reservation for the agreed-upon day/time.

Refer to our [https://lab.kni.caltech.edu/Equipment_List Equipment List] page for details on all of the resources in the KNI Lab.

''Note: Users are only charged for equipment use time during training sessions. There is no additional fee (i.e. staff time) for training sessions.''

==External Users==
Non-Caltech Academic, Government, and For-profit/Commercial researchers are considered external users.

Additional documents are required to set up an external user's KNI Lab access. Refer to the [https://caltech.box.com/s/urw7mwljz8jxv2d3s036h6kwx2mb8se8 External Lab User Membership Checklist] to ensure timely processing. All documentation must be completed and approved before KNI Lab access is granted.

If you are interested in joining the KNI Lab as an external user, '''please fill out the online [https://airtable.com/app2vjzgp8AJpuC3A/pagHxiNohQX8G65DZ/form New User Form]'''. Have a purchase order and your CV ready to upload.

'''Note''': all external users are required to hold a formal appointment at Caltech. If you do not have one (e.g. Visitor, External Affiliate, VURP, etc.), KNI will arrange an External Affiliate appointment for you. The appointment process is handled by Caltech HR and goes through reviews by Caltech offices, including Research Security and Compliance. Please be aware that the appointment setup and review process may take a few weeks.

If you have any questions, please contact kni@caltech.edu.

==KNI Member Offboarding==
Users who no longer need to use the KNI Lab must send a notification email to [mailto:kni@caltech.edu kni@caltech.edu] and complete the offboarding process before their last day. Please review the [https://caltech.box.com/s/qapv4ytu4uhyszz538rz4k55mvdihyix KNI Member Offboarding SOP]. The SOP lists items such as Stored Items, Chemicals, Stored Data/Files, etc, which should to be addressed before your membership ends.

New Members

2026-05-15T19:19:39Z

Tkimoto: /* Step 3: Safety Training */

==Joining the KNI Lab==
The KNI Laboratory (KNI Lab) is an open-access facility for Caltech and JPL students and researchers, as well as external academic, government and industry users. Equipment and resource use is billed on a per hour basis. Customers are invoiced monthly for their use. You can find information on our [[Usage_Rates | usage rates here]].

If you have general process questions or technical questions about KNI Lab resources, please email Associate Director of Technical Operations [mailto:derose@caltech.edu Dr. Guy DeRose]. Provide as much detail as possible to ensure an efficient and timely response.

Note: There are additional requirements for external users to join the KNI Lab (see below). Please allow more time for processing.

==Step 1: Submit Your KNI New User Form==
Please fill out this online form:
* [https://airtable.com/app2vjzgp8AJpuC3A/pagHxiNohQX8G65DZ/form New Member Registration Form]
External researchers: Please read over the sections below for additional requirements to join the KNI Lab.

==Step 2: Submit Your Process Description Form (if needed)==
After you have submitted your new user form, you may contact [mailto:derose@caltech.edu Guy DeRose] for general process questions. Attach the
[https://caltech.box.com/s/kxkb44hdjhkw8rbj3pl9v6lh29h6b166 KNI Lab New Process Description form] to your email inquiry.

==Step 3: Safety Training==
All new lab users are required to attend the KNI-specific lab safety training, as well as Caltech's Laboratory Safety Orientation which is managed by Caltech's Environmental Health and Safety (EHS) department. Caltech EHS Laboratory Safety Orientation is required if you are using *any* lab on campus.

After submitting your new user form, you will receive an email from the KNI with details and information to prepare for the KNI-specific safety training session. These sessions are held weekly, every Friday at 1 pm via Zoom.

EHS Laboratory Safety Orientation is offered via Zoom twice a month. If you have not taken EHS Lab Safety Orientation yet, instructions to register for this training can be found here: [https://www.safety.caltech.edu/root-pages/lab-safety-orientation Caltech's EHS Lab Safety Orientation]

''Note: You may start and complete KNI safety training before completing the EHS safety training. However, you *must* complete EHS Laboratory Safety Orientation in order to complete your onboarding and gain access to the KNI Lab.''

==Step 4: Setting Up Your Lab User Accounts & Access==
After you complete the mandatory KNI Lab new user safety training, you will receive an email from KNI Administrator Sydney Garstang with further instructions on setting up your KNI Lab user accounts. You will need to coordinate a time to stop by her office and have your ID card scanned so that it is registered in our lab management system. This will allow you to swipe into the KNI Lab's entrance as well as login to the Lab's [https://mh-fbs1.caltech.edu/ tool reservation system (FBS)].

All KNI Lab users are required to join the KNI Lab Slack workspace for timely and important lab updates, as well as FBS, the KNI Lab's user and tool management software system. Be sure to complete your FBS User account activation when you receive the FBS Welcome Email. If you have any trouble logging into our FBS Facility page ("Kavli Nanoscience Institute (KNI"), email kni@caltech.edu.

Read the [https://caltech.box.com/s/vzxxbvgcgh5pijrf77bqga0bv8mzubad FBS User SOP] for instructions on how to request training, schedule & change tool reservations, setting up your User account, notifications, and billing details.

All KNI Lab users are also signed up to the kni-notice email list.

==Step 5: Tool-Specific Training==
Requests for specific equipment training must be submitted through the [https://mh-fbs1.caltech.edu/ User Activity Dashboard] in FBS. From the User Dashboard, scroll down to find the name of the tool you need to use, click the "Request Training" link, then provide any useful information about why you need training on the specific tool -- also be sure to include your availability for the next two weeks.

After you submit your initial training request, the KNI technical staff member in charge of the tool will receive a notification and will contact you to schedule your first training session. Once a day/time has been agreed upon, you make go directly to the FBS Calendar (scheduler) and initiate an "Assisted Use" reservation. The staff member will receive an email notification and approve the reservation.

To schedule additional (second, third, etc.) training sessions, follow the same procedure: first submit the request from the FBS User Dashboard tool list, and after a day/time is set with the staff member, go to the FBS Calendar to initiate an "Assisted Use" reservation for the agreed-upon day/time.

Refer to our [https://lab.kni.caltech.edu/Equipment_List Equipment List] page for details on all of the resources in the KNI Lab.

''Note: Users are only charged for equipment use time during training sessions. There is no additional fee (i.e. staff time) for training sessions.''

==External Users==
Non-Caltech Academic, Government, and For-profit/Commercial researchers are considered external users.

Additional documents are required to set up an external user's KNI Lab access. Refer to the [https://caltech.box.com/s/urw7mwljz8jxv2d3s036h6kwx2mb8se8 External Lab User Membership Checklist] to ensure timely processing. All documentation must be completed and approved before KNI Lab access is granted.

If you are interested in joining the KNI Lab as an external user, '''please fill out the online [https://airtable.com/app2vjzgp8AJpuC3A/pagHxiNohQX8G65DZ/form New User Form]'''. Have a purchase order and your CV ready to upload.

'''Note''': all external users are required to hold a formal appointment at Caltech. If you do not have one (e.g. Visitor, External Affiliate, VURP, etc.), KNI will arrange an External Affiliate appointment for you. The appointment process is handled by Caltech HR and goes through reviews by Caltech offices, including Research Security and Compliance. Please be aware that the appointment setup and review process may take a few weeks.

If you have any questions, please contact kni@caltech.edu.

==KNI Member Offboarding==
Users who no longer need to use the KNI Lab must send a notification email to [mailto:kni@caltech.edu kni@caltech.edu] and complete the offboarding process before their last day. Please review the [https://caltech.box.com/s/qapv4ytu4uhyszz538rz4k55mvdihyix KNI Member Offboarding SOP]. The SOP lists items such as Stored Items, Chemicals, Stored Data/Files, etc, which should to be addressed before your membership ends.

New Members

2026-05-15T19:16:21Z

Tkimoto: /* Step 1: Submit Your KNI New User Form */

==Joining the KNI Lab==
The KNI Laboratory (KNI Lab) is an open-access facility for Caltech and JPL students and researchers, as well as external academic, government and industry users. Equipment and resource use is billed on a per hour basis. Customers are invoiced monthly for their use. You can find information on our [[Usage_Rates | usage rates here]].

If you have general process questions or technical questions about KNI Lab resources, please email Associate Director of Technical Operations [mailto:derose@caltech.edu Dr. Guy DeRose]. Provide as much detail as possible to ensure an efficient and timely response.

Note: There are additional requirements for external users to join the KNI Lab (see below). Please allow more time for processing.

==Step 1: Submit Your KNI New User Form==
Please fill out this online form:
* [https://airtable.com/app2vjzgp8AJpuC3A/pagHxiNohQX8G65DZ/form New Member Registration Form]
External researchers: Please read over the sections below for additional requirements to join the KNI Lab.

==Step 2: Submit Your Process Description Form (if needed)==
After you have submitted your new user form, you may contact [mailto:derose@caltech.edu Guy DeRose] for general process questions. Attach the
[https://caltech.box.com/s/kxkb44hdjhkw8rbj3pl9v6lh29h6b166 KNI Lab New Process Description form] to your email inquiry.

==Step 3: Safety Training==
All new lab users are required to attend the KNI-specific lab safety training, as well as Caltech's Laboratory Safety Orientation which is managed by Caltech's Environmental Health and Safety (EHS) department.

After submitting your new user form, you will receive an email from a KNI staff member with all necessary information to prepare for the KNI-specific safety training session. These sessions are held weekly, every Friday at 1 pm via Zoom.

Caltech's EHS Laboratory Safety Orientation is required if you are using any lab on campus. The training is offered by EHS via Zoom twice a month. If you have not taken EHS Lab Safety Orientation, instructions to register for this training can be found here: [https://www.safety.caltech.edu/root-pages/lab-safety-orientation Caltech's EHS Lab Safety Orientation]

''Note: You may start and complete KNI safety training before completing the EHS safety training. However, you must complete EHS Laboratory Safety Orientation in order to complete your onboarding and gain access to the KNI Lab.''

==Step 4: Setting Up Your Lab User Accounts & Access==
After you complete the mandatory KNI Lab new user safety training, you will receive an email from KNI Administrator Sydney Garstang with further instructions on setting up your KNI Lab user accounts. You will need to coordinate a time to stop by her office and have your ID card scanned so that it is registered in our lab management system. This will allow you to swipe into the KNI Lab's entrance as well as login to the Lab's [https://mh-fbs1.caltech.edu/ tool reservation system (FBS)].

All KNI Lab users are required to join the KNI Lab Slack workspace for timely and important lab updates, as well as FBS, the KNI Lab's user and tool management software system. Be sure to complete your FBS User account activation when you receive the FBS Welcome Email. If you have any trouble logging into our FBS Facility page ("Kavli Nanoscience Institute (KNI"), email kni@caltech.edu.

Read the [https://caltech.box.com/s/vzxxbvgcgh5pijrf77bqga0bv8mzubad FBS User SOP] for instructions on how to request training, schedule & change tool reservations, setting up your User account, notifications, and billing details.

All KNI Lab users are also signed up to the kni-notice email list.

==Step 5: Tool-Specific Training==
Requests for specific equipment training must be submitted through the [https://mh-fbs1.caltech.edu/ User Activity Dashboard] in FBS. From the User Dashboard, scroll down to find the name of the tool you need to use, click the "Request Training" link, then provide any useful information about why you need training on the specific tool -- also be sure to include your availability for the next two weeks.

After you submit your initial training request, the KNI technical staff member in charge of the tool will receive a notification and will contact you to schedule your first training session. Once a day/time has been agreed upon, you make go directly to the FBS Calendar (scheduler) and initiate an "Assisted Use" reservation. The staff member will receive an email notification and approve the reservation.

To schedule additional (second, third, etc.) training sessions, follow the same procedure: first submit the request from the FBS User Dashboard tool list, and after a day/time is set with the staff member, go to the FBS Calendar to initiate an "Assisted Use" reservation for the agreed-upon day/time.

Refer to our [https://lab.kni.caltech.edu/Equipment_List Equipment List] page for details on all of the resources in the KNI Lab.

''Note: Users are only charged for equipment use time during training sessions. There is no additional fee (i.e. staff time) for training sessions.''

==External Users==
Non-Caltech Academic, Government, and For-profit/Commercial researchers are considered external users.

Additional documents are required to set up an external user's KNI Lab access. Refer to the [https://caltech.box.com/s/urw7mwljz8jxv2d3s036h6kwx2mb8se8 External Lab User Membership Checklist] to ensure timely processing. All documentation must be completed and approved before KNI Lab access is granted.

If you are interested in joining the KNI Lab as an external user, '''please fill out the online [https://airtable.com/app2vjzgp8AJpuC3A/pagHxiNohQX8G65DZ/form New User Form]'''. Have a purchase order and your CV ready to upload.

'''Note''': all external users are required to hold a formal appointment at Caltech. If you do not have one (e.g. Visitor, External Affiliate, VURP, etc.), KNI will arrange an External Affiliate appointment for you. The appointment process is handled by Caltech HR and goes through reviews by Caltech offices, including Research Security and Compliance. Please be aware that the appointment setup and review process may take a few weeks.

If you have any questions, please contact kni@caltech.edu.

==KNI Member Offboarding==
Users who no longer need to use the KNI Lab must send a notification email to [mailto:kni@caltech.edu kni@caltech.edu] and complete the offboarding process before their last day. Please review the [https://caltech.box.com/s/qapv4ytu4uhyszz538rz4k55mvdihyix KNI Member Offboarding SOP]. The SOP lists items such as Stored Items, Chemicals, Stored Data/Files, etc, which should to be addressed before your membership ends.

New Members

2026-05-15T19:15:14Z

Tkimoto: /* Step 1: Submit Your KNI New User Form */

==Joining the KNI Lab==
The KNI Laboratory (KNI Lab) is an open-access facility for Caltech and JPL students and researchers, as well as external academic, government and industry users. Equipment and resource use is billed on a per hour basis. Customers are invoiced monthly for their use. You can find information on our [[Usage_Rates | usage rates here]].

If you have general process questions or technical questions about KNI Lab resources, please email Associate Director of Technical Operations [mailto:derose@caltech.edu Dr. Guy DeRose]. Provide as much detail as possible to ensure an efficient and timely response.

Note: There are additional requirements for external users to join the KNI Lab (see below). Please allow more time for processing.

==Step 1: Submit Your KNI New User Form==
Please fill out this online form:
* [https://airtable.com/app2vjzgp8AJpuC3A/pagHxiNohQX8G65DZ/form]
External researchers, review the sections below for additional requirements.

==Step 2: Submit Your Process Description Form (if needed)==
After you have submitted your new user form, you may contact [mailto:derose@caltech.edu Guy DeRose] for general process questions. Attach the
[https://caltech.box.com/s/kxkb44hdjhkw8rbj3pl9v6lh29h6b166 KNI Lab New Process Description form] to your email inquiry.

==Step 3: Safety Training==
All new lab users are required to attend the KNI-specific lab safety training, as well as Caltech's Laboratory Safety Orientation which is managed by Caltech's Environmental Health and Safety (EHS) department.

After submitting your new user form, you will receive an email from a KNI staff member with all necessary information to prepare for the KNI-specific safety training session. These sessions are held weekly, every Friday at 1 pm via Zoom.

Caltech's EHS Laboratory Safety Orientation is required if you are using any lab on campus. The training is offered by EHS via Zoom twice a month. If you have not taken EHS Lab Safety Orientation, instructions to register for this training can be found here: [https://www.safety.caltech.edu/root-pages/lab-safety-orientation Caltech's EHS Lab Safety Orientation]

''Note: You may start and complete KNI safety training before completing the EHS safety training. However, you must complete EHS Laboratory Safety Orientation in order to complete your onboarding and gain access to the KNI Lab.''

==Step 4: Setting Up Your Lab User Accounts & Access==
After you complete the mandatory KNI Lab new user safety training, you will receive an email from KNI Administrator Sydney Garstang with further instructions on setting up your KNI Lab user accounts. You will need to coordinate a time to stop by her office and have your ID card scanned so that it is registered in our lab management system. This will allow you to swipe into the KNI Lab's entrance as well as login to the Lab's [https://mh-fbs1.caltech.edu/ tool reservation system (FBS)].

All KNI Lab users are required to join the KNI Lab Slack workspace for timely and important lab updates, as well as FBS, the KNI Lab's user and tool management software system. Be sure to complete your FBS User account activation when you receive the FBS Welcome Email. If you have any trouble logging into our FBS Facility page ("Kavli Nanoscience Institute (KNI"), email kni@caltech.edu.

Read the [https://caltech.box.com/s/vzxxbvgcgh5pijrf77bqga0bv8mzubad FBS User SOP] for instructions on how to request training, schedule & change tool reservations, setting up your User account, notifications, and billing details.

All KNI Lab users are also signed up to the kni-notice email list.

==Step 5: Tool-Specific Training==
Requests for specific equipment training must be submitted through the [https://mh-fbs1.caltech.edu/ User Activity Dashboard] in FBS. From the User Dashboard, scroll down to find the name of the tool you need to use, click the "Request Training" link, then provide any useful information about why you need training on the specific tool -- also be sure to include your availability for the next two weeks.

After you submit your initial training request, the KNI technical staff member in charge of the tool will receive a notification and will contact you to schedule your first training session. Once a day/time has been agreed upon, you make go directly to the FBS Calendar (scheduler) and initiate an "Assisted Use" reservation. The staff member will receive an email notification and approve the reservation.

To schedule additional (second, third, etc.) training sessions, follow the same procedure: first submit the request from the FBS User Dashboard tool list, and after a day/time is set with the staff member, go to the FBS Calendar to initiate an "Assisted Use" reservation for the agreed-upon day/time.

Refer to our [https://lab.kni.caltech.edu/Equipment_List Equipment List] page for details on all of the resources in the KNI Lab.

''Note: Users are only charged for equipment use time during training sessions. There is no additional fee (i.e. staff time) for training sessions.''

==External Users==
Non-Caltech Academic, Government, and For-profit/Commercial researchers are considered external users.

Additional documents are required to set up an external user's KNI Lab access. Refer to the [https://caltech.box.com/s/urw7mwljz8jxv2d3s036h6kwx2mb8se8 External Lab User Membership Checklist] to ensure timely processing. All documentation must be completed and approved before KNI Lab access is granted.

If you are interested in joining the KNI Lab as an external user, '''please fill out the online [https://airtable.com/app2vjzgp8AJpuC3A/pagHxiNohQX8G65DZ/form New User Form]'''. Have a purchase order and your CV ready to upload.

'''Note''': all external users are required to hold a formal appointment at Caltech. If you do not have one (e.g. Visitor, External Affiliate, VURP, etc.), KNI will arrange an External Affiliate appointment for you. The appointment process is handled by Caltech HR and goes through reviews by Caltech offices, including Research Security and Compliance. Please be aware that the appointment setup and review process may take a few weeks.

If you have any questions, please contact kni@caltech.edu.

==KNI Member Offboarding==
Users who no longer need to use the KNI Lab must send a notification email to [mailto:kni@caltech.edu kni@caltech.edu] and complete the offboarding process before their last day. Please review the [https://caltech.box.com/s/qapv4ytu4uhyszz538rz4k55mvdihyix KNI Member Offboarding SOP]. The SOP lists items such as Stored Items, Chemicals, Stored Data/Files, etc, which should to be addressed before your membership ends.

Full Service Rates

2026-04-21T22:44:54Z

Tkimoto:

The KNI Laboratory offers full-service work for internal (Caltech/JPL) customers as well as external customers from industry, government, and academia. We welcome electron beam lithography requests, in addition to other device fabrication needs. Full-service work is project dependent on staff availability, timeline, and scope, and will be reviewed by KNI technical staff. This page covers the pricing for '''external''' full-service customers. '''Note:''' Internal customers (Caltech/JPL) interested in full-service work: review the details [[Usage Rates|'''here''']]. KNI offers no guarantees for the end product.

=== Why KNI? ===

* '''Full process flows:''' resist coating through etch/deposition to final device, under one roof
* '''Experienced staff:''' fill-time expert engineers managing tools daily
* '''Caltech ecosystem:''' proximity to world-class research in photonics, quantum, and materials
* '''IP-secure:''' NDA option to protect ownership and inventorship rights

=== Application Areas ===

* '''Quantum devices''' — superconducting qubits, ion trap electrodes, single-photon sources
* '''Photonic integrated circuits''' — waveguides, grating couplers, ring resonators, metasurfaces
* '''AR/VR optics''' — diffractive waveguide masters, surface-relief gratings, metalenses
* '''RF & III-V devices''' — HEMT gates, fine-pitch test structures, GaAs/GaN/InP
* '''Sensors & MEMS''' — IR detectors, nanoelectromechanical systems, biomedical devices
* '''Mask fabrication''' — photomask writing for optical lithography step-and-repeat

=== Electron Beam Lithography Specifications ===
{| class="wikitable"
|+
|'''Accelerating Voltage'''
|20/50/100 kV (normally operated at 100 kV)
|-
|'''Current Range'''
|50 pA - 200 nA
|-
|'''Resolution'''
|Sub-10 nm
|-
|'''Main Field Size'''
|<nowiki>Up to 1 mm x 1 mm | 20-bit DAC</nowiki>
|-
|'''Max. Writing Frequency'''
|100 MHz
|-
|'''Aperture Sizes'''
|200, 300, and 400 µm (selection varies by system)
|-
|'''Substrate Handling'''
|Piece parts (few mm to wafer scale), wafers up to 6", mask plates up to 6" ; 5200 expandable to 200 mm
|-
|'''Writing Modes'''
|Non-aligned & aligned (direct-write) electron beam lithography
|-
|'''Data Preparation'''
|GenISys Layout BEAMER & TRACER
|}

=== Cost ===
The prices below are for industry customers (for-profit entities). If you are a non-Caltech academic or government customer, please contact us for the rates. Rates are effective October 1, 2025.
{| class="wikitable"
|'''Resource'''
|'''Hourly Rate (excluding admin fee)'''
|-
|Technical Staff Effort
|$ 200.00
|-
|EBPG 5000+ or 5200
|$ 442.00
|-
|Nova 600 FIB
|$ 255.00
|-
|III-V Cobra ALE Etcher
|$ 204.00
|-
|PlasmaPro PECVD (oxide, nitride)
|$ 204.00
|-
|FlexAL II ALD/ALE
|$ 170.00
|-
|Legacy PlasmaLab PECVD (silicon)
|$ 136.00
|-
|Legacy Oxford Etchers (DRIE, III-V, Dielectric)
|$ 136.00
|-
|Nanoscribe PPGT (2D/3D print)
|$ 17.00
|-
|Administrative Fee (per transaction)
|$ 340.00
|}
'''''Note:''' The prices shown here include Caltech's indirect cost rate.''

=== How to Get Started ===
Send an email with your project description and timeline needs to [mailto:kni@caltech.edu kni@caltech.edu]. We will review the request and send a price estimate based on the information provided. We require a purchase order to initiate the full-service work.

Full Service Rates

2026-04-21T22:44:13Z

Tkimoto: /* To Get Started */

The KNI Laboratory offers full-service work for internal (Caltech/JPL) customers as well as external customers from industry, government, and academia. We welcome electron beam lithography requests, in addition to other device fabrication needs. Full-service work is project dependent on staff availability, timeline, and scope, and will be reviewed by KNI technical staff. This page covers the pricing for external full-service customers. KNI offers no guarantees for the end product.

'''Note:''' Internal customers (Caltech/JPL) interested in full-service work: review the details [[Usage Rates|'''here''']].

=== Why KNI? ===

* '''Full process flows:''' resist coating through etch/deposition to final device, under one roof
* '''Experienced staff:''' fill-time expert engineers managing tools daily
* '''Caltech ecosystem:''' proximity to world-class research in photonics, quantum, and materials
* '''IP-secure:''' NDA option to protect ownership and inventorship rights

=== Application Areas ===

* '''Quantum devices''' — superconducting qubits, ion trap electrodes, single-photon sources
* '''Photonic integrated circuits''' — waveguides, grating couplers, ring resonators, metasurfaces
* '''AR/VR optics''' — diffractive waveguide masters, surface-relief gratings, metalenses
* '''RF & III-V devices''' — HEMT gates, fine-pitch test structures, GaAs/GaN/InP
* '''Sensors & MEMS''' — IR detectors, nanoelectromechanical systems, biomedical devices
* '''Mask fabrication''' — photomask writing for optical lithography step-and-repeat

=== Electron Beam Lithography Specifications ===
{| class="wikitable"
|+
|'''Accelerating Voltage'''
|20/50/100 kV (normally operated at 100 kV)
|-
|'''Current Range'''
|50 pA - 200 nA
|-
|'''Resolution'''
|Sub-10 nm
|-
|'''Main Field Size'''
|<nowiki>Up to 1 mm x 1 mm | 20-bit DAC</nowiki>
|-
|'''Max. Writing Frequency'''
|100 MHz
|-
|'''Aperture Sizes'''
|200, 300, and 400 µm (selection varies by system)
|-
|'''Substrate Handling'''
|Piece parts (few mm to wafer scale), wafers up to 6", mask plates up to 6" ; 5200 expandable to 200 mm
|-
|'''Writing Modes'''
|Non-aligned & aligned (direct-write) electron beam lithography
|-
|'''Data Preparation'''
|GenISys Layout BEAMER & TRACER
|}

=== Cost ===
The prices below are for industry customers (for-profit entities). If you are a non-Caltech academic or government customer, please contact us for the rates. Rates are effective October 1, 2025.
{| class="wikitable"
|'''Resource'''
|'''Hourly Rate (excluding admin fee)'''
|-
|Technical Staff Effort
|$ 200.00
|-
|EBPG 5000+ or 5200
|$ 442.00
|-
|Nova 600 FIB
|$ 255.00
|-
|III-V Cobra ALE Etcher
|$ 204.00
|-
|PlasmaPro PECVD (oxide, nitride)
|$ 204.00
|-
|FlexAL II ALD/ALE
|$ 170.00
|-
|Legacy PlasmaLab PECVD (silicon)
|$ 136.00
|-
|Legacy Oxford Etchers (DRIE, III-V, Dielectric)
|$ 136.00
|-
|Nanoscribe PPGT (2D/3D print)
|$ 17.00
|-
|Administrative Fee (per transaction)
|$ 340.00
|}
'''''Note:''' The prices shown here include Caltech's indirect cost rate.''

=== How to Get Started ===
Send an email with your project description and timeline needs to [mailto:kni@caltech.edu kni@caltech.edu]. We will review the request and send a price estimate based on the information provided. We require a purchase order to initiate the full-service work.

Full Service Rates

2026-04-21T22:43:50Z

Tkimoto:

The KNI Laboratory offers full-service work for internal (Caltech/JPL) customers as well as external customers from industry, government, and academia. We welcome electron beam lithography requests, in addition to other device fabrication needs. Full-service work is project dependent on staff availability, timeline, and scope, and will be reviewed by KNI technical staff. This page covers the pricing for external full-service customers. KNI offers no guarantees for the end product.

'''Note:''' Internal customers (Caltech/JPL) interested in full-service work: review the details [[Usage Rates|'''here''']].

=== Why KNI? ===

* '''Full process flows:''' resist coating through etch/deposition to final device, under one roof
* '''Experienced staff:''' fill-time expert engineers managing tools daily
* '''Caltech ecosystem:''' proximity to world-class research in photonics, quantum, and materials
* '''IP-secure:''' NDA option to protect ownership and inventorship rights

=== Application Areas ===

* '''Quantum devices''' — superconducting qubits, ion trap electrodes, single-photon sources
* '''Photonic integrated circuits''' — waveguides, grating couplers, ring resonators, metasurfaces
* '''AR/VR optics''' — diffractive waveguide masters, surface-relief gratings, metalenses
* '''RF & III-V devices''' — HEMT gates, fine-pitch test structures, GaAs/GaN/InP
* '''Sensors & MEMS''' — IR detectors, nanoelectromechanical systems, biomedical devices
* '''Mask fabrication''' — photomask writing for optical lithography step-and-repeat

=== Electron Beam Lithography Specifications ===
{| class="wikitable"
|+
|'''Accelerating Voltage'''
|20/50/100 kV (normally operated at 100 kV)
|-
|'''Current Range'''
|50 pA - 200 nA
|-
|'''Resolution'''
|Sub-10 nm
|-
|'''Main Field Size'''
|<nowiki>Up to 1 mm x 1 mm | 20-bit DAC</nowiki>
|-
|'''Max. Writing Frequency'''
|100 MHz
|-
|'''Aperture Sizes'''
|200, 300, and 400 µm (selection varies by system)
|-
|'''Substrate Handling'''
|Piece parts (few mm to wafer scale), wafers up to 6", mask plates up to 6" ; 5200 expandable to 200 mm
|-
|'''Writing Modes'''
|Non-aligned & aligned (direct-write) electron beam lithography
|-
|'''Data Preparation'''
|GenISys Layout BEAMER & TRACER
|}

=== Cost ===
The prices below are for industry customers (for-profit entities). If you are a non-Caltech academic or government customer, please contact us for the rates. Rates are effective October 1, 2025.
{| class="wikitable"
|'''Resource'''
|'''Hourly Rate (excluding admin fee)'''
|-
|Technical Staff Effort
|$ 200.00
|-
|EBPG 5000+ or 5200
|$ 442.00
|-
|Nova 600 FIB
|$ 255.00
|-
|III-V Cobra ALE Etcher
|$ 204.00
|-
|PlasmaPro PECVD (oxide, nitride)
|$ 204.00
|-
|FlexAL II ALD/ALE
|$ 170.00
|-
|Legacy PlasmaLab PECVD (silicon)
|$ 136.00
|-
|Legacy Oxford Etchers (DRIE, III-V, Dielectric)
|$ 136.00
|-
|Nanoscribe PPGT (2D/3D print)
|$ 17.00
|-
|Administrative Fee (per transaction)
|$ 340.00
|}
'''''Note:''' The prices shown here include Caltech's indirect cost rate.''

=== To Get Started ===
Send an email with your project description and timeline needs to [mailto:kni@caltech.edu kni@caltech.edu]. We will review the request and send a price estimate based on the information provided. We require a purchase order to initiate the full-service work.

File:Screenshot 2026-04-21 at 3.35.59 PM.png

2026-04-21T22:36:58Z

Tkimoto:

EBPG system specs

Full Service Rates

2026-04-21T22:30:49Z

Tkimoto:

The KNI Laboratory offers full-service work for internal (Caltech/JPL) customers as well as external customers from industry, government, and academia. We welcome electron beam lithography requests, in addition to other device fabrication needs. Full-service work is project dependent on staff availability, timeline, and scope, and will be reviewed by KNI technical staff. This page covers the pricing for external full-service customers. KNI offers no guarantees for the end product.

'''Note:''' Internal customers (Caltech/JPL) interested in full-service work: review the details [[Usage Rates|'''here''']].

=== Why KNI? ===

* '''Full process flows:''' resist coating through etch/deposition to final device, under one roof
* '''Experienced staff:''' fill-time expert engineers managing tools daily
* '''Caltech ecosystem:''' proximity to world-class research in photonics, quantum, and materials
* '''IP-secure:''' NDA option to protect ownership and inventorship rights

=== Application Areas ===

* '''Quantum devices''' — superconducting qubits, ion trap electrodes, single-photon sources
* '''Photonic integrated circuits''' — waveguides, grating couplers, ring resonators, metasurfaces
* '''AR/VR optics''' — diffractive waveguide masters, surface-relief gratings, metalenses
* '''RF & III-V devices''' — HEMT gates, fine-pitch test structures, GaAs/GaN/InP
* '''Sensors & MEMS''' — IR detectors, nanoelectromechanical systems, biomedical devices
* '''Mask fabrication''' — photomask writing for optical lithography step-and-repeat

=== Cost ===
The prices below are for industry customers (for-profit entities). If you are a non-Caltech academic or government customer, please contact us for the rates. Rates are effective October 1, 2025.
{| class="wikitable"
|'''Resource'''
|'''Hourly Rate (excluding admin fee)'''
|-
|Technical Staff Effort
|$ 200.00
|-
|EBPG 5000+ or 5200
|$ 442.00
|-
|Nova 600 FIB
|$ 255.00
|-
|III-V Cobra ALE Etcher
|$ 204.00
|-
|PlasmaPro PECVD (oxide, nitride)
|$ 204.00
|-
|FlexAL II ALD/ALE
|$ 170.00
|-
|Legacy PlasmaLab PECVD (silicon)
|$ 136.00
|-
|Legacy Oxford Etchers (DRIE, III-V, Dielectric)
|$ 136.00
|-
|Nanoscribe PPGT (2D/3D print)
|$ 17.00
|-
|Administrative Fee (per transaction)
|$ 340.00
|}
'''''Note:''' The prices shown here include Caltech's indirect cost rate.''

=== To Get Started ===
Send an email with your project description and timeline needs to [mailto:kni@caltech.edu kni@caltech.edu]. We will review the request and send a price estimate based on the information provided. We require a purchase order to initiate the full-service work.

Full Service Rates

2026-04-21T22:30:32Z

Tkimoto: /* Why KNI? */

The KNI Laboratory offers full-service work for internal (Caltech/JPL) customers as well as external customers from industry, government, and academia. We welcome electron beam lithography requests, in addition to other device fabrication needs. Full-service work is project dependent on staff availability, timeline, and scope, and will be reviewed by KNI technical staff. This page covers the pricing for external full-service customers. KNI offers no guarantees for the end product.

'''Note:''' Internal customers (Caltech/JPL) interested in full-service work: review the details [[Usage Rates|'''here''']].

=== Why KNI? ===

* '''Full process flows:''' resist coating through etch/deposition to final device, under one roof
* '''Experienced staff:''' fill-time expert engineers managing tools daily
* '''Caltech ecosystem:''' proximity to world-class research in photonics, quantum, and materials
* '''IP-secure:''' NDA option to protect ownership and inventorship rights

=== Application Areas ===

* '''Quantum devices''' — superconducting qubits, ion trap electrodes, single-photon sources
* '''Photonic integrated circuits''' — waveguides, grating couplers, ring resonators, metasurfaces
* '''AR/VR optics''' — diffractive waveguide masters, surface-relief gratings, metalenses
* '''RF & III-V devices''' — HEMT gates, fine-pitch test structures, GaAs/GaN/InP
* '''Sensors & MEMS''' — IR detectors, nanoelectromechanical systems, biomedical devices
* '''Mask fabrication''' — photomask writing for optical lithography step-and-repeat

=== Cost ===
The prices below are for industry customers (for-profit entities). If you are a non-Caltech academic or government customer, please contact us for the rates. Rates are effective October 1, 2025.
{| class="wikitable"
|'''Resource'''
|'''Hourly Rate (excluding admin fee)'''
|-
|Technical Staff Effort
|$ 200.00
|-
|EBPG 5000+ or 5200
|$ 442.00
|-
|Nova 600 FIB
|$ 255.00
|-
|III-V Cobra ALE Etcher
|$ 204.00
|-
|PlasmaPro PECVD (oxide, nitride)
|$ 204.00
|-
|FlexAL II ALD/ALE
|$ 170.00
|-
|Legacy PlasmaLab PECVD (silicon)
|$ 136.00
|-
|Legacy Oxford Etchers (DRIE, III-V, Dielectric)
|$ 136.00
|-
|Nanoscribe PPGT (2D/3D print)
|$ 17.00
|-
|Administrative Fee (per transaction)
|$ 340.00
|}
'''''Note:''' The prices shown here include Caltech's indirect cost rate.''

=== To get started ===
Send an email with your project description and timeline needs to [mailto:kni@caltech.edu kni@caltech.edu]. We will review the request and send a price estimate based on the information provided. We require a purchase order to initiate the full-service work.

Full Service Rates

2026-04-21T22:30:14Z

Tkimoto:

The KNI Laboratory offers full-service work for internal (Caltech/JPL) customers as well as external customers from industry, government, and academia. We welcome electron beam lithography requests, in addition to other device fabrication needs. Full-service work is project dependent on staff availability, timeline, and scope, and will be reviewed by KNI technical staff. This page covers the pricing for external full-service customers. KNI offers no guarantees for the end product.

'''Note:''' Internal customers (Caltech/JPL) interested in full-service work: review the details [[Usage Rates|'''here''']].

=== Why KNI? ===

* '''Full process flows:''' resist coating through etch/deposition to final device, under one roof
* '''Experienced staff:''' fill-time expert engineers managing tools daily
* '''Caltech ecosystem:''' proximity to world-class research in photonics, quantum, and materials
* '''IP-secure:''' NDA option to protect ownership and inventorship rights

=== Application Areas ===

* '''Quantum devices''' — superconducting qubits, ion trap electrodes, single-photon sources
* '''Photonic integrated circuits''' — waveguides, grating couplers, ring resonators, metasurfaces
* '''AR/VR optics''' — diffractive waveguide masters, surface-relief gratings, metalenses
* '''RF & III-V devices''' — HEMT gates, fine-pitch test structures, GaAs/GaN/InP
* '''Sensors & MEMS''' — IR detectors, nanoelectromechanical systems, biomedical devices
* '''Mask fabrication''' — photomask writing for optical lithography step-and-repeat

=== '''Cost''' ===
The prices below are for industry customers (for-profit entities). If you are a non-Caltech academic or government customer, please contact us for the rates. Rates are effective October 1, 2025.
{| class="wikitable"
|'''Resource'''
|'''Hourly Rate (excluding admin fee)'''
|-
|Technical Staff Effort
|$ 200.00
|-
|EBPG 5000+ or 5200
|$ 442.00
|-
|Nova 600 FIB
|$ 255.00
|-
|III-V Cobra ALE Etcher
|$ 204.00
|-
|PlasmaPro PECVD (oxide, nitride)
|$ 204.00
|-
|FlexAL II ALD/ALE
|$ 170.00
|-
|Legacy PlasmaLab PECVD (silicon)
|$ 136.00
|-
|Legacy Oxford Etchers (DRIE, III-V, Dielectric)
|$ 136.00
|-
|Nanoscribe PPGT (2D/3D print)
|$ 17.00
|-
|Administrative Fee (per transaction)
|$ 340.00
|}
'''''Note:''' The prices shown here include Caltech's indirect cost rate.''

=== '''To get started''' ===
Send an email with your project description and timeline needs to [mailto:kni@caltech.edu kni@caltech.edu]. We will review the request and send a price estimate based on the information provided. We require a purchase order to initiate the full-service work.

Usage Rates

2026-04-21T22:29:17Z

Tkimoto:

'''Overview of KNI Lab User Fees''' 
''Rates below are valid beginning October 1, 2025 and are subject to change''

* Fees are incurred on a pay-as-you-go basis (tools are charged by the hour or portion thereof).
* Lab users do '''NOT''' incur lab fees during days or months of non-use.
*Invoices are issued monthly.

'''Note: New users must submit a [[Membership_Forms | New User Form]] and attend general KNI Lab safety training before lab access is granted.'''

==Caltech & JPL User Rates==
Below is a table of ''direct'' hourly rates for lab and equipment use in the KNI Laboratory. Hourly rates are applied to an individual's actual usage in the KNI Lab. Rates do '''not''' include any applicable indirect charges, such as F&A fees. F&A (overhead) will be applied separately based on the customer's PTA type. Rates are valid beginning October 1, 2025 and are subject to change.

{| class="wikitable" style="width: 90%;"
|-
! scope="col" style="text-align:left; width: 40%" |Tool Name
! scope="col" style="text-align:left; width: 40%" |Resource Area
! scope="col" style="text-align:center; width: 20%" |Hourly Rate
|-
! scope="col" style="text-align:left; background-color:#ffd8b4;" |General Lab
! scope="col" style="text-align:left; background-color:#ffe7d1;" |See details below
! scope="col" style="text-align:center; background-color:#FFFFFF;" |$43/hr
|-
! scope="col" style="text-align:left; background-color:#ffd8b4;" |Raith EBPG 5000+ and 5200 Electron Beam Writers
! scope="col" style="text-align:left; background-color:#ffe7d1;" |Electron Beam Lithography (EBL)
! scope="col" style="text-align:center; background-color:#FFFFFF;" |$130/hr
|-
! scope="col" style="text-align:left; background-color:#ffd8b4;" |FEI Nova 600 Dualbeam Focused Ion Beam
! scope="col" style="text-align:left; background-color:#ffe7d1;" | Microscopy, Focused Ion Beam (FIB)
! scope="col" style="text-align:center; background-color:#FFFFFF;" |$75/hr
|-
! scope="col" style="text-align:left; background-color:#ffd8b4;" |Oxford Cobra III-V ALE Etch System (available soon)
! scope="col" style="text-align:left; background-color:#ffe7d1;" |Etch, RIE
! scope="col" style="text-align:center; background-color:#FFFFFF;" |$60/hr
|-
! scope="col" style="text-align:left; background-color:#ffd8b4;" |Oxford PECVD "2" - oxides and nitrides
! scope="col" style="text-align:left; background-color:#ffe7d1;" | Deposition, Chemical Vapor
! scope="col" style="text-align:center; background-color:#FFFFFF;" |$60/hr
|-
! scope="col" style="text-align:left; background-color:#ffd8b4;" |Oxford FlexAl ALD/ALE System
! scope="col" style="text-align:left; background-color:#ffe7d1;" |Deposition, Chemical Vapor
! scope="col" style="text-align:center; background-color:#FFFFFF;" |$50/hr
|-
! scope="col" style="text-align:left; background-color:#ffd8b4;" |Oxford III-V Etch System
! scope="col" style="text-align:left; background-color:#ffe7d1;" | Etch, RIE
! scope="col" style="text-align:center; background-color:#FFFFFF;" |$40/hr
|-
! scope="col" style="text-align:left; background-color:#ffd8b4;" |Oxford Dielectric Etch System
! scope="col" style="text-align:left; background-color:#ffe7d1;" | Etch, RIE
! scope="col" style="text-align:center; background-color:#FFFFFF;" |$40/hr
|-
! scope="col" style="text-align:left; background-color:#ffd8b4;" |Oxford DRIE Etch System
! scope="col" style="text-align:left; background-color:#ffe7d1;" | Etch, RIE
! scope="col" style="text-align:center; background-color:#FFFFFF;" |$40/hr
|-
! scope="col" style="text-align:left; background-color:#ffd8b4;" |Oxford PECVD (legacy) - amorphous Si
! scope="col" style="text-align:left; background-color:#ffe7d1;" | Deposition, Chemical Vapor
! scope="col" style="text-align:center; background-color:#FFFFFF;" |$40/hr
|-
! scope="col" style="text-align:left; background-color:#ffd8b4;" |Nanoscribe PPGT
! scope="col" style="text-align:left; background-color:#ffe7d1;" | 2D/3D Print
! scope="col" style="text-align:center; background-color:#FFFFFF;" |$5/hr
|}

'''Academic Discount on General Cleanroom Usage'''

A 50% discount will be applied to the General Cleanroom rate for any cleanroom usage accrued ''after'' 40 hours per calendar month. The discounted hourly rate, $21.50, is only applied to the hours that exceed 40 in a given month.

Example: A user logs 50 hours in the cleanroom during the month of October. Their invoice will be: (40 x $43) + (10 x $21.50) = $1,935

'''General Lab use is counted as time spent in the KNI cleanroom facility. It includes access to the following resources:'''
*Atomic Force Microscope
*Critical Point Dryer
*Electron Beam Evaporators
*Laser Interference Lithography System
*He-Ne-Ga Ion Microscope (Orion Nanofab)
*Mask Aligners
*Parylene Coater
*Profilometer
*Rapid Thermal Processor
*Scanning Electron Microscopes (Quanta, Sirion)
*Scriber Breaker
*Spectroscopic Ellipsometer
*Tube Furnaces (Wet, Dry Oxide + Annealing)
*Wafer Stepper
*Wet Chemistry Room
*Wire Bonder
*XeF2 Silicon Etcher
*Other tools not listed in the table above
*Cleanroom PPE, basic supplies

'''Miscellaneous Rates'''
* Precious Metal (gold, platinum, etc.) usage will be billed the market rate, per gram/A.
* Staff-approved full service work is $100/hr.

==Full-Service Work Requests ==
KNI lab members and non-lab members can submit a request for full-service work performed by KNI technical staff using KNI equipment. The project will incur costs based on the actual usage of equipment (refer to rates above), as well as the following. '''Note:''' The rates shown here are the direct costs for internal (Caltech/JPL) customers. Overhead fees will be applied.
{| class="wikitable"
|Fees
|Price
|-
|Technical Staff Effort (hourly)
|$ 100.00
|-
|Equipment Hourly Use Fees (see pricing list above)
|$ varies
|-
|Administrative Fee (per transaction)
|$ 100.00
|}
'''To submit a request for full-service work''', contact the technical staff member in charge of the equipment you are interested in using, or send an email to [mailto:kni@caltech.edu kni@caltech.edu]. Requests will be reviewed and selected based on staff availability, agreement of scope, and turnaround timeline. A PTA must be provided in advance in order for work to begin. KNI offers no guarantees for the end product.

'''**External Customers interested in full-service work: [[Full Service Rates|see the information here]].**'''

==Overhead/Indirect Cost Rate ==
The KNI Lab charges for Non-Caltech Academic, Government, and Corporate KNI lab members are subject to Caltech's F&A (indirect/"overhead") rate. The F&A rate for fiscal year 2026 is 70%.
Internal (Caltech and JPL) users will also have overhead applied to their charges. The overhead is accounted for in the back end of the internal charging process and the overhead rate is dependent on the PTA used to pay for the KNI Lab fees. If you have questions about this, please discuss with your grants manager.

==External/Corporate Memberships==

The KNI Lab is open to external academic, government, industry, and startup organizations. Rates for industry and startups differ from the posted rates (above) for our internal academic users. All external users will be billed for Caltech's fiscal year overhead rate.

For information on the KNI external lab membership plan, please send an email to [mailto:tkimoto@caltech.edu tkimoto@caltech.edu] with details regarding 1) the number of people looking to join as KNI lab members, 2) equipment needs, 3) anticipated start date, and 4) information about the company. Startup companies may qualify for limited-term reduced rates.

'''Additional paperwork is required, including a Facilities Use Agreement, certificate of liability insurance that meets Caltech requirements, a purchase order, and an External Affiliate appointment.''' This process can take up to a few weeks, and all steps must be completed before an external user is able to start in the KNI Lab.

Full Service Rates

2026-04-21T22:25:34Z

Tkimoto:

The KNI Laboratory offers full-service work for internal (Caltech/JPL) customers as well as external customers from industry, government, and academia. We welcome electron beam lithography requests, in addition to other device fabrication needs. Full-service work is project dependent on staff availability, timeline, and scope, and will be reviewed by KNI technical staff. This page covers the pricing for external full-service customers. Internal customers (Caltech/JPL), please review the details [[Usage Rates|'''here''']].

=== Why KNI? ===

* '''Full process flows:''' resist coating through etch/deposition to final device, under one roof
* '''Experienced staff:''' fill-time expert engineers managing tools daily
* '''Caltech ecosystem:''' proximity to world-class research in photonics, quantum, and materials
* '''IP-secure:''' NDA option to protect ownership and inventorship rights

=== Application Areas ===

* '''Quantum devices''' — superconducting qubits, ion trap electrodes, single-photon sources
* '''Photonic integrated circuits''' — waveguides, grating couplers, ring resonators, metasurfaces
* '''AR/VR optics''' — diffractive waveguide masters, surface-relief gratings, metalenses
* '''RF & III-V devices''' — HEMT gates, fine-pitch test structures, GaAs/GaN/InP
* '''Sensors & MEMS''' — IR detectors, nanoelectromechanical systems, biomedical devices
* '''Mask fabrication''' — photomask writing for optical lithography step-and-repeat

=== '''Cost''' ===
The prices below are for industry customers (for-profit entities). If you are a non-Caltech academic or government customer, please contact us for the rates. Rates are effective October 1, 2025.
{| class="wikitable"
|'''Resource'''
|'''Hourly Rate (excluding admin fee)'''
|-
|Technical Staff Effort
|$ 200.00
|-
|EBPG 5000+ or 5200
|$ 442.00
|-
|Nova 600 FIB
|$ 255.00
|-
|III-V Cobra ALE Etcher
|$ 204.00
|-
|PlasmaPro PECVD (oxide, nitride)
|$ 204.00
|-
|FlexAL II ALD/ALE
|$ 170.00
|-
|Legacy PlasmaLab PECVD (silicon)
|$ 136.00
|-
|Legacy Oxford Etchers (DRIE, III-V, Dielectric)
|$ 136.00
|-
|Nanoscribe PPGT (2D/3D print)
|$ 17.00
|-
|Administrative Fee (per transaction)
|$ 340.00
|}
'''''Note:''' The prices shown here include Caltech's indirect cost rate.''

=== '''To get started''' ===
Send an email with your project description and timeline needs to [mailto:kni@caltech.edu kni@caltech.edu]. We will review the request and send a price estimate based on the information provided. We require a purchase order to initiate the full-service work.

Full Service Rates

2026-04-21T22:23:34Z

Tkimoto: /* To get started */

The KNI Laboratory offers full-service work for internal (Caltech/JPL) customers as well as external customers from industry, government, and academia. Full-service work is project dependent on staff availability, timeline, and scope, and will be reviewed by KNI technical staff.

KNI welcomes electron beam lithography requests, in addition to other device fabrication needs.

=== Why KNI? ===

* '''Full process flows:''' resist coating through etch/deposition to final device, under one roof
* '''Experienced staff:''' fill-time expert engineers managing tools daily
* '''Caltech ecosystem:''' proximity to world-class research in photonics, quantum, and materials
* '''IP-secure:''' NDA option to protect ownership and inventorship rights

=== Application Areas ===

* '''Quantum devices''' — superconducting qubits, ion trap electrodes, single-photon sources
* '''Photonic integrated circuits''' — waveguides, grating couplers, ring resonators, metasurfaces
* '''AR/VR optics''' — diffractive waveguide masters, surface-relief gratings, metalenses
* '''RF & III-V devices''' — HEMT gates, fine-pitch test structures, GaAs/GaN/InP
* '''Sensors & MEMS''' — IR detectors, nanoelectromechanical systems, biomedical devices
* '''Mask fabrication''' — photomask writing for optical lithography step-and-repeat

=== '''Cost''' ===
The prices below are for industry customers (for-profit entities). If you are a non-Caltech academic or government customer, please contact us for the rates. Rates are effective October 1, 2025.
{| class="wikitable"
|'''Resource'''
|'''Hourly Rate (excluding admin fee)'''
|-
|Technical Staff Effort
|$ 200.00
|-
|EBPG 5000+ or 5200
|$ 442.00
|-
|Nova 600 FIB
|$ 255.00
|-
|III-V Cobra ALE Etcher
|$ 204.00
|-
|PlasmaPro PECVD (oxide, nitride)
|$ 204.00
|-
|FlexAL II ALD/ALE
|$ 170.00
|-
|Legacy PlasmaLab PECVD (silicon)
|$ 136.00
|-
|Legacy Oxford Etchers (DRIE, III-V, Dielectric)
|$ 136.00
|-
|Nanoscribe PPGT (2D/3D print)
|$ 17.00
|-
|Administrative Fee (per transaction)
|$ 340.00
|}
'''''Note:''' The prices shown here include Caltech's indirect cost rate.''

=== '''To get started''' ===
Send an email with your project description and timeline needs to [mailto:kni@caltech.edu kni@caltech.edu]. We will review the request and send a price estimate based on the information provided. We require a purchase order to initiate the full-service work.

Full Service Rates

2026-04-21T22:23:10Z

Tkimoto: Created page with "The KNI Laboratory offers full-service work for internal (Caltech/JPL) customers as well as external customers from industry, government, and academia. Full-service work is project dependent on staff availability, timeline, and scope, and will be reviewed by KNI technical staff. KNI welcomes electron beam lithography requests, in addition to other device fabrication needs. === Why KNI? === * '''Full process flows:''' resist coating through etch/deposition to final de..."

The KNI Laboratory offers full-service work for internal (Caltech/JPL) customers as well as external customers from industry, government, and academia. Full-service work is project dependent on staff availability, timeline, and scope, and will be reviewed by KNI technical staff.

KNI welcomes electron beam lithography requests, in addition to other device fabrication needs.

=== Why KNI? ===

* '''Full process flows:''' resist coating through etch/deposition to final device, under one roof
* '''Experienced staff:''' fill-time expert engineers managing tools daily
* '''Caltech ecosystem:''' proximity to world-class research in photonics, quantum, and materials
* '''IP-secure:''' NDA option to protect ownership and inventorship rights

=== Application Areas ===

* '''Quantum devices''' — superconducting qubits, ion trap electrodes, single-photon sources
* '''Photonic integrated circuits''' — waveguides, grating couplers, ring resonators, metasurfaces
* '''AR/VR optics''' — diffractive waveguide masters, surface-relief gratings, metalenses
* '''RF & III-V devices''' — HEMT gates, fine-pitch test structures, GaAs/GaN/InP
* '''Sensors & MEMS''' — IR detectors, nanoelectromechanical systems, biomedical devices
* '''Mask fabrication''' — photomask writing for optical lithography step-and-repeat

=== '''Cost''' ===
The prices below are for industry customers (for-profit entities). If you are a non-Caltech academic or government customer, please contact us for the rates. Rates are effective October 1, 2025.
{| class="wikitable"
|'''Resource'''
|'''Hourly Rate (excluding admin fee)'''
|-
|Technical Staff Effort
|$ 200.00
|-
|EBPG 5000+ or 5200
|$ 442.00
|-
|Nova 600 FIB
|$ 255.00
|-
|III-V Cobra ALE Etcher
|$ 204.00
|-
|PlasmaPro PECVD (oxide, nitride)
|$ 204.00
|-
|FlexAL II ALD/ALE
|$ 170.00
|-
|Legacy PlasmaLab PECVD (silicon)
|$ 136.00
|-
|Legacy Oxford Etchers (DRIE, III-V, Dielectric)
|$ 136.00
|-
|Nanoscribe PPGT (2D/3D print)
|$ 17.00
|-
|Administrative Fee (per transaction)
|$ 340.00
|}
'''''Note:''' The prices shown here include Caltech's indirect cost rate.''

=== '''To get started''' ===
Send an email with your project description and timeline to [mailto:kni@caltech.edu kni@caltech.edu]. We will review the request and send a price estimate based on the information provided. We require a purchase order to initiate the full-service work.

Equipment List

2026-04-21T22:14:50Z

Tkimoto:

'''NOTE: For EQUIPMENT TRAINING, make a training request via FBS. See link to instructions:''' [[FBS Instructions | FBS Instructions]]

== Lithography ==
===== Electron Beam Lithography =====
* [[EBPG 5200: 100 kV Electron Beam Lithography | Electron Beam Pattern Generator: Raith EBPG 5200 (100 kV)]]
* [[EBPG 5000+: 100 kV Electron Beam Lithography | Electron Beam Pattern Generator: Raith EBPG 5000+ (100 kV)]]
* [[Quanta 200F: SEM, ESEM, Lithography & Probe Station | Nanometer Pattern Generation System: Thermo Fisher Quanta 200F SEM with NPGS (1-30 kV)]]

===== Ion Beam Lithography =====
* [[ORION NanoFab: Helium, Neon & Gallium FIB | He/Ne/Ga-FIB: Zeiss ORION NanoFab with Raith ELPHY MultiBeam Pattern Generator (5-40 kV He & Ne, 1-30 kV Ga)]]
* [[Nova 600 NanoLab: SEM, Ga-FIB, GIS & Omniprobe | Ga-FIB, SEM, GIS & Omniprobe: Thermo Fisher Nova 600 NanoLab]]
===== Optical Lithography =====
* [[Contact Mask Aligners: MA6 & MA6/BA6 | Contact Mask Aligners: Suss MicroTec models MA6 & MA6/BA6]]
* [[Wafer Stepper | i-Line Wafer Stepper: GCA model 6300]]
* [[CNI-PV 2.1: Nano Imprint Lithography | Nano Imprint Lithography: NILT CNI-PV 2.1]]
* [[DWL-66: Direct-Write Laser System | Direct-Write Laser System: Heidelberg Instruments DWL-66]]
* [[Nanoscribe PPGT: Microscale 3D Printer | Two-Photon Lithography (aka Microscale 3D Printing): Nanoscribe Photonic Professional GT]]
* [[Optical Lithography Resources]]

== Deposition ==
===== Evaporation =====
* [[Labline: Electron Beam Evaporator | Metals (Al, Au, Pt & Ti): Kurt J Lesker Labline Electron Beam Evaporator]]

* [[Carbon Evaporator | Conductive thin film deposition: Leica EM ACE600 Carbon Evaporator & Sputter Coater]]
* [[AJA Orion ATC Series Electron Beam Evaporator | Metals & Oxides: AJA Orion ATC Series Electron Beam Evaporator]]

===== Sputtering =====
* [[ATC Orion 8: Dielectric Sputter System | Dielectric Sputter System: AJA International ATC Orion 8]]
* [[ATC Orion 8: Chalcogenide Sputter System | Chalcogenide Sputter System: AJA International ATC Orion 8]]

===== Chemical Vapor Deposition (CVD) =====
* [[FlexAL II: Atomic Layer Deposition (ALD) | Atomic Layer Deposition (ALD): Oxford Instruments FlexAL II]]
* [[Oxide/Nitride Deposition: Oxford Instruments PlasmaPro System 100 PECVD | Oxide/Nitride Deposition: Oxford Instruments PlasmaPro System 100 PECVD]]
* [[Silicon Deposition: Oxford Instruments Plasmalab System 100 PECVD | Silicon Deposition: Oxford Instruments Plasmalab System 100 PECVD]]

===== Dielectric Packaging / Moisture Barrier =====
* [[Parylene Coater | Parylene Coater: Para Tech LabTop 3000]]

== Etching ==
===== Dry Etching =====
* [[DRIE: Bosch & Cryo ICP-RIE for Silicon | Silicon Etcher: Oxford Instruments DRIE System 100 Bosch & Cryo ICP-RIE]]
* [[ICP-RIE: III-V, Metal & Silicon Etcher | III-V Material, Metal & Silicon Etcher: Oxford Instruments System 100 ICP-RIE]]
* [[ICP-RIE: Dielectric Etcher | Dielectric Material Etcher: Oxford Instruments Dielectric System 100 ICP-RIE]]

* [[Tergeo Plus ICP- & CCP-RIE: Oxygen & Argon Plasma Cleaner | Oxygen & Argon Plasma Cleaner: PIE Scientific Tergeo Plus ICP- & CCP-RIE]]
* [[XeF2 Etcher for Silicon | XeF2 Etcher for Silicon]]

===== Wet Etching =====
* [[Wet Chemistry | Available Wet Etching Techniques]]

== Microscopy ==
===== KNI Microscopy Policies =====
* [https://caltech.box.com/s/rpbtox8l31qi3kw3b014e3e8i4ctjpdy KNI Microscopy Policies]

===== Microscopy High Performance PC =====
*[[Information on the 3D reconstruction PC | Microscopy High Perfomance PC for 3D reconstruction and data processing]]

===== Guide to Choosing KNI SEMs & FIBs =====
*[[Guide to Choosing KNI SEMs & FIBs | Consult this guide for help in choosing the best SEMs and FIBs for your work]]

===== Focused Ion Beam (FIB) Systems =====
* [[ORION NanoFab: Helium, Neon & Gallium FIB | Helium, Neon & Gallium FIB: Zeiss ORION NanoFab]]
* [[Nova 600 NanoLab: SEM, Ga-FIB, GIS & Omniprobe | SEM, Ga-FIB, GIS & Omniprobe: Thermo Fisher Nova 600 NanoLab]]
===== Scanning Electron Microscopes (SEMs) =====

* [[Sirion: SEM & EDS | Sirion: FESEM]]
* [[Quanta 200F: SEM, ESEM, Lithography & Probe Station | SEM, ESEM, Lithography & Probe Station: Thermo Fisher Quanta 200F]]
* [[Nova 600 NanoLab: SEM, Ga-FIB, GIS & Omniprobe|SEM, Ga-FIB, EDS, GIS & Omniprobe: Thermo Fisher Nova 600 NanoLab]]




===== Scanning Probe Microscopes =====
* [[Dimension Icon: Atomic Force Microscope (AFM) | Atomic Force Microscope (AFM): Bruker Dimension Icon]]
* [[Dektak 3ST: Profilometer | Profilometer: Veeco Dektak 3ST]]

===== Optical Characterization =====
* [[Digital Microscope Keyence VHX7000 | Digital Microscope and Camera: Keyence HVX-7000]]
* [[Fluorescence Microscope | Fluorescence Microscope: Olympus IX81]]
* [[Light Microscope with Spectroscopic Reflectometer | Light Microscope: Olympus BX51M with Filmetrics Spectroscopic Reflectometer]]
* [[Spectroscopic Ellipsometer | Spectroscopic Ellipsometer: Woolam M-2000]]
* [[Profilometer: Keyence VK-X3000 | Optical Profilometer: Keyence VK-X3000]]

===== Sample Preparation for Microscopy =====
* [[Carbon Evaporator | Conductive thin film deposition: Leica EM ACE600 Carbon Evaporator & Metal Sputter Coater]]
* [[Tergeo Plus ICP- & CCP-RIE: Oxygen & Argon Plasma Cleaner | Oxygen & Argon Plasma Cleaner (Tergeo Plus ICP- & CCP-RIE) to remove hydrocarbons from surface]]


===== Stubs for specimen mounting =====
* Stubs used for mounting specimens are considered a personal, consumable item in the KNI. There are some stubs at each Microscope which can be used by any KNI microscopy user. You can also buy your own stubs so that you can keep them clean and available to you. There are many stub geometries and configurations. If you chose to buy your own stubs, please show them to the staff microscopist prior to using them: some stubs including stubs with copper clips have large height differences and can only be used safely in specific operating conditions.


== Wet Chemistry ==
===== Wet Chemistry Main page=====
* [[Wet Chemistry | Wet Chemistry page:]]
- Facilities Procedures & Safety

- List of Chemicals Supplied by KNI with Safety Data Sheets

- List of Chemicals Approved for use in the KNI cleanroom (not supplied by KNI) with Safety Data Sheets

- Requesting New Chemicals for use in the KNI cleanroom

===== Wet Chemistry Safety page=====
* [[Wet Chemistry Safety | Wet Chemistry Safety page]]
- PPE Overview

-Hazardous Waste Handling and Labeling

-Decanting Chemicals

-Hot Plate Rules

-KNI Buddy System

-Secondary Containment and Other Best Practices.

===== Wet Chemistry Resources page=====
* [[Wet Chemistry Resources | Wet Chemistry Resources page]]
- Contains fabrication recipes and procedures.

== Support Tools ==
===== Equipment Status =====

===== Thermal Processing =====
* [[Tube Furnaces for Wet & Dry Processing | Tube Furnaces: Tystar Tytan 1 & 2 (Wet & Dry Oxidation and Annealing)]]
* [[Rapid Thermal Processor | Rapid Thermal Processing: Solaris 150]]
===== Substrate Processing =====
* [[Scriber-Breaker | Scriber-Breaker: Dynatex GST-150]]

* [[Critical Point Dryer | Critical Point Dryer: Tousimis Automegasamdri 915B]]
===== Device Processing =====
* [[Wedge-Wedge Wire Bonder | Wedge-Wedge Wire Bonder: Westbond model 7476D-79]]
* [[Electrical Probing Station | Electrical Probing Station: Cascade Microtech M150]]
===== Metrology =====
* [[Profilometer: Keyence VK-X3000 |Optical Profilometer: Keyence VK-X3000]]
* [[Dektak 3ST: Profilometer | Stylus Profilometer: Veeco Dektak 3ST]]
* [[Digital Microscope Keyence VHX7000 | Digital Microscope and Camera: Keyence HVX-7000]]
* [[Electrical Probing Station | Electrical Probing Station: Cascade Microtech M150]]
* [[Spectroscopic Ellipsometer | Spectroscopic Ellipsometer: Woolam M-2000]]
* [[Light Microscope with Spectroscopic Reflectometer | Light Microscope: Olympus BX51M with Filmetrics Spectroscopic Reflectometer]]
* Light Microscope Nikon L200 / Nikon Camera - [https://caltech.box.com/s/3sxmh6pt073a7qgpohgzjdl53acmr2ho Nikon L200/L200D Manual], [https://caltech.box.com/s/4fmfx7mazcdpjy0edqbgi4e1jbb7azdy Nikon L200 Operation Quick Reference]

===== Sample Preparation =====

* [[Carbon Evaporator | Carbon Evaporator (Leica EM ACE600) to make samples conductive]]
* [[Tergeo Plus ICP- & CCP-RIE: Oxygen & Argon Plasma Cleaner | Oxygen & Argon Plasma Cleaner (Tergeo Plus ICP- & CCP-RIE) to remove hydrocarbons from surface]]

MediaWiki:Sidebar

2026-04-21T21:54:46Z

Tkimoto:

* SEARCH
* navigation
** Lab Rules & Safety|Lab Rules & Safety
** Equipment List|Equipment List
** Lab Phone List|Lab Phone List
** KNI Staff Members|KNI Staff List
** New Members|Join the KNI Lab


* Equipment
** Equipment_List#Lithography|Lithography
** Equipment_List#Deposition|Deposition
** Equipment_List#Etching|Etching
** Equipment_List#Microscopy|Microscopy
** Equipment_List#Wet Chemistry|Wet Chemistry
** Equipment_List#Support Tools|Support Tools

* Resources
** https://caltech.box.com/s/fd1zf5fanzimlpuopwmtai6vqqh5dv8s|Document Library
** Process Recipe Library|Process Recipes
** https://www.youtube.com/channel/UCWbGhTKjT6wv7T4sZ23E7WQ|Video Tutorials on YouTube
** Presentations|Presentations
** https://caltech.box.com/s/tmqnu5x7ms6onfln2klzowazyrkvhqrh|KNI User Handbook

** FBS Instructions|FBS Instructions

** Acknowledge the KNI|Acknowledge the KNI & Logo
** Directions to the KNI Lab|Directions to the KNI

* Lab User Information
** Usage Rates|Usage Rates
** New Members|Join the KNI Lab
** Full Service Rates|Full Service Rates
** https://caltech.box.com/s/cqqpgx4jolgvw76n03rjaxahmj4003wb|KNI Lab Process Sheet
** https://mh-fbs1.caltech.edu/Anon/Logon.aspx | FBS Sign-In
** https://mh-fbs1.caltech.edu/Anon/Resources.aspx?f=613&dpv=1&dpd=2025-08-01 | Public FBS Calendar


* Other Websites
** http://kni.caltech.edu | kni.caltech.edu
** http://www.caltech.edu | caltech.edu

* TOOLBOX
** helppage|help-mediawiki
** mainpage|mainpage-description
** recentchanges-url|recentchanges

* LANGUAGES

MediaWiki:Sidebar

2026-04-21T21:52:00Z

Tkimoto:

* SEARCH
* navigation
** Lab Rules & Safety|Lab Rules & Safety
** KNI Staff Members|KNI Staff List
** Equipment List|Equipment List
** Lab Phone List|Lab Phone List
** New Members|Join the KNI Lab


* Equipment
** Equipment_List#Lithography|Lithography
** Equipment_List#Deposition|Deposition
** Equipment_List#Etching|Etching
** Equipment_List#Microscopy|Microscopy
** Equipment_List#Wet Chemistry|Wet Chemistry
** Equipment_List#Support Tools|Support Tools

* Resources
** https://caltech.box.com/s/fd1zf5fanzimlpuopwmtai6vqqh5dv8s|Document Library
** Process Recipe Library|Process Recipes
** https://www.youtube.com/channel/UCWbGhTKjT6wv7T4sZ23E7WQ|Video Tutorials on YouTube
** Presentations|Presentations
** https://caltech.box.com/s/tmqnu5x7ms6onfln2klzowazyrkvhqrh|KNI User Handbook

** FBS Instructions|FBS Instructions

** Acknowledge the KNI|Acknowledge the KNI
** Acknowledge the KNI|KNI Logo
** Directions to the KNI Lab|Directions to the KNI

* Lab User Information
** Usage Rates|Usage Rates
** New Members|Join the KNI Lab
** https://caltech.box.com/s/cqqpgx4jolgvw76n03rjaxahmj4003wb|KNI Lab Process Sheet
** https://mh-fbs1.caltech.edu/Anon/Logon.aspx | FBS Sign-In
** https://mh-fbs1.caltech.edu/Anon/Resources.aspx?f=613&dpv=1&dpd=2025-08-01 | Public FBS Calendar


* Other Websites
** http://kni.caltech.edu | kni.caltech.edu
** http://www.caltech.edu | caltech.edu

* TOOLBOX
** helppage|help-mediawiki
** mainpage|mainpage-description
** recentchanges-url|recentchanges

* LANGUAGES

New Members

2026-04-20T22:10:07Z

Tkimoto: /* Step 1: Submit Your KNI New User Form */

==Joining the KNI Lab==
The KNI Laboratory (KNI Lab) is an open-access facility for Caltech and JPL students and researchers, as well as external academic, government and industry users. Equipment and resource use is billed on a per hour basis. Customers are invoiced monthly for their use. You can find information on our [[Usage_Rates | usage rates here]].

If you have general process questions or technical questions about KNI Lab resources, please email Associate Director of Technical Operations [mailto:derose@caltech.edu Dr. Guy DeRose]. Provide as much detail as possible to ensure an efficient and timely response.

Note: There are additional requirements for external users to join the KNI Lab (see below). Please allow more time for processing.

==Step 1: Submit Your KNI New User Form==
Internal researchers, fill out this online form:
* [https://airtable.com/app2vjzgp8AJpuC3A/pagHxiNohQX8G65DZ/form Caltech / JPL Users]
External researchers, fill out the appropriate form below and email it to [mailto:kni@caltech.edu kni@caltech.edu], along with a description of your project and the tools you need to use in the KNI Lab. Review the sections below for additional requirements.
* [https://caltech.box.com/s/26w5srmths37kybjaismwwyc70y1qeiz Non-Caltech Academic or Government Users]
* [https://caltech.box.com/s/qkoz644x7f77grfgg9fi3wbc0v7j0ogn Industry / Corporate Users]

==Step 2: Submit Your Process Description Form (if needed)==
After you have submitted your new user form, you may contact [mailto:derose@caltech.edu Guy DeRose] for general process questions. Attach the
[https://caltech.box.com/s/kxkb44hdjhkw8rbj3pl9v6lh29h6b166 KNI Lab New Process Description form] to your email inquiry.

==Step 3: Safety Training==
All new lab users are required to attend the KNI-specific lab safety training, as well as Caltech's Laboratory Safety Orientation which is managed by Caltech's Environmental Health and Safety (EHS) department.

After submitting your new user form, you will receive an email from a KNI staff member with all necessary information to prepare for the KNI-specific safety training session. These sessions are held weekly, every Friday at 1 pm via Zoom.

Caltech's EHS Laboratory Safety Orientation is required if you are using any lab on campus. The training is offered by EHS via Zoom twice a month. If you have not taken EHS Lab Safety Orientation, instructions to register for this training can be found here: [https://www.safety.caltech.edu/root-pages/lab-safety-orientation Caltech's EHS Lab Safety Orientation]

''Note: You may start and complete KNI safety training before completing the EHS safety training. However, you must complete EHS Laboratory Safety Orientation in order to complete your onboarding and gain access to the KNI Lab.''

==Step 4: Setting Up Your Lab User Accounts & Access==
After you complete the mandatory KNI Lab new user safety training, you will receive an email from KNI Administrator Sydney Garstang with further instructions on setting up your KNI Lab user accounts. You will need to coordinate a time to stop by her office and have your ID card scanned so that it is registered in our lab management system. This will allow you to swipe into the KNI Lab's entrance as well as login to the Lab's [https://mh-fbs1.caltech.edu/ tool reservation system (FBS)].

All KNI Lab users are required to join the KNI Lab Slack workspace for timely and important lab updates, as well as FBS, the KNI Lab's user and tool management software system. Be sure to complete your FBS User account activation when you receive the FBS Welcome Email. If you have any trouble logging into our FBS Facility page ("Kavli Nanoscience Institute (KNI"), email kni@caltech.edu.

Read the [https://caltech.box.com/s/vzxxbvgcgh5pijrf77bqga0bv8mzubad FBS User SOP] for instructions on how to request training, schedule & change tool reservations, setting up your User account, notifications, and billing details.

All KNI Lab users are also signed up to the kni-notice email list.

==Step 5: Tool-Specific Training==
Requests for specific equipment training must be submitted through the [https://mh-fbs1.caltech.edu/ User Activity Dashboard] in FBS. From the User Dashboard, scroll down to find the name of the tool you need to use, click the "Request Training" link, then provide any useful information about why you need training on the specific tool -- also be sure to include your availability for the next two weeks.

After you submit your initial training request, the KNI technical staff member in charge of the tool will receive a notification and will contact you to schedule your first training session. Once a day/time has been agreed upon, you make go directly to the FBS Calendar (scheduler) and initiate an "Assisted Use" reservation. The staff member will receive an email notification and approve the reservation.

To schedule additional (second, third, etc.) training sessions, follow the same procedure: first submit the request from the FBS User Dashboard tool list, and after a day/time is set with the staff member, go to the FBS Calendar to initiate an "Assisted Use" reservation for the agreed-upon day/time.

Refer to our [https://lab.kni.caltech.edu/Equipment_List Equipment List] page for details on all of the resources in the KNI Lab.

''Note: Users are only charged for equipment use time during training sessions. There is no additional fee (i.e. staff time) for training sessions.''

==External Users==
Non-Caltech Academic, Government, and For-profit/Commercial researchers are considered external users.

Additional documents are required to set up an external user's KNI Lab access. Refer to the [https://caltech.box.com/s/urw7mwljz8jxv2d3s036h6kwx2mb8se8 External Lab User Membership Checklist] to ensure timely processing. All documentation must be completed and approved before KNI Lab access is granted.

If you are interested in joining the KNI Lab as an external user, '''please fill out the online [https://airtable.com/app2vjzgp8AJpuC3A/pagHxiNohQX8G65DZ/form New User Form]'''. Have a purchase order and your CV ready to upload.

'''Note''': all external users are required to hold a formal appointment at Caltech. If you do not have one (e.g. Visitor, External Affiliate, VURP, etc.), KNI will arrange an External Affiliate appointment for you. The appointment process is handled by Caltech HR and goes through reviews by Caltech offices, including Research Security and Compliance. Please be aware that the appointment setup and review process may take a few weeks.

If you have any questions, please contact kni@caltech.edu.

==KNI Member Offboarding==
Users who no longer need to use the KNI Lab must send a notification email to [mailto:kni@caltech.edu kni@caltech.edu] and complete the offboarding process before their last day. Please review the [https://caltech.box.com/s/qapv4ytu4uhyszz538rz4k55mvdihyix KNI Member Offboarding SOP]. The SOP lists items such as Stored Items, Chemicals, Stored Data/Files, etc, which should to be addressed before your membership ends.

Wafer Stepper

2026-04-14T18:43:32Z

Tkimoto:

{{InstrumentInfoboxOneImage|
|InstrumentName = Stepper
|HeaderColor = #FFFFFF
|ImageOne = I-Line-Wafer-Stepper GCA-6300.jpg
|ImageTwo =
|InstrumentType = [[Equipment_List#Lithography|Lithography]]
|RoomLocation = B217 Steele
|LabPhone = 626-395-3423
|PrimaryStaff = [[Guy A. DeRose, PhD]]
|StaffEmail = derose@caltech.edu
|StaffPhone = 626-395-3423
|Manufacturer = GCA
|Model = 6300
|Techniques = Wafer Patterning, Pattern Alignments
|EmailList = kni-photolith
|EmailListName = Photolithography
}}
== Description ==
The 6000 Series DSW Wafer Stepper wafer exposure system is fully automatic and capable of exposing an array of images directly on photoresist-coated wafers. Image field size is dependent on the lens selected for the user's particular application. The lens in this system is a Zeiss 10X with a maximum field size of 10 mm x 10 mm. This reduces the pattern from the reticle by a factor of 10 onto the substrate. The KNI stepper has paddles for wafer handling to accommodate 2-, 3-, 4-, 6-, and 8-inch wafers as well as pieces. The stepper is located inside of an environmental chamber set to maintain +/-0.1 °C temperature control.

Software allows conversational input dialogue to reduce errors and simplify the specification of complex operating parameters, a part of which permits selection of either circular of rectangular arrays on the wafer. A laser position transducer with automatic compensation for atmospheric conditions and work piece temperature is employed to meter X- & Y-coordinate stage positioning over a 150 mm x 150 mm (6 in x 6 in) square exposable area. Maximum throughput is assured through use of X- & Y-coordinate stage speeds of up to 50 mm (2 in) per second and exposures in both directions of travel (boustrophedonic stepping). The GCA 6300 at KNI has been fully refurbished by RZE Enterprises with a new PC and control electronics.
===== Applications =====
* Step exposure with alignments
* Step exposure without alignments

== Resources ==
=== Specifications ===
* Spectral Line: 365 nm wavelength (aka "i-line") via Hg lamp
* System is setup for 4 inch wafers and pieces smaller than 100mm.

=== FBS Reservation Rules:===
{| class="wikitable"
|-
! !! Advanced Res (days) !! Limit per Res (hrs) !! Limit per week (hrs)
|-
| Weekday || 7 || 4 || 12
|-
| Weeknight || 7 || 6 || 18
|-
| Weekend || 14 || 6 || 18
|}
''' For reservations that DO NOT follow the reservation policy, email the tool manager BEFORE scheduling.'''
'' Your reservation can be cancelled at any time by the tool manager if it does not follow the tool reservation policy.''

=== SOPs ===
* [https://caltech.box.com/s/z6q0ovarnkwe1sec645uq8kti44r4jwc GCA 6300 Operation Quick Guide Reference]
* [https://caltech.box.com/s/o634f2xum216ah4lrmxy67nurxbt5iqg GCA 6300 Operation SOP]
* [https://caltech.box.com/s/kdcnpkzlkb3sz42elrs07wq8wstr8pvr GCA 6300 Power-up SOP]
Manufacturer Manuals
* [https://caltech.box.com/s/tq6pr3f9yldpfnr30kcx0jhre85541nz System Operation Manual]
* [https://caltech.box.com/s/87i1mym5d2nxluk4zim4wemf5zbhsm5w Advanced Operation & Utilization Manual]
* [https://caltech.box.com/s/1fzh7r5ceopxyamnss0i3gen7nashnnt Advanced Information Package]
* [https://caltech.box.com/s/h7jdk8uxhfygcuhx0e0a3jsrlp0q4ztq Reticle Handbook]
* [https://caltech.box.com/s/m6wb60586w93z2ys8emz8nhg8e0yxtv3 Baseline Procedure]
* [https://caltech.box.com/s/kqn62mmqrslz8x8bm2t7qqybjqulrosu Acceptance Test Procedures]

=== Optical Lithography Resources ===
* [[Optical Lithography Resources | Optical Lithography Resources Page]]

== Related Instrumentation in the KNI ==
===== Optical Lithography =====
* [[Contact Mask Aligners: MA6 & MA6/BA6 | Contact Mask Aligners: Suss MicroTec models MA6 & MA6/BA6]]
* [[CNI-PV 2.1: Nano Imprint Lithography | Nano Imprint Lithography: NILT CNI-PV 2.1]]
* [[DWL-66: Direct-Write Laser System | Direct-Write Laser System: Heidelberg Instruments DWL-66]]
* [[Nanoscribe PPGT: Microscale 3D Printer | Two-Photon Lithography (aka Microscale 3D Printing): Nanoscribe Photonic Professional GT]]
* [[Optical Lithography Resources]]
===== Electron Beam Lithography =====
* [[EBPG 5200: 100 kV Electron Beam Lithography|EBPG 5200: 100 kV Electron Beam Lithography]]
* [[EBPG 5000+: 100 kV Electron Beam Lithography | EBPG 5000+: 100 kV Electron Beam Lithography]]
* [[Quanta 200F: SEM, ESEM, Lithography & Probe Station | Quanta 200F: SEM with 1-30 kV Electron Beam Lithography]]
* [[Tecnai TF-20: 200 kV TEM, STEM, EDS, EELS, EFTEM & Lithography | Tecnai TF-20: TEM & STEM with 80-200 kV Electron Beam Lithography]]
===== Ion Beam Lithography =====
* [[ORION NanoFab: Helium, Neon & Gallium FIB | ORION NanoFab: Helium (5-40 kV), Neon (5-35 kV) & Gallium (1-30 kV) Focused Ion Beam Lithography & Microscopy]]

Wafer Stepper

2026-04-14T18:43:06Z

Tkimoto:

{{InstrumentInfoboxOneImage|
|InstrumentName = Stepper
|HeaderColor = #FFFFFF
|ImageOne = I-Line-Wafer-Stepper GCA-6300.jpg
|ImageTwo =
|InstrumentType = [[Equipment_List#Lithography|Lithography]]
|RoomLocation = B217 Steele
|LabPhone = 626-395-3423
|PrimaryStaff = [[Guy DeRose]]
|StaffEmail = derose@caltech.edu
|StaffPhone = 626-395-3423
|Manufacturer = GCA
|Model = 6300
|Techniques = Wafer Patterning, Pattern Alignments
|EmailList = kni-photolith
|EmailListName = Photolithography
}}
== Description ==
The 6000 Series DSW Wafer Stepper wafer exposure system is fully automatic and capable of exposing an array of images directly on photoresist-coated wafers. Image field size is dependent on the lens selected for the user's particular application. The lens in this system is a Zeiss 10X with a maximum field size of 10 mm x 10 mm. This reduces the pattern from the reticle by a factor of 10 onto the substrate. The KNI stepper has paddles for wafer handling to accommodate 2-, 3-, 4-, 6-, and 8-inch wafers as well as pieces. The stepper is located inside of an environmental chamber set to maintain +/-0.1 °C temperature control.

Software allows conversational input dialogue to reduce errors and simplify the specification of complex operating parameters, a part of which permits selection of either circular of rectangular arrays on the wafer. A laser position transducer with automatic compensation for atmospheric conditions and work piece temperature is employed to meter X- & Y-coordinate stage positioning over a 150 mm x 150 mm (6 in x 6 in) square exposable area. Maximum throughput is assured through use of X- & Y-coordinate stage speeds of up to 50 mm (2 in) per second and exposures in both directions of travel (boustrophedonic stepping). The GCA 6300 at KNI has been fully refurbished by RZE Enterprises with a new PC and control electronics.
===== Applications =====
* Step exposure with alignments
* Step exposure without alignments

== Resources ==
=== Specifications ===
* Spectral Line: 365 nm wavelength (aka "i-line") via Hg lamp
* System is setup for 4 inch wafers and pieces smaller than 100mm.

=== FBS Reservation Rules:===
{| class="wikitable"
|-
! !! Advanced Res (days) !! Limit per Res (hrs) !! Limit per week (hrs)
|-
| Weekday || 7 || 4 || 12
|-
| Weeknight || 7 || 6 || 18
|-
| Weekend || 14 || 6 || 18
|}
''' For reservations that DO NOT follow the reservation policy, email the tool manager BEFORE scheduling.'''
'' Your reservation can be cancelled at any time by the tool manager if it does not follow the tool reservation policy.''

=== SOPs ===
* [https://caltech.box.com/s/z6q0ovarnkwe1sec645uq8kti44r4jwc GCA 6300 Operation Quick Guide Reference]
* [https://caltech.box.com/s/o634f2xum216ah4lrmxy67nurxbt5iqg GCA 6300 Operation SOP]
* [https://caltech.box.com/s/kdcnpkzlkb3sz42elrs07wq8wstr8pvr GCA 6300 Power-up SOP]
Manufacturer Manuals
* [https://caltech.box.com/s/tq6pr3f9yldpfnr30kcx0jhre85541nz System Operation Manual]
* [https://caltech.box.com/s/87i1mym5d2nxluk4zim4wemf5zbhsm5w Advanced Operation & Utilization Manual]
* [https://caltech.box.com/s/1fzh7r5ceopxyamnss0i3gen7nashnnt Advanced Information Package]
* [https://caltech.box.com/s/h7jdk8uxhfygcuhx0e0a3jsrlp0q4ztq Reticle Handbook]
* [https://caltech.box.com/s/m6wb60586w93z2ys8emz8nhg8e0yxtv3 Baseline Procedure]
* [https://caltech.box.com/s/kqn62mmqrslz8x8bm2t7qqybjqulrosu Acceptance Test Procedures]

=== Optical Lithography Resources ===
* [[Optical Lithography Resources | Optical Lithography Resources Page]]

== Related Instrumentation in the KNI ==
===== Optical Lithography =====
* [[Contact Mask Aligners: MA6 & MA6/BA6 | Contact Mask Aligners: Suss MicroTec models MA6 & MA6/BA6]]
* [[CNI-PV 2.1: Nano Imprint Lithography | Nano Imprint Lithography: NILT CNI-PV 2.1]]
* [[DWL-66: Direct-Write Laser System | Direct-Write Laser System: Heidelberg Instruments DWL-66]]
* [[Nanoscribe PPGT: Microscale 3D Printer | Two-Photon Lithography (aka Microscale 3D Printing): Nanoscribe Photonic Professional GT]]
* [[Optical Lithography Resources]]
===== Electron Beam Lithography =====
* [[EBPG 5200: 100 kV Electron Beam Lithography|EBPG 5200: 100 kV Electron Beam Lithography]]
* [[EBPG 5000+: 100 kV Electron Beam Lithography | EBPG 5000+: 100 kV Electron Beam Lithography]]
* [[Quanta 200F: SEM, ESEM, Lithography & Probe Station | Quanta 200F: SEM with 1-30 kV Electron Beam Lithography]]
* [[Tecnai TF-20: 200 kV TEM, STEM, EDS, EELS, EFTEM & Lithography | Tecnai TF-20: TEM & STEM with 80-200 kV Electron Beam Lithography]]
===== Ion Beam Lithography =====
* [[ORION NanoFab: Helium, Neon & Gallium FIB | ORION NanoFab: Helium (5-40 kV), Neon (5-35 kV) & Gallium (1-30 kV) Focused Ion Beam Lithography & Microscopy]]

Wafer Bonder

2026-04-14T18:36:29Z

Tkimoto:

{{InstrumentInfoboxOneImage|
|InstrumentName = Wafer Bonder
|HeaderColor = #E6E7E8
|ImageOne = Wafer-Bonder_Suss-SB6L.jpg
|ImageTwo =
|InstrumentType = [[Equipment_List#Support_Tools|Support Tools]], [[Equipment_List#Substrate_Processing|Substrate Processing]]
|RoomLocation = B217 Steele
|LabPhone = 626-395-4075
|PrimaryStaff = [[Nathan S. Lee]]
|StaffEmail = nathslee@caltech.edu
|StaffPhone = 626-395-4386
|Manufacturer = Suss Microtec
|Model = SBL6
|Techniques = Pressure/Heat Bonding
|RequestTraining = nathslee@caltech.edu
|EmailList = kni-sb6l
|EmailListName = Wafer Bonder
}}
== Description ==
The SB6L wafer bonder applies force and heat to the back side of two wafers in a vacuum chamber in order to bond them face to face. An automatic recipe can be created with control over bonding pressure, temperature, and chamber pressure as well as ramp & duration of any process step. Since heat and temperature can be controlled separately, temperature-sensitive materials such as polymers may be bonded.
===== Applications =====
* MEMS & Microelectronics Fabrication

== Resources ==
===== SOPs =====
* [https://caltech.box.com/s/jwm9iw0t64s7sznmzwjs32zjdjownts7 KNI SB6L SOP] - Operating Instructions for the Suss SB6L Wafer Bonder

===== Manufacturer Manuals =====
* [https://caltech.box.com/s/je95chbsbq3u14f3jchch4l79itshtb5 SB6L User Manual] - The SUSS SB6L Wafer Bonder System User Manual
* [https://caltech.box.com/s/fiy5cjzv01tf7b1vglc1nl0iv4uidgmp NP12 User Manual] - The SUSS NP 12™ Plasma Activation System User Manual
* [https://caltech.box.com/s/7pj89gepa98exkv7gyy3hmzs0gv3jo72 Suss Micro Tec Process Manual] -The Wafer Bonding Process Manual contains information on the different types of substrate bonding applications.

Wafer Bonder

2026-04-14T18:36:00Z

Tkimoto:

{{InstrumentInfoboxOneImage|
|InstrumentName = Wafer Bonder
|HeaderColor = #E6E7E8
|ImageOne = Wafer-Bonder_Suss-SB6L.jpg
|ImageTwo =
|InstrumentType = [[Equipment_List#Support_Tools|Support Tools]], [[Equipment_List#Substrate_Processing|Substrate Processing]]
|RoomLocation = B217 Steele
|LabPhone = 626-395-4075
|PrimaryStaff = [[Nathan Lee]]
|StaffEmail = nathslee@caltech.edu
|StaffPhone = 626-395-4386
|Manufacturer = Suss Microtec
|Model = SBL6
|Techniques = Pressure/Heat Bonding
|RequestTraining = nathslee@caltech.edu
|EmailList = kni-sb6l
|EmailListName = Wafer Bonder
}}
== Description ==
The SB6L wafer bonder applies force and heat to the back side of two wafers in a vacuum chamber in order to bond them face to face. An automatic recipe can be created with control over bonding pressure, temperature, and chamber pressure as well as ramp & duration of any process step. Since heat and temperature can be controlled separately, temperature-sensitive materials such as polymers may be bonded.
===== Applications =====
* MEMS & Microelectronics Fabrication

== Resources ==
===== SOPs =====
* [https://caltech.box.com/s/jwm9iw0t64s7sznmzwjs32zjdjownts7 KNI SB6L SOP] - Operating Instructions for the Suss SB6L Wafer Bonder

===== Manufacturer Manuals =====
* [https://caltech.box.com/s/je95chbsbq3u14f3jchch4l79itshtb5 SB6L User Manual] - The SUSS SB6L Wafer Bonder System User Manual
* [https://caltech.box.com/s/fiy5cjzv01tf7b1vglc1nl0iv4uidgmp NP12 User Manual] - The SUSS NP 12™ Plasma Activation System User Manual
* [https://caltech.box.com/s/7pj89gepa98exkv7gyy3hmzs0gv3jo72 Suss Micro Tec Process Manual] -The Wafer Bonding Process Manual contains information on the different types of substrate bonding applications.

New Members

2026-04-02T20:20:11Z

Tkimoto: /* Step 1: Submit Your KNI New User Form */

==Joining the KNI Lab==
The KNI Laboratory (KNI Lab) is an open-access facility for Caltech and JPL students and researchers, as well as external academic, government and industry users. Equipment and resource use is billed on a per hour basis. Customers are invoiced monthly for their use. You can find information on our [[Usage_Rates | usage rates here]].

If you have general process questions or technical questions about KNI Lab resources, please email Associate Director of Technical Operations [mailto:derose@caltech.edu Dr. Guy DeRose]. Provide as much detail as possible to ensure an efficient and timely response.

Note: There are additional requirements for external users to join the KNI Lab (see below). Please allow more time for processing.

==Step 1: Submit Your KNI New User Form==
Internal researchers, fill out this online form:
* [https://airtable.com/app2vjzgp8AJpuC3A/pagHxiNohQX8G65DZ/form Caltech / JPL Users]
External researchers, fill out the appropriate form below and email it to [mailto:kni@caltech.edu kni@caltech.edu]. Review the sections below for additional requirements.
* [https://caltech.box.com/s/26w5srmths37kybjaismwwyc70y1qeiz Non-Caltech Academic or Government Users]
* [https://caltech.box.com/s/qkoz644x7f77grfgg9fi3wbc0v7j0ogn Industry / Corporate Users]

==Step 2: Submit Your Process Description Form (if needed)==
After you have submitted your new user form, you may contact [mailto:derose@caltech.edu Guy DeRose] for general process questions. Attach the
[https://caltech.box.com/s/kxkb44hdjhkw8rbj3pl9v6lh29h6b166 KNI Lab New Process Description form] to your email inquiry.

==Step 3: Safety Training==
All new lab users are required to attend the KNI-specific lab safety training, as well as Caltech's Laboratory Safety Orientation which is managed by Caltech's Environmental Health and Safety (EHS) department.

After submitting your new user form, you will receive an email from a KNI staff member with all necessary information to prepare for the KNI-specific safety training session. These sessions are held weekly, every Friday at 1 pm via Zoom.

Caltech's EHS Laboratory Safety Orientation is required if you are using any lab on campus. The training is offered by EHS via Zoom twice a month. If you have not taken EHS Lab Safety Orientation, instructions to register for this training can be found here: [https://www.safety.caltech.edu/root-pages/lab-safety-orientation Caltech's EHS Lab Safety Orientation]

''Note: You may start and complete KNI safety training before completing the EHS safety training. However, you must complete EHS Laboratory Safety Orientation in order to complete your onboarding and gain access to the KNI Lab.''

==Step 4: Setting Up Your Lab User Accounts & Access==
After you complete the mandatory KNI Lab new user safety training, you will receive an email from KNI Administrator Sydney Garstang with further instructions on setting up your KNI Lab user accounts. You will need to coordinate a time to stop by her office and have your ID card scanned so that it is registered in our lab management system. This will allow you to swipe into the KNI Lab's entrance as well as login to the Lab's [https://mh-fbs1.caltech.edu/ tool reservation system (FBS)].

All KNI Lab users are required to join the KNI Lab Slack workspace for timely and important lab updates, as well as FBS, the KNI Lab's user and tool management software system. Be sure to complete your FBS User account activation when you receive the FBS Welcome Email. If you have any trouble logging into our FBS Facility page ("Kavli Nanoscience Institute (KNI"), email kni@caltech.edu.

Read the [https://caltech.box.com/s/vzxxbvgcgh5pijrf77bqga0bv8mzubad FBS User SOP] for instructions on how to request training, schedule & change tool reservations, setting up your User account, notifications, and billing details.

All KNI Lab users are also signed up to the kni-notice email list.

==Step 5: Tool-Specific Training==
Requests for specific equipment training must be submitted through the [https://mh-fbs1.caltech.edu/ User Activity Dashboard] in FBS. From the User Dashboard, scroll down to find the name of the tool you need to use, click the "Request Training" link, then provide any useful information about why you need training on the specific tool -- also be sure to include your availability for the next two weeks.

After you submit your initial training request, the KNI technical staff member in charge of the tool will receive a notification and will contact you to schedule your first training session. Once a day/time has been agreed upon, you make go directly to the FBS Calendar (scheduler) and initiate an "Assisted Use" reservation. The staff member will receive an email notification and approve the reservation.

To schedule additional (second, third, etc.) training sessions, follow the same procedure: first submit the request from the FBS User Dashboard tool list, and after a day/time is set with the staff member, go to the FBS Calendar to initiate an "Assisted Use" reservation for the agreed-upon day/time.

Refer to our [https://lab.kni.caltech.edu/Equipment_List Equipment List] page for details on all of the resources in the KNI Lab.

''Note: Users are only charged for equipment use time during training sessions. There is no additional fee (i.e. staff time) for training sessions.''

==External Users==
Non-Caltech Academic, Government, and For-profit/Commercial researchers are considered external users.

Additional documents are required to set up an external user's KNI Lab access. Refer to the [https://caltech.box.com/s/urw7mwljz8jxv2d3s036h6kwx2mb8se8 External Lab User Membership Checklist] to ensure timely processing. All documentation must be completed and approved before KNI Lab access is granted.

If you are interested in joining the KNI Lab as an external user, '''please fill out the online [https://airtable.com/app2vjzgp8AJpuC3A/pagHxiNohQX8G65DZ/form New User Form]'''. Have a purchase order and your CV ready to upload.

'''Note''': all external users are required to hold a formal appointment at Caltech. If you do not have one (e.g. Visitor, External Affiliate, VURP, etc.), KNI will arrange an External Affiliate appointment for you. The appointment process is handled by Caltech HR and goes through reviews by Caltech offices, including Research Security and Compliance. Please be aware that the appointment setup and review process may take a few weeks.

If you have any questions, please contact kni@caltech.edu.

==KNI Member Offboarding==
Users who no longer need to use the KNI Lab must send a notification email to [mailto:kni@caltech.edu kni@caltech.edu] and complete the offboarding process before their last day. Please review the [https://caltech.box.com/s/qapv4ytu4uhyszz538rz4k55mvdihyix KNI Member Offboarding SOP]. The SOP lists items such as Stored Items, Chemicals, Stored Data/Files, etc, which should to be addressed before your membership ends.

Usage Rates

2026-04-02T20:19:45Z

Tkimoto: /* Caltech & JPL User Rates */

'''Overview of KNI Lab User Fees''' 
''Rates below are valid beginning October 1, 2025 and are subject to change''

* Fees are incurred on a pay-as-you-go basis (tools are charged by the hour or portion thereof).
* Lab users do '''NOT''' incur lab fees during days or months of non-use.
*Invoices are issued monthly.

'''Note: New users must submit a [[Membership_Forms | New User Form]] and attend general KNI Lab safety training before lab access is granted.'''

==Caltech & JPL User Rates==
Below is a table of ''direct'' hourly rates for lab and equipment use in the KNI Laboratory. Hourly rates are applied to an individual's actual usage in the KNI Lab. Rates do '''not''' include any applicable indirect charges, such as F&A fees. F&A (overhead) will be applied separately based on the customer's PTA type. Rates are valid beginning October 1, 2025 and are subject to change.

{| class="wikitable" style="width: 90%;"
|-
! scope="col" style="text-align:left; width: 40%" |Tool Name
! scope="col" style="text-align:left; width: 40%" |Resource Area
! scope="col" style="text-align:center; width: 20%" |Hourly Rate
|-
! scope="col" style="text-align:left; background-color:#ffd8b4;" |General Lab
! scope="col" style="text-align:left; background-color:#ffe7d1;" |See details below
! scope="col" style="text-align:center; background-color:#FFFFFF;" |$43/hr
|-
! scope="col" style="text-align:left; background-color:#ffd8b4;" |Raith EBPG 5000+ and 5200 Electron Beam Writers
! scope="col" style="text-align:left; background-color:#ffe7d1;" |Electron Beam Lithography (EBL)
! scope="col" style="text-align:center; background-color:#FFFFFF;" |$130/hr
|-
! scope="col" style="text-align:left; background-color:#ffd8b4;" |FEI Nova 600 Dualbeam Focused Ion Beam
! scope="col" style="text-align:left; background-color:#ffe7d1;" | Microscopy, Focused Ion Beam (FIB)
! scope="col" style="text-align:center; background-color:#FFFFFF;" |$75/hr
|-
! scope="col" style="text-align:left; background-color:#ffd8b4;" |Oxford Cobra III-V ALE Etch System (available soon)
! scope="col" style="text-align:left; background-color:#ffe7d1;" |Etch, RIE
! scope="col" style="text-align:center; background-color:#FFFFFF;" |$60/hr
|-
! scope="col" style="text-align:left; background-color:#ffd8b4;" |Oxford PECVD "2" - oxides and nitrides
! scope="col" style="text-align:left; background-color:#ffe7d1;" | Deposition, Chemical Vapor
! scope="col" style="text-align:center; background-color:#FFFFFF;" |$60/hr
|-
! scope="col" style="text-align:left; background-color:#ffd8b4;" |Oxford FlexAl ALD/ALE System
! scope="col" style="text-align:left; background-color:#ffe7d1;" |Deposition, Chemical Vapor
! scope="col" style="text-align:center; background-color:#FFFFFF;" |$50/hr
|-
! scope="col" style="text-align:left; background-color:#ffd8b4;" |Oxford III-V Etch System
! scope="col" style="text-align:left; background-color:#ffe7d1;" | Etch, RIE
! scope="col" style="text-align:center; background-color:#FFFFFF;" |$40/hr
|-
! scope="col" style="text-align:left; background-color:#ffd8b4;" |Oxford Dielectric Etch System
! scope="col" style="text-align:left; background-color:#ffe7d1;" | Etch, RIE
! scope="col" style="text-align:center; background-color:#FFFFFF;" |$40/hr
|-
! scope="col" style="text-align:left; background-color:#ffd8b4;" |Oxford DRIE Etch System
! scope="col" style="text-align:left; background-color:#ffe7d1;" | Etch, RIE
! scope="col" style="text-align:center; background-color:#FFFFFF;" |$40/hr
|-
! scope="col" style="text-align:left; background-color:#ffd8b4;" |Oxford PECVD (legacy) - amorphous Si
! scope="col" style="text-align:left; background-color:#ffe7d1;" | Deposition, Chemical Vapor
! scope="col" style="text-align:center; background-color:#FFFFFF;" |$40/hr
|-
! scope="col" style="text-align:left; background-color:#ffd8b4;" |Nanoscribe PPGT
! scope="col" style="text-align:left; background-color:#ffe7d1;" | 2D/3D Print
! scope="col" style="text-align:center; background-color:#FFFFFF;" |$5/hr
|}

'''Academic Discount on General Cleanroom Usage'''

A 50% discount will be applied to the General Cleanroom rate for any cleanroom usage accrued ''after'' 40 hours per calendar month. The discounted hourly rate, $21.50, is only applied to the hours that exceed 40 in a given month.

Example: A user logs 50 hours in the cleanroom during the month of October. Their invoice will be: (40 x $43) + (10 x $21.50) = $1,935

'''General Lab use is counted as time spent in the KNI cleanroom facility. It includes access to the following resources:'''
*Atomic Force Microscope
*Critical Point Dryer
*Electron Beam Evaporators
*Laser Interference Lithography System
*He-Ne-Ga Ion Microscope (Orion Nanofab)
*Mask Aligners
*Parylene Coater
*Profilometer
*Rapid Thermal Processor
*Scanning Electron Microscopes (Quanta, Sirion)
*Scriber Breaker
*Spectroscopic Ellipsometer
*Tube Furnaces (Wet, Dry Oxide + Annealing)
*Wafer Stepper
*Wet Chemistry Room
*Wire Bonder
*XeF2 Silicon Etcher
*Other tools not listed in the table above
*Cleanroom PPE, basic supplies

'''Miscellaneous Rates'''
* Precious Metal (gold, platinum, etc.) usage will be billed the market rate, per gram/A.
* Staff-approved full service work is $100/hr.

==Full-Service Work Requests ==
KNI lab members and non-lab members can submit a request for full-service work performed by KNI technical staff using KNI equipment. The project will incur costs based on the actual usage of equipment (refer to rates above), as well as charges for the following:
{| class="wikitable"
|Fees
|Price
|-
|Technical Staff Effort (hourly)
|$ 100.00
|-
|Equipment Hourly Use Fees (see pricing list above)
|$ varies
|-
|Administrative Fee (per transaction)
|$ 100.00
|}
'''To submit a request for full-service work''', contact the technical staff member in charge of the equipment you are interested in using, or send an email to [mailto:kni@caltech.edu kni@caltech.edu]. Requests will be reviewed and selected based on staff availability, agreement of scope, and turnaround timeline. A PTA must be provided in advance in order for work to begin. KNI offers no guarantees for the end product.

'''Note:''' The rates above are the direct costs. Overhead fees will be applied.

==Overhead/Indirect Cost Rate ==
The KNI Lab charges for Non-Caltech Academic, Government, and Corporate KNI lab members are subject to Caltech's F&A (indirect/"overhead") rate. The F&A rate for fiscal year 2026 is 70%.
Internal (Caltech and JPL) users will also have overhead applied to their charges. The overhead is accounted for in the back end of the internal charging process and the overhead rate is dependent on the PTA used to pay for the KNI Lab fees. If you have questions about this, please discuss with your grants manager.

==External/Corporate Memberships==

The KNI Lab is open to external academic, government, industry, and startup organizations. Rates for industry and startups differ from the posted rates (above) for our internal academic users. All external users will be billed for Caltech's fiscal year overhead rate.

For information on the KNI external lab membership plan, please send an email to [mailto:tkimoto@caltech.edu tkimoto@caltech.edu] with details regarding 1) the number of people looking to join as KNI lab members, 2) equipment needs, 3) anticipated start date, and 4) information about the company. Startup companies may qualify for limited-term reduced rates.

'''Additional paperwork is required, including a Facilities Use Agreement, certificate of liability insurance that meets Caltech requirements, a purchase order, and an External Affiliate appointment.''' This process can take up to a few weeks, and all steps must be completed before an external user is able to start in the KNI Lab.

Usage Rates

2026-04-02T20:18:18Z

Tkimoto: /* Caltech & JPL User Rates */

'''Overview of KNI Lab User Fees''' 
''Rates below are valid beginning October 1, 2025 and are subject to change''

* Fees are incurred on a pay-as-you-go basis (tools are charged by the hour or portion thereof).
* Lab users do '''NOT''' incur lab fees during days or months of non-use.
*Invoices are issued monthly.

'''Note: New users must submit a [[Membership_Forms | New User Form]] and attend general KNI Lab safety training before lab access is granted.'''

==Caltech & JPL User Rates==
Below is a table of ''direct'' hourly rates for lab and equipment use in the KNI Laboratory. Hourly rates are applied to an individual's actual usage in the KNI Lab. Rates do '''not''' include any applicable indirect charges, such as F&A fees. F&A (overhead) will be applied separately based on the customer's PTA type. Rates are valid beginning October 1, 2025 and are subject to change.

{| class="wikitable" style="width: 90%;"
|-
! scope="col" style="text-align:left; width: 40%" |Tool Name
! scope="col" style="text-align:left; width: 40%" |Resource Area
! scope="col" style="text-align:center; width: 20%" |Hourly Rate
|-
! scope="col" style="text-align:left; background-color:#ffd8b4;" |General Lab
! scope="col" style="text-align:left; background-color:#ffe7d1;" |See details below
! scope="col" style="text-align:center; background-color:#FFFFFF;" |$43/hr
|-
! scope="col" style="text-align:left; background-color:#ffd8b4;" |Raith EBPG 5000+ and 5200 Electron Beam Writers
! scope="col" style="text-align:left; background-color:#ffe7d1;" |Electron Beam Lithography (EBL)
! scope="col" style="text-align:center; background-color:#FFFFFF;" |$130/hr
|-
! scope="col" style="text-align:left; background-color:#ffd8b4;" |FEI Nova 600 Dualbeam Focused Ion Beam
! scope="col" style="text-align:left; background-color:#ffe7d1;" | Microscopy, Focused Ion Beam (FIB)
! scope="col" style="text-align:center; background-color:#FFFFFF;" |$75/hr
|-
! scope="col" style="text-align:left; background-color:#ffd8b4;" |Oxford Cobra III-V ALE Etch System (available soon)
! scope="col" style="text-align:left; background-color:#ffe7d1;" |Etch, RIE
! scope="col" style="text-align:center; background-color:#FFFFFF;" |$60/hr
|-
! scope="col" style="text-align:left; background-color:#ffd8b4;" |Oxford PECVD "2" System
! scope="col" style="text-align:left; background-color:#ffe7d1;" | Deposition, Chemical Vapor
! scope="col" style="text-align:center; background-color:#FFFFFF;" |$60/hr
|-
! scope="col" style="text-align:left; background-color:#ffd8b4;" |Oxford FlexAl ALD/ALE System
! scope="col" style="text-align:left; background-color:#ffe7d1;" |Deposition, Chemical Vapor
! scope="col" style="text-align:center; background-color:#FFFFFF;" |$50/hr
|-
! scope="col" style="text-align:left; background-color:#ffd8b4;" |Oxford III-V Etch System
! scope="col" style="text-align:left; background-color:#ffe7d1;" | Etch, RIE
! scope="col" style="text-align:center; background-color:#FFFFFF;" |$40/hr
|-
! scope="col" style="text-align:left; background-color:#ffd8b4;" |Oxford Dielectric Etch System
! scope="col" style="text-align:left; background-color:#ffe7d1;" | Etch, RIE
! scope="col" style="text-align:center; background-color:#FFFFFF;" |$40/hr
|-
! scope="col" style="text-align:left; background-color:#ffd8b4;" |Oxford DRIE Etch System
! scope="col" style="text-align:left; background-color:#ffe7d1;" | Etch, RIE
! scope="col" style="text-align:center; background-color:#FFFFFF;" |$40/hr
|-
! scope="col" style="text-align:left; background-color:#ffd8b4;" |Oxford PECVD System (legacy)
! scope="col" style="text-align:left; background-color:#ffe7d1;" | Deposition, Chemical Vapor
! scope="col" style="text-align:center; background-color:#FFFFFF;" |$40/hr
|-
! scope="col" style="text-align:left; background-color:#ffd8b4;" |Nanoscribe PPGT
! scope="col" style="text-align:left; background-color:#ffe7d1;" | 2D/3D Print
! scope="col" style="text-align:center; background-color:#FFFFFF;" |$5/hr
|}

'''Academic Discount on General Cleanroom Usage'''

A 50% discount will be applied to the General Cleanroom rate for any cleanroom usage accrued ''after'' 40 hours per calendar month. The discounted hourly rate, $21.50, is only applied to the hours that exceed 40 in a given month.

Example: A user logs 50 hours in the cleanroom during the month of October. Their invoice will be: (40 x $43) + (10 x $21.50) = $1,935

'''General Lab use is counted as time spent in the KNI cleanroom facility. It includes access to the following resources:'''
*Atomic Force Microscope
*Critical Point Dryer
*Electron Beam Evaporators
*Laser Interference Lithography System
*He-Ne-Ga Ion Microscope (Orion Nanofab)
*Mask Aligners
*Parylene Coater
*Profilometer
*Rapid Thermal Processor
*Scanning Electron Microscopes (Quanta, Sirion)
*Scriber Breaker
*Spectroscopic Ellipsometer
*Tube Furnaces (Wet, Dry Oxide + Annealing)
*Wafer Stepper
*Wet Chemistry Room
*Wire Bonder
*XeF2 Silicon Etcher
*Other tools not listed in the table above
*Cleanroom PPE, basic supplies

'''Miscellaneous Rates'''
* Precious Metal (gold, platinum, etc.) usage will be billed the market rate, per gram/A.
* Staff-approved full service work is $100/hr.

==Full-Service Work Requests ==
KNI lab members and non-lab members can submit a request for full-service work performed by KNI technical staff using KNI equipment. The project will incur costs based on the actual usage of equipment (refer to rates above), as well as charges for the following:
{| class="wikitable"
|Fees
|Price
|-
|Technical Staff Effort (hourly)
|$ 100.00
|-
|Equipment Hourly Use Fees (see pricing list above)
|$ varies
|-
|Administrative Fee (per transaction)
|$ 100.00
|}
'''To submit a request for full-service work''', contact the technical staff member in charge of the equipment you are interested in using, or send an email to [mailto:kni@caltech.edu kni@caltech.edu]. Requests will be reviewed and selected based on staff availability, agreement of scope, and turnaround timeline. A PTA must be provided in advance in order for work to begin. KNI offers no guarantees for the end product.

'''Note:''' The rates above are the direct costs. Overhead fees will be applied.

==Overhead/Indirect Cost Rate ==
The KNI Lab charges for Non-Caltech Academic, Government, and Corporate KNI lab members are subject to Caltech's F&A (indirect/"overhead") rate. The F&A rate for fiscal year 2026 is 70%.
Internal (Caltech and JPL) users will also have overhead applied to their charges. The overhead is accounted for in the back end of the internal charging process and the overhead rate is dependent on the PTA used to pay for the KNI Lab fees. If you have questions about this, please discuss with your grants manager.

==External/Corporate Memberships==

The KNI Lab is open to external academic, government, industry, and startup organizations. Rates for industry and startups differ from the posted rates (above) for our internal academic users. All external users will be billed for Caltech's fiscal year overhead rate.

For information on the KNI external lab membership plan, please send an email to [mailto:tkimoto@caltech.edu tkimoto@caltech.edu] with details regarding 1) the number of people looking to join as KNI lab members, 2) equipment needs, 3) anticipated start date, and 4) information about the company. Startup companies may qualify for limited-term reduced rates.

'''Additional paperwork is required, including a Facilities Use Agreement, certificate of liability insurance that meets Caltech requirements, a purchase order, and an External Affiliate appointment.''' This process can take up to a few weeks, and all steps must be completed before an external user is able to start in the KNI Lab.

FBS Instructions

2026-03-25T17:00:52Z

Tkimoto: /* Resources */

== Priority Software® FBS ==

;FBS is a facility management software used for:

:Monitoring Cleanroom Use:
::Members must scan their badge '''EACH''' time when entering or exiting the Cleanroom.
::For Safety and Documenting Cleanroom use.
::''Used for administrative accounting.''

:Monitoring Wet Chemistry Room Use:
::Members must scan their badge '''EACH''' time entering or exiting the Wet Chem Room.
::For Safety and Documenting Wet Chem Room use.
::''No additional charge for using the room.''

:Scheduling Equipment Reservations:
::Members '''qualified''' to run the equipment may schedule an '''unassisted''' run.
::Members qualified to run the tool but would like an '''assisted''' run must put in a '''training request''' before making the '''assisted''' reservation. ''Assisted reservations require the tool manager to be present.''
::'''Non Qualified''' members must request '''Training''' before making any reservations.
::''Used for administrative accounting.''

:Documenting Equipment Use:
::Members must START the reservation or Walk-Up before using the equipment.
::Members must STOP the RUN when finished using the equipment.
::''Used for administrative accounting.''

:Requesting Equipment Training to document all training events:
::Members wanting to be trained must put in a '''training request''' before making any reservations.
::After putting in a training request, the tool manager will confirm a Date and Time before the Training Reservation.
::''Used for administrative accounting.''

===User Web Portal===
FBS allows KNI members to schedule and reserve equipment inside the lab and remotely with a web interface. Users are required to STOP the timer to the tool in order to end their event. Users can STOP and START the timer via the FBS kiosk, desktop, or smartphone web browser.

====[https://mh-fbs1.caltech.edu/Anon/Logon.aspx?ReturnUrl=%2fApps%2fFBS%2f%3ff%3d613&f=613 FBS Reservations] - Click on the link to login to FBS and schedule tool reservations.====
::'''For reservations that DO NOT follow the reservation policy, email the tool manager BEFORE scheduling. '''
::''Your reservation can be cancelled at any time by the tool manager if it does not follow the tool reservation policy.''
*Check the Wiki tool page for the rules for each tool or [https://caltech.box.com/s/r154cwy4xi1dfte7m1rr6zpey54ru28b General Reservation Policy].

*If Qualified on the equipment:
#Log into FBS to make an '''unassisted''' reservation.
#If you have been trained and qualified by the tool manager but are unable to make an '''unassisted''' reservation, email the tool manager to request that your access to be enabled.
#If Qualified on the equipment and you would like to make an '''assisted''' reservation, member must first put in a '''training request''' from the User Dashboard. The tool manager will discuss your request and confirm a time and date before you are asked to schedule an '''assisted''' run. Assisted runs require the tool manager to be present when scheduled. If a training request is not made prior to scheduling, the manager may not be notified of the scheduled event.
*If you are '''NOT''' Qualified on the equipment:
#Request training via your User Dashboard.
#Describe the process you want to use on the tool.
#Give your schedule or available times throughout the week.
''The staff manager will schedule a time based on their availability, your availability, and the tool's availability.''

*If unable to login or forgotten password, contact KNI administrator - [mailto:sydney@caltech.edu Sydney Garstang]

====[https://mh-fbs1.caltech.edu/Anon/LiveUsage.aspx?f=613 FBS Live Usage]====
*Live Usage displays members that have scanned into the cleanroom. It also displays systems that are running and who is logged into the tool.

===FBS Kiosks and Door Scanners===
FBS accurately documents lab and tool use time for administration accounting.
* '''Always''' scan into FBS when entering the lab B207.
** If your name does not appear on the FBS door monitor, notify a KNI staff member.
* '''Always''' scan out of FBS when exiting the lab B207. Listen to the door monitor to verify you have logged out of the tools properly.
** If you forgot to STOP your session, contact the tool manager to update the system records so the billing records can be updated. Email the tool manager and include the Date, Start, and Stop time for the tool used.
* START your session from a kiosk or computer before using the tool.
**This will unlock the system for your session and start the billing record. If the system does not unlock after logging into FBS, follow the instruction in the "FBS Troubleshooting Instructions" listed in the Resources section below.
* STOP your session when you are finished.
**This will end your session and lock the system. Your session will be billed for the total time used on the system.
*'''Always''' scan into FBS before entering the Wet Chemistry Room inside the cleanroom.
** If your name does not appear on the Wet Chemical Room door monitor, notify a KNI staff member. It is okay to use the Wet Chemistry Room if your name does not appear on the monitor.
*'''Always''' scan out of FBS when leaving the Wet Chemistry Room.

== Resources ==

===[https://caltech.box.com/s/r154cwy4xi1dfte7m1rr6zpey54ru28b General Reservation Policy]===
::This is the General Reservation Policy. Check the tool Wiki page for any special reservation rules associated with that piece of equipment.

===[https://caltech.box.com/s/vzxxbvgcgh5pijrf77bqga0bv8mzubad FBS User SOP] Standard Operation Procedure for Priority Software® FBS===

FBS Instructions

2026-03-25T16:59:50Z

Tkimoto: /* User Web Portal */

== Priority Software® FBS ==

;FBS is a facility management software used for:

:Monitoring Cleanroom Use:
::Members must scan their badge '''EACH''' time when entering or exiting the Cleanroom.
::For Safety and Documenting Cleanroom use.
::''Used for administrative accounting.''

:Monitoring Wet Chemistry Room Use:
::Members must scan their badge '''EACH''' time entering or exiting the Wet Chem Room.
::For Safety and Documenting Wet Chem Room use.
::''No additional charge for using the room.''

:Scheduling Equipment Reservations:
::Members '''qualified''' to run the equipment may schedule an '''unassisted''' run.
::Members qualified to run the tool but would like an '''assisted''' run must put in a '''training request''' before making the '''assisted''' reservation. ''Assisted reservations require the tool manager to be present.''
::'''Non Qualified''' members must request '''Training''' before making any reservations.
::''Used for administrative accounting.''

:Documenting Equipment Use:
::Members must START the reservation or Walk-Up before using the equipment.
::Members must STOP the RUN when finished using the equipment.
::''Used for administrative accounting.''

:Requesting Equipment Training to document all training events:
::Members wanting to be trained must put in a '''training request''' before making any reservations.
::After putting in a training request, the tool manager will confirm a Date and Time before the Training Reservation.
::''Used for administrative accounting.''

===User Web Portal===
FBS allows KNI members to schedule and reserve equipment inside the lab and remotely with a web interface. Users are required to STOP the timer to the tool in order to end their event. Users can STOP and START the timer via the FBS kiosk, desktop, or smartphone web browser.

====[https://mh-fbs1.caltech.edu/Anon/Logon.aspx?ReturnUrl=%2fApps%2fFBS%2f%3ff%3d613&f=613 FBS Reservations] - Click on the link to login to FBS and schedule tool reservations.====
::'''For reservations that DO NOT follow the reservation policy, email the tool manager BEFORE scheduling. '''
::''Your reservation can be cancelled at any time by the tool manager if it does not follow the tool reservation policy.''
*Check the Wiki tool page for the rules for each tool or [https://caltech.box.com/s/r154cwy4xi1dfte7m1rr6zpey54ru28b General Reservation Policy].

*If Qualified on the equipment:
#Log into FBS to make an '''unassisted''' reservation.
#If you have been trained and qualified by the tool manager but are unable to make an '''unassisted''' reservation, email the tool manager to request that your access to be enabled.
#If Qualified on the equipment and you would like to make an '''assisted''' reservation, member must first put in a '''training request''' from the User Dashboard. The tool manager will discuss your request and confirm a time and date before you are asked to schedule an '''assisted''' run. Assisted runs require the tool manager to be present when scheduled. If a training request is not made prior to scheduling, the manager may not be notified of the scheduled event.
*If you are '''NOT''' Qualified on the equipment:
#Request training via your User Dashboard.
#Describe the process you want to use on the tool.
#Give your schedule or available times throughout the week.
''The staff manager will schedule a time based on their availability, your availability, and the tool's availability.''

*If unable to login or forgotten password, contact KNI administrator - [mailto:sydney@caltech.edu Sydney Garstang]

====[https://mh-fbs1.caltech.edu/Anon/LiveUsage.aspx?f=613 FBS Live Usage]====
*Live Usage displays members that have scanned into the cleanroom. It also displays systems that are running and who is logged into the tool.

===FBS Kiosks and Door Scanners===
FBS accurately documents lab and tool use time for administration accounting.
* '''Always''' scan into FBS when entering the lab B207.
** If your name does not appear on the FBS door monitor, notify a KNI staff member.
* '''Always''' scan out of FBS when exiting the lab B207. Listen to the door monitor to verify you have logged out of the tools properly.
** If you forgot to STOP your session, contact the tool manager to update the system records so the billing records can be updated. Email the tool manager and include the Date, Start, and Stop time for the tool used.
* START your session from a kiosk or computer before using the tool.
**This will unlock the system for your session and start the billing record. If the system does not unlock after logging into FBS, follow the instruction in the "FBS Troubleshooting Instructions" listed in the Resources section below.
* STOP your session when you are finished.
**This will end your session and lock the system. Your session will be billed for the total time used on the system.
*'''Always''' scan into FBS before entering the Wet Chemistry Room inside the cleanroom.
** If your name does not appear on the Wet Chemical Room door monitor, notify a KNI staff member. It is okay to use the Wet Chemistry Room if your name does not appear on the monitor.
*'''Always''' scan out of FBS when leaving the Wet Chemistry Room.

== Resources ==

===[https://caltech.box.com/s/r154cwy4xi1dfte7m1rr6zpey54ru28b General Reservation Policy]===
::This is the General Reservation Policy. Check the tool Wiki page for any special reservation rules associated with that piece of equipment.::

===[https://caltech.box.com/s/vzxxbvgcgh5pijrf77bqga0bv8mzubad FBS User SOP] Standard Operation Procedure for Priority Software® FBS===

FBS Instructions

2026-03-25T16:56:03Z

Tkimoto: /* User Web Portal */

== Priority Software® FBS ==

;FBS is a facility management software used for:

:Monitoring Cleanroom Use:
::Members must scan their badge '''EACH''' time when entering or exiting the Cleanroom.
::For Safety and Documenting Cleanroom use.
::''Used for administrative accounting.''

:Monitoring Wet Chemistry Room Use:
::Members must scan their badge '''EACH''' time entering or exiting the Wet Chem Room.
::For Safety and Documenting Wet Chem Room use.
::''No additional charge for using the room.''

:Scheduling Equipment Reservations:
::Members '''qualified''' to run the equipment may schedule an '''unassisted''' run.
::Members qualified to run the tool but would like an '''assisted''' run must put in a '''training request''' before making the '''assisted''' reservation. ''Assisted reservations require the tool manager to be present.''
::'''Non Qualified''' members must request '''Training''' before making any reservations.
::''Used for administrative accounting.''

:Documenting Equipment Use:
::Members must START the reservation or Walk-Up before using the equipment.
::Members must STOP the RUN when finished using the equipment.
::''Used for administrative accounting.''

:Requesting Equipment Training to document all training events:
::Members wanting to be trained must put in a '''training request''' before making any reservations.
::After putting in a training request, the tool manager will confirm a Date and Time before the Training Reservation.
::''Used for administrative accounting.''

===User Web Portal===
FBS allows KNI members to schedule and reserve equipment inside the lab and remotely with a web interface. Users are required to STOP the timer to the tool in order to end their event. Users can STOP and START the timer via the FBS kiosk or a desktop or smartphone web browser.

====[https://mh-fbs1.caltech.edu/Anon/Logon.aspx?ReturnUrl=%2fApps%2fFBS%2f%3ff%3d613&f=613 FBS Reservations] - Click on the link to login to FBS and schedule tool reservations.====
::'''For reservations that DO NOT follow the reservation policy, email the tool manager BEFORE scheduling. '''
::''Your reservation can be cancelled at any time by the tool manager if it does not follow the tool reservation policy.''
*Check the Wiki tool page for the rules for each tool or [https://caltech.box.com/s/r154cwy4xi1dfte7m1rr6zpey54ru28b General Reservation Policy].

*If Qualified on the equipment:
#Log into FBS to make an '''unassisted''' reservation.
#If you have been trained and qualified by the tool manager but are unable to make an '''unassisted''' reservation, email the tool manager to request your access to be enabled.
#If Qualified on the equipment and you would like to make an '''assisted''' reservation, member must first put in a '''training request''' from the User Dashboard. The tool manager will discuss your request and confirm a time and date before you are asked to schedule an '''assisted''' run. Assisted runs require the tool manager to be present when scheduled. If a training request is not made prior to scheduling, the manager may not be notified of the scheduled event.
*If you are '''NOT''' Qualified on the equipment:
#Request training via the User Dashboard.
#Describe the process you want to use on the tool.
#Give your schedule or available times throughout the week.
''The staff manager will need to schedule their availability, your availability and the tools availability when scheduling.''

*If unable to login or forgotten password, contact KNI administrator - [mailto:sydney@caltech.edu Sydney Garstang]

====[https://mh-fbs1.caltech.edu/Anon/LiveUsage.aspx?f=613 FBS Live Usage]====
*Live Usage displays members that have scanned into the cleanroom and wet chemistry room. It also displays systems that are running and who is logged into the tool. ''Often used to locate members and where they may be working inside the cleanroom.''

===FBS Kiosks and Door Scanners===
FBS accurately documents lab and tool use time for administration accounting.
* Always scan into FBS when entering the lab B207.
** If your name does not appear on the FBS door monitor, notify a KNI staff member.
* Always scan out of FBS when exiting the lab B207. Listen to the door monitor to verify you have logged out of the tools properly.
** If you forgot to STOP your session or forgot to START/STOP your session, contact the tool manager to update the system records so the billing records can be updated. Email the tool manager and include the Date, Start, and Stop time for the tool used.
* START your session before using the tool.
**This will unlock the system for your session and start the billing record. If the system does not unlock after logging into FBS, follow the instruction in the "FBS Troubleshooting Instructions" listed in the Resources section below.
* STOP your session when you are finished.
**This will end your session and lock the system. Your session will be billed for the total time used on the system.
*Always scan into FBS before entering the Wet Chemistry Room inside the cleanroom.
** If your name does not appear on the Wet Chemical Room door monitor, notify a KNI staff member. It is okay to use the Wet Chemistry Room if your name does not appear on the monitor.
*Always scan out of FBS when leaving the Wet Chemistry Room.

== Resources ==

===[https://caltech.box.com/s/r154cwy4xi1dfte7m1rr6zpey54ru28b General Reservation Policy]===
::This is the General Reservation Policy. Check the tool Wiki page for any special reservation rules associated with that piece of equipment.::

===[https://caltech.box.com/s/vzxxbvgcgh5pijrf77bqga0bv8mzubad FBS User SOP] Standard Operation Procedure for Priority Software® FBS===

Usage Rates

2026-03-20T20:48:25Z

Tkimoto: /* Caltech & JPL User Rates */

'''Overview of KNI Lab User Fees''' 
''Rates below are valid beginning October 1, 2025 and are subject to change''

* Fees are incurred on a pay-as-you-go basis (tools are charged by the hour or portion thereof).
* Lab users do '''NOT''' incur lab fees during days or months of non-use.
*Invoices are issued monthly.

'''Note: New users must submit a [[Membership_Forms | New User Form]] and attend general KNI Lab safety training before lab access is granted.'''

==Caltech & JPL User Rates==
Below is a table of ''direct'' hourly rates for lab and equipment use in the KNI Laboratory. Hourly rates are applied to an individual's actual usage in the KNI Lab. Rates do '''not''' include any applicable indirect charges, such as F&A fees. F&A (overhead) will be applied separately based on the customer's PTA type. Rates are valid beginning October 1, 2025 and are subject to change.

{| class="wikitable" style="width: 90%;"
|-
! scope="col" style="text-align:left; width: 40%" |Tool Name
! scope="col" style="text-align:left; width: 40%" |Resource Area
! scope="col" style="text-align:center; width: 20%" |Hourly Rate
|-
! scope="col" style="text-align:left; background-color:#ffd8b4;" |General Lab
! scope="col" style="text-align:left; background-color:#ffe7d1;" |See details below
! scope="col" style="text-align:center; background-color:#FFFFFF;" |$43/hr
|-
! scope="col" style="text-align:left; background-color:#ffd8b4;" |Raith EBPG 5000+ and 5200 Electron Beam Writers
! scope="col" style="text-align:left; background-color:#ffe7d1;" |Electron Beam Lithography (EBL)
! scope="col" style="text-align:center; background-color:#FFFFFF;" |$130/hr
|-
! scope="col" style="text-align:left; background-color:#ffd8b4;" |FEI Nova 600 Dualbeam Focused Ion Beam
! scope="col" style="text-align:left; background-color:#ffe7d1;" | Microscopy, Focused Ion Beam (FIB)
! scope="col" style="text-align:center; background-color:#FFFFFF;" |$75/hr
|-
! scope="col" style="text-align:left; background-color:#ffd8b4;" |Oxford Cobra III-V ALE Etch System (available soon)
! scope="col" style="text-align:left; background-color:#ffe7d1;" |Deposition, Chemical Vapor
! scope="col" style="text-align:center; background-color:#FFFFFF;" |$60/hr
|-
! scope="col" style="text-align:left; background-color:#ffd8b4;" |Oxford PECVD "2" System
! scope="col" style="text-align:left; background-color:#ffe7d1;" | Microscopy, Focused Ion Beam (FIB)
! scope="col" style="text-align:center; background-color:#FFFFFF;" |$60/hr
|-
! scope="col" style="text-align:left; background-color:#ffd8b4;" |Oxford FlexAl ALD/ALE System
! scope="col" style="text-align:left; background-color:#ffe7d1;" |Deposition, Chemical Vapor
! scope="col" style="text-align:center; background-color:#FFFFFF;" |$50/hr
|-
! scope="col" style="text-align:left; background-color:#ffd8b4;" |Oxford III-V Etch System
! scope="col" style="text-align:left; background-color:#ffe7d1;" | Microscopy, Focused Ion Beam (FIB)
! scope="col" style="text-align:center; background-color:#FFFFFF;" |$40/hr
|-
! scope="col" style="text-align:left; background-color:#ffd8b4;" |Oxford Dielectric Etch System
! scope="col" style="text-align:left; background-color:#ffe7d1;" | Microscopy, Focused Ion Beam (FIB)
! scope="col" style="text-align:center; background-color:#FFFFFF;" |$40/hr
|-
! scope="col" style="text-align:left; background-color:#ffd8b4;" |Oxford DRIE Etch System
! scope="col" style="text-align:left; background-color:#ffe7d1;" | Microscopy, Focused Ion Beam (FIB)
! scope="col" style="text-align:center; background-color:#FFFFFF;" |$40/hr
|-
! scope="col" style="text-align:left; background-color:#ffd8b4;" |Oxford PECVD System (legacy)
! scope="col" style="text-align:left; background-color:#ffe7d1;" | Microscopy, Focused Ion Beam (FIB)
! scope="col" style="text-align:center; background-color:#FFFFFF;" |$40/hr
|-
! scope="col" style="text-align:left; background-color:#ffd8b4;" |Nanoscribe PPGT
! scope="col" style="text-align:left; background-color:#ffe7d1;" | 2D/3D Print
! scope="col" style="text-align:center; background-color:#FFFFFF;" |$5/hr
|}

'''Academic Discount on General Cleanroom Usage'''

A 50% discount will be applied to the General Cleanroom rate for any cleanroom usage accrued ''after'' 40 hours per calendar month. The discounted hourly rate, $21.50, is only applied to the hours that exceed 40 in a given month.

Example: A user logs 50 hours in the cleanroom during the month of October. Their invoice will be: (40 x $43) + (10 x $21.50) = $1,935

'''General Lab use is counted as time in the KNI cleanroom facility. It includes access to:'''
*Atomic Force Microscope
*Critical Point Dryer
*Electron Beam Evaporators
*Laser Interference Lithography System
*He-Ne-Ga Ion Microscope (Orion Nanofab)
*Mask Aligners
*Parylene Coater
*Profilometer
*Rapid Thermal Processor
*Scanning Electron Microscopes (Quanta, Sirion)
*Scriber Breaker
*Spectroscopic Ellipsometer
*Tube Furnaces (Wet, Dry Oxide + Annealing)
*Wafer Stepper
*Wet Chemistry Room/general supplies
*Wire Bonder
*XeF2 Silicon Etcher
*Other tools not listed in the table above

'''Miscellaneous Rates'''
* Precious Metal (gold, platinum, etc.) usage will be billed the market rate, per gram.Staff-approved full service work is $100/hr.

==Full-Service Work Requests ==
KNI lab members and non-lab members can submit a request for full-service work performed by KNI technical staff using KNI equipment. The project will incur costs based on the actual usage of equipment (refer to rates above), as well as charges for the following:
{| class="wikitable"
|Fees
|Price
|-
|Technical Staff Effort (hourly)
|$ 100.00
|-
|Equipment Hourly Use Fees (see pricing list above)
|$ varies
|-
|Administrative Fee (per transaction)
|$ 100.00
|}
'''To submit a request for full-service work''', contact the technical staff member in charge of the equipment you are interested in using, or send an email to [mailto:kni@caltech.edu kni@caltech.edu]. Requests will be reviewed and selected based on staff availability, agreement of scope, and turnaround timeline. A PTA must be provided in advance in order for work to begin. KNI offers no guarantees for the end product.

'''Note:''' The rates above are the direct costs. Overhead fees will be applied.

==Overhead/Indirect Cost Rate ==
The KNI Lab charges for Non-Caltech Academic, Government, and Corporate KNI lab members are subject to Caltech's F&A (indirect/"overhead") rate. The F&A rate for fiscal year 2026 is 70%.
Internal (Caltech and JPL) users will also have overhead applied to their charges. The overhead is accounted for in the back end of the internal charging process and the overhead rate is dependent on the PTA used to pay for the KNI Lab fees. If you have questions about this, please discuss with your grants manager.

==External/Corporate Memberships==

The KNI Lab is open to external academic, government, industry, and startup organizations. Rates for industry and startups differ from the posted rates (above) for our internal academic users. All external users will be billed for Caltech's fiscal year overhead rate.

For information on the KNI external lab membership plan, please send an email to [mailto:tkimoto@caltech.edu tkimoto@caltech.edu] with details regarding 1) the number of people looking to join as KNI lab members, 2) equipment needs, 3) anticipated start date, and 4) information about the company. Startup companies may qualify for limited-term reduced rates.

'''Additional paperwork is required, including a Facilities Use Agreement, certificate of liability insurance that meets Caltech requirements, a purchase order, and an External Affiliate appointment.''' This process can take up to a few weeks, and all steps must be completed before an external user is able to start in the KNI Lab.

New Members

2026-02-24T23:46:46Z

Tkimoto: /* External Users */

==Joining the KNI Lab==
The KNI Laboratory (KNI Lab) is an open-access facility for Caltech and JPL students and researchers, as well as external academic, government and industry users. Equipment and resource use is billed on a per hour basis. Customers are invoiced monthly for their use. You can find information on our [[Usage_Rates | usage rates here]].

If you have general process questions or technical questions about KNI Lab resources, please email Associate Director of Technical Operations [mailto:derose@caltech.edu Dr. Guy DeRose]. Provide as much detail as possible to ensure an efficient and timely response.

Note: There are additional requirements for external users to join the KNI Lab (see below). Please allow more time for processing.

==Step 1: Submit Your KNI New User Form==
Internal researchers, fill out this online form:
* [https://airtable.com/app2vjzgp8AJpuC3A/pagHxiNohQX8G65DZ/form Caltech / JPL Users]
External researchers, fill out the appropriate form below and email it to [mailto:kni@caltech.edu kni@caltech.edu]. Read the sections below for additional requirements.
* [https://caltech.box.com/s/26w5srmths37kybjaismwwyc70y1qeiz Non-Caltech Academic or Government Users]
* [https://caltech.box.com/s/qkoz644x7f77grfgg9fi3wbc0v7j0ogn Industry / Corporate Users]

==Step 2: Submit Your Process Description Form (if needed)==
After you have submitted your new user form, you may contact [mailto:derose@caltech.edu Guy DeRose] for general process questions. Attach the
[https://caltech.box.com/s/kxkb44hdjhkw8rbj3pl9v6lh29h6b166 KNI Lab New Process Description form] to your email inquiry.

==Step 3: Safety Training==
All new lab users are required to attend the KNI-specific lab safety training, as well as Caltech's Laboratory Safety Orientation which is managed by Caltech's Environmental Health and Safety (EHS) department.

After submitting your new user form, you will receive an email from a KNI staff member with all necessary information to prepare for the KNI-specific safety training session. These sessions are held weekly, every Friday at 1 pm via Zoom.

Caltech's EHS Laboratory Safety Orientation is required if you are using any lab on campus. The training is offered by EHS via Zoom twice a month. If you have not taken EHS Lab Safety Orientation, instructions to register for this training can be found here: [https://www.safety.caltech.edu/root-pages/lab-safety-orientation Caltech's EHS Lab Safety Orientation]

''Note: You may start and complete KNI safety training before completing the EHS safety training. However, you must complete EHS Laboratory Safety Orientation in order to complete your onboarding and gain access to the KNI Lab.''

==Step 4: Setting Up Your Lab User Accounts & Access==
After you complete the mandatory KNI Lab new user safety training, you will receive an email from KNI Administrator Sydney Garstang with further instructions on setting up your KNI Lab user accounts. You will need to coordinate a time to stop by her office and have your ID card scanned so that it is registered in our lab management system. This will allow you to swipe into the KNI Lab's entrance as well as login to the Lab's [https://mh-fbs1.caltech.edu/ tool reservation system (FBS)].

All KNI Lab users are required to join the KNI Lab Slack workspace for timely and important lab updates, as well as FBS, the KNI Lab's user and tool management software system. Be sure to complete your FBS User account activation when you receive the FBS Welcome Email. If you have any trouble logging into our FBS Facility page ("Kavli Nanoscience Institute (KNI"), email kni@caltech.edu.

Read the [https://caltech.box.com/s/vzxxbvgcgh5pijrf77bqga0bv8mzubad FBS User SOP] for instructions on how to request training, schedule & change tool reservations, setting up your User account, notifications, and billing details.

All KNI Lab users are also signed up to the kni-notice email list.

==Step 5: Tool-Specific Training==
Requests for specific equipment training must be submitted through the [https://mh-fbs1.caltech.edu/ User Activity Dashboard] in FBS. From the User Dashboard, scroll down to find the name of the tool you need to use, click the "Request Training" link, then provide any useful information about why you need training on the specific tool -- also be sure to include your availability for the next two weeks.

After you submit your initial training request, the KNI technical staff member in charge of the tool will receive a notification and will contact you to schedule your first training session. Once a day/time has been agreed upon, you make go directly to the FBS Calendar (scheduler) and initiate an "Assisted Use" reservation. The staff member will receive an email notification and approve the reservation.

To schedule additional (second, third, etc.) training sessions, follow the same procedure: first submit the request from the FBS User Dashboard tool list, and after a day/time is set with the staff member, go to the FBS Calendar to initiate an "Assisted Use" reservation for the agreed-upon day/time.

Refer to our [https://lab.kni.caltech.edu/Equipment_List Equipment List] page for details on all of the resources in the KNI Lab.

''Note: Users are only charged for equipment use time during training sessions. There is no additional fee (i.e. staff time) for training sessions.''

==External Users==
Non-Caltech Academic, Government, and For-profit/Commercial researchers are considered external users.

Additional documents are required to set up an external user's KNI Lab access. Refer to the [https://caltech.box.com/s/urw7mwljz8jxv2d3s036h6kwx2mb8se8 External Lab User Membership Checklist] to ensure timely processing. All documentation must be completed and approved before KNI Lab access is granted.

If you are interested in joining the KNI Lab as an external user, '''please fill out the online [https://airtable.com/app2vjzgp8AJpuC3A/pagHxiNohQX8G65DZ/form New User Form]'''. Have a purchase order and your CV ready to upload.

'''Note''': all external users are required to hold a formal appointment at Caltech. If you do not have one (e.g. Visitor, External Affiliate, VURP, etc.), KNI will arrange an External Affiliate appointment for you. The appointment process is handled by Caltech HR and goes through reviews by Caltech offices, including Research Security and Compliance. Please be aware that the appointment setup and review process may take a few weeks.

If you have any questions, please contact kni@caltech.edu.

==KNI Member Offboarding==
Users who no longer need to use the KNI Lab must send a notification email to [mailto:kni@caltech.edu kni@caltech.edu] and complete the offboarding process before their last day. Please review the [https://caltech.box.com/s/qapv4ytu4uhyszz538rz4k55mvdihyix KNI Member Offboarding SOP]. The SOP lists items such as Stored Items, Chemicals, Stored Data/Files, etc, which should to be addressed before your membership ends.

Rapid Thermal Processor/archivelist

2026-01-22T22:28:48Z

Tkimoto: Changed redirect target from Archive 1 to Rapid Thermal Processor

#REDIRECT [[Rapid Thermal Processor]]

Membership Forms

2026-01-22T22:28:19Z

Tkimoto: Changed redirect target from New User Forms to New Members

#REDIRECT [[New Members]]

Equipment List

2026-01-22T22:21:04Z

Tkimoto: /* Chemical Vapor Deposition (CVD) */

'''NOTE: For EQUIPMENT TRAINING, make a training request via FBS. See link to instructions:''' [[FBS Instructions | FBS Instructions]]

== Lithography ==
===== Electron Beam Lithography =====
* [[EBPG 5200: 100 kV Electron Beam Lithography | Electron Beam Pattern Generator: Raith EBPG 5200 (100 kV)]]
* [[EBPG 5000+: 100 kV Electron Beam Lithography | Electron Beam Pattern Generator: Raith EBPG 5000+ (100 kV)]]
* [[Quanta 200F: SEM, ESEM, Lithography & Probe Station | Nanometer Pattern Generation System: Thermo Fisher Quanta 200F SEM with NPGS (1-30 kV)]]

===== Ion Beam Lithography =====
* [[ORION NanoFab: Helium, Neon & Gallium FIB | He/Ne/Ga-FIB: Zeiss ORION NanoFab with Raith ELPHY MultiBeam Pattern Generator (5-40 kV He & Ne, 1-30 kV Ga)]]
* [[Nova 600 NanoLab: SEM, Ga-FIB, GIS & Omniprobe | Ga-FIB, SEM, GIS & Omniprobe: Thermo Fisher Nova 600 NanoLab]]
===== Optical Lithography =====
* [[Contact Mask Aligners: MA6 & MA6/BA6 | Contact Mask Aligners: Suss MicroTec models MA6 & MA6/BA6]]
* [[Wafer Stepper | i-Line Wafer Stepper: GCA model 6300]]
* [[CNI-PV 2.1: Nano Imprint Lithography | Nano Imprint Lithography: NILT CNI-PV 2.1]]
* [[DWL-66: Direct-Write Laser System | Direct-Write Laser System: Heidelberg Instruments DWL-66]]
* [[Nanoscribe PPGT: Microscale 3D Printer | Two-Photon Lithography (aka Microscale 3D Printing): Nanoscribe Photonic Professional GT]]
* [[Optical Lithography Resources]]

== Deposition ==
===== Evaporation =====
* [[Labline: Electron Beam Evaporator | Metals (Al, Au, Pt & Ti): Kurt J Lesker Labline Electron Beam Evaporator]]

* [[Carbon Evaporator | Conductive thin film deposition: Leica EM ACE600 Carbon Evaporator & Sputter Coater]]
* [[AJA Orion ATC Series Electron Beam Evaporator | Metals & Oxides: AJA Orion ATC Series Electron Beam Evaporator]]

===== Sputtering =====
* [[ATC Orion 8: Dielectric Sputter System | Dielectric Sputter System: AJA International ATC Orion 8]]
* [[ATC Orion 8: Chalcogenide Sputter System | Chalcogenide Sputter System: AJA International ATC Orion 8]]

===== Chemical Vapor Deposition (CVD) =====
* [[FlexAL II: Atomic Layer Deposition (ALD) | Atomic Layer Deposition (ALD): Oxford Instruments FlexAL II]]
* [[Oxide/Nitride Deposition: Oxford Instruments PlasmaPro System 100 PECVD | Oxide/Nitride Deposition: Oxford Instruments PlasmaPro System 100 PECVD]]
* [[Silicon Deposition: Oxford Instruments Plasmalab System 100 PECVD | Silicon Deposition: Oxford Instruments Plasmalab System 100 PECVD]]

===== Dielectric Packaging / Moisture Barrier =====
* [[Parylene Coater | Parylene Coater: Para Tech LabTop 3000]]

== Etching ==
===== Dry Etching =====
* [[DRIE: Bosch & Cryo ICP-RIE for Silicon | Silicon Etcher: Oxford Instruments DRIE System 100 Bosch & Cryo ICP-RIE]]
* [[ICP-RIE: III-V, Metal & Silicon Etcher | III-V Material, Metal & Silicon Etcher: Oxford Instruments System 100 ICP-RIE]]
* [[ICP-RIE: Dielectric Etcher | Dielectric Material Etcher: Oxford Instruments Dielectric System 100 ICP-RIE]]
* [[Dual Chamber RIE: Silicon, III-V Material & Organics Etcher | Silicon, III-V Material & Organics Etcher: Plasma-Therm Dual Chamber RIE]]
* [[Tergeo Plus ICP- & CCP-RIE: Oxygen & Argon Plasma Cleaner | Oxygen & Argon Plasma Cleaner: PIE Scientific Tergeo Plus ICP- & CCP-RIE]]
* [[XeF2 Etcher for Silicon | XeF2 Etcher for Silicon]]

===== Wet Etching =====
* [[Wet Chemistry | Available Wet Etching Techniques]]

== Microscopy ==
===== KNI Microscopy Policies =====
* [https://caltech.box.com/s/rpbtox8l31qi3kw3b014e3e8i4ctjpdy KNI Microscopy Policies]

===== Microscopy High Performance PC =====
*[[Information on the 3D reconstruction PC | Microscopy High Perfomance PC for 3D reconstruction and data processing]]

===== Guide to Choosing KNI SEMs & FIBs =====
*[[Guide to Choosing KNI SEMs & FIBs | Consult this guide for help in choosing the best SEMs and FIBs for your work]]

===== Focused Ion Beam (FIB) Systems =====
* [[ORION NanoFab: Helium, Neon & Gallium FIB | Helium, Neon & Gallium FIB: Zeiss ORION NanoFab]]
* [[Nova 600 NanoLab: SEM, Ga-FIB, GIS & Omniprobe | SEM, Ga-FIB, GIS & Omniprobe: Thermo Fisher Nova 600 NanoLab]]
===== Scanning Electron Microscopes (SEMs) =====

* [[Sirion: SEM & EDS | Sirion: SEM & EDS]]
* [[Quanta 200F: SEM, ESEM, Lithography & Probe Station | SEM, ESEM, Lithography & Probe Station: Thermo Fisher Quanta 200F]]
* [[Nova 600 NanoLab: SEM, Ga-FIB, GIS & Omniprobe|SEM, Ga-FIB, EDS, GIS & Omniprobe: Thermo Fisher Nova 600 NanoLab]]




===== Scanning Probe Microscopes =====
* [[Dimension Icon: Atomic Force Microscope (AFM) | Atomic Force Microscope (AFM): Bruker Dimension Icon]]
* [[Dektak 3ST: Profilometer | Profilometer: Veeco Dektak 3ST]]

===== Optical Characterization =====
* [[Digital Microscope Keyence VHX7000 | Digital Microscope and Camera: Keyence HVX-7000]]
* [[Fluorescence Microscope | Fluorescence Microscope: Olympus IX81]]
* [[Light Microscope with Spectroscopic Reflectometer | Light Microscope: Olympus BX51M with Filmetrics Spectroscopic Reflectometer]]
* [[Spectroscopic Ellipsometer | Spectroscopic Ellipsometer: Woolam M-2000]]
* [[Profilometer: Keyence VK-X3000 | Optical Profilometer: Keyence VK-X3000]]

===== Sample Preparation for Microscopy =====
* [[Carbon Evaporator | Conductive thin film deposition: Leica EM ACE600 Carbon Evaporator & Metal Sputter Coater]]
* [[Tergeo Plus ICP- & CCP-RIE: Oxygen & Argon Plasma Cleaner | Oxygen & Argon Plasma Cleaner (Tergeo Plus ICP- & CCP-RIE) to remove hydrocarbons from surface]]


===== Stubs for specimen mounting =====
* Stubs used for mounting specimens are considered a personal, consumable item in the KNI. There are some stubs at each Microscope which can be used by any KNI microscopy user. You can also buy your own stubs so that you can keep them clean and available to you. There are many stub geometries and configurations. If you chose to buy your own stubs, please show them to the staff microscopist prior to using them: some stubs including stubs with copper clips have large height differences and can only be used safely in specific operating conditions.


== Wet Chemistry ==
===== Wet Chemistry Main page=====
* [[Wet Chemistry | Wet Chemistry page:]]
- Facilities Procedures & Safety

- List of Chemicals Supplied by KNI with Safety Data Sheets

- List of Chemicals Approved for use in the KNI cleanroom (not supplied by KNI) with Safety Data Sheets

- Requesting New Chemicals for use in the KNI cleanroom

===== Wet Chemistry Safety page=====
* [[Wet Chemistry Safety | Wet Chemistry Safety page]]
- PPE Overview

-Hazardous Waste Handling and Labeling

-Decanting Chemicals

-Hot Plate Rules

-KNI Buddy System

-Secondary Containment and Other Best Practices.

===== Wet Chemistry Resources page=====
* [[Wet Chemistry Resources | Wet Chemistry Resources page]]
- Contains fabrication recipes and procedures.

== Support Tools ==
===== Equipment Status =====

===== Thermal Processing =====
* [[Tube Furnaces for Wet & Dry Processing | Tube Furnaces: Tystar Tytan 1 & 2 (Wet & Dry Oxidation and Annealing)]]
* [[Rapid Thermal Processor | Rapid Thermal Processing: Solaris 150]]
===== Substrate Processing =====
* [[Scriber-Breaker | Scriber-Breaker: Dynatex GST-150]]

* [[Critical Point Dryer | Critical Point Dryer: Tousimis Automegasamdri 915B]]
===== Device Processing =====
* [[Wedge-Wedge Wire Bonder | Wedge-Wedge Wire Bonder: Westbond model 7476D-79]]
* [[Electrical Probing Station | Electrical Probing Station: Cascade Microtech M150]]
===== Metrology =====
* [[Profilometer: Keyence VK-X3000 |Optical Profilometer: Keyence VK-X3000]]
* [[Dektak 3ST: Profilometer | Stylus Profilometer: Veeco Dektak 3ST]]
* [[Digital Microscope Keyence VHX7000 | Digital Microscope and Camera: Keyence HVX-7000]]
* [[Electrical Probing Station | Electrical Probing Station: Cascade Microtech M150]]
* [[Spectroscopic Ellipsometer | Spectroscopic Ellipsometer: Woolam M-2000]]
* [[Light Microscope with Spectroscopic Reflectometer | Light Microscope: Olympus BX51M with Filmetrics Spectroscopic Reflectometer]]
* Light Microscope Nikon L200 / Nikon Camera - [https://caltech.box.com/s/3sxmh6pt073a7qgpohgzjdl53acmr2ho Nikon L200/L200D Manual], [https://caltech.box.com/s/4fmfx7mazcdpjy0edqbgi4e1jbb7azdy Nikon L200 Operation Quick Reference]

===== Sample Preparation =====

* [[Carbon Evaporator | Carbon Evaporator (Leica EM ACE600) to make samples conductive]]
* [[Tergeo Plus ICP- & CCP-RIE: Oxygen & Argon Plasma Cleaner | Oxygen & Argon Plasma Cleaner (Tergeo Plus ICP- & CCP-RIE) to remove hydrocarbons from surface]]

Oxide/Nitride Deposition: Oxford Instruments PlasmaPro System 100 PECVD

2026-01-22T22:20:20Z

Tkimoto: Created page with "{{InstrumentInfoboxOneImage| |InstrumentName = PECVD |HeaderColor = #F2682A |ImageOne = PECVD_Oxford-System-100.jpg |ImageTwo = |InstrumentType = Deposition |RoomLocation = B235 Steele |LabPhone = 626-395-1532 |PrimaryStaff = Kelly McKenzie |StaffEmail = kmmckenz@caltech.edu |StaffPhone = 626-395-5732 |Manufacturer = Oxford Instruments |Model = PlasmaPro System 100 |Techniques = Amorphous Silicon Deposition, Silicon Dioxide Depositio..."

{{InstrumentInfoboxOneImage|
|InstrumentName = PECVD
|HeaderColor = #F2682A
|ImageOne = PECVD_Oxford-System-100.jpg
|ImageTwo =
|InstrumentType = [[Equipment_List#Deposition|Deposition]]
|RoomLocation = B235 Steele
|LabPhone = 626-395-1532
|PrimaryStaff = [[Kelly McKenzie]]
|StaffEmail = kmmckenz@caltech.edu
|StaffPhone = 626-395-5732
|Manufacturer = Oxford Instruments
|Model = PlasmaPro System 100
|Techniques = Amorphous Silicon Deposition, Silicon Dioxide Deposition, Silicon Nitride Deposition
|EmailList = kni-oxfordpecvd
|EmailListName = Oxford PECVD
}}
== Description ==
The Plasma-Enhanced Chemical Vapor Deposition (PECVD) system is an Oxford Instruments Plasma Technology Plasmalab System 100 platform that is optimized for amorphous silicon, silicon dioxide, and silicon nitride deposition. The PECVD has a variable temperature stage (RT to 600 °C). This system supports wafer sizes up to 6 inches, and provides PECVD film growth over a wide range of process conditions.
===== Applications =====
* Amorphous Silicon Deposition
* Silicon Dioxide Deposition
* Silicon Nitride Deposition
===== Allowed material in PECVD System =====
* Si, SixNy, SiO2, SOI
* Hard masks compatible with process temperature
===== PECVD Gas List =====
* 5% SiH4 in N2
* 5% SiH4 in Ar
* NH3
* N2O
* N2
* Mixture of CF4 and O2 (4:1) for Plasma Clean

== Resources ==
===== SOPs & Troubleshooting =====
* [https://caltech.box.com/s/c8qx3ikzjb05x44o4updpqs36ra39ytw KNI SOP]
* [https://caltech.box.com/s/0gh89zgxkchj8nkbl1bbrdgvspu31obc Oxfords reservation and use policy]
* [https://caltech.box.com/s/4qbaqhklg9bak0hlgd469d1ixxtttgxp Etcher toxic gas handling SOP]
* [https://caltech.box.com/s/jesslkguhfgdl9pud83mmtm2ruf6vb50 Power Up Oxford ICP-RIE SOP]
* [https://caltech.box.com/s/29e5taof6r80d45lfb4sgbup1k6rebpx Gas Status Board SOP]

===== Process Documents =====
* [https://caltech.box.com/s/qnxzioeoudzbnow9aopguf9xkysxsey3 KNI's Amorphous Silicon recipe]
* [https://caltech.box.com/s/gy10uau7tikhvhakgpjvlzalb7boavbv KNI's 350C SiO2 recipe]
* [https://caltech.box.com/s/0e14n82o7o9yziqmlygkakfcv1lp65iu Process Standards]
* [https://caltech.box.com/s/6b2ivuuguflqjaqby5werlcslmmudryf High rate SiOx]
* [https://caltech.box.com/s/vi6vb1nz8thm3sflt5ncoyhi62tomi82 High rate SiNx]
* [https://caltech.box.com/s/tc4j0yr2jazv0rd6ey22ri8jd1asl326 Low Rate SiOx]
* [https://caltech.box.com/s/r3socf5rslp7qs9rb5o7vvpyp12qf0ps Low rate SiNx]
* [https://caltech.box.com/s/6acyh95hslt0q711makbllgqjrexpew1 Amorphous Silicon Deposition (Silane/helium)]
* [https://caltech.box.com/s/ymt2wqtkkjwcyw5c71f2adm2a1u041zn Etch chamber cleaning recipes]

===== Manufacturer Manuals =====
* [https://labrunr.caltech.edu/machinefiles/116/System%20Manual%20for%20Caltech%2094-219848.pdf Oxford PECVD System Manual]
* [https://caltech.box.com/s/zqfonyv64m2m76mo8b4xn63ljz9ee4i5 Alcatel ADS 602P dry vacuum pump Manual]

== Specifications ==
===== Manufacturer Specifications =====
* [https://caltech.box.com/s/kvgp7d7zx9gczapf7iun791m234vevod Manufacturer Data Sheet]
===== System Features =====
* Universal base console that houses the electronic sub systems, control units, pneumatics, and turbomolecular pump
* PC 2000 Operating system
* PECVD process chamber with 160 mm pumping port, view port, and an additional rear port for optical emission end-point-detection
* Heated upper electrode to prevent condensation of low vapor pressure precursors
* PECVD 205 mm electrically heated (700 °C) lower electrode with central wafer lift mechanism
* Parameter ramping software
* 5 Torr capacitance manometer for process control, and penning for base pressure measurement
* Process chamber pumping with 63 mm branch to APC, and isolation valve; chamber base pressure turbo, backed by a refurbished dry pump with roots
* Twelve line gas pod with two non-toxic and three toxic digital mass-flow-controlled gas lines and cleaning gas
* Chamber Gas ring, with split gas manifold
* Liquid vapor delivery system
* Single-wafer automatic insertion load lock with soft pump option
===== System Specifications =====
* Chamber wall heating 80 °C
* 30/300 W RF generator close-coupled to the upper electrode through an automatic matching unit; the generator is configured to operate in a low-power mode (0-30 W) for higher accuracy during low-rate deposition processes
* 600 W solid-state 50-460 kHz LF generator

== Related Instrumentation in the KNI ==
===== Sputtering Systems =====
* [[ATC Orion 8: Dielectric Sputter System|ATC Orion 8: Dielectric Sputter System]]
* [[ATC Orion 8: Chalcogenide Sputter System|ATC Orion 8: Chalcogenide Sputter System]]

===== Electron Beam Evaporation Systems =====
* [[Labline: Electron Beam Evaporator|Labline: Electron Beam Evaporator]]
* [[CHA: Electron Beam Evaporator|CHA: Electron Beam Evaporator]]

===== Chemical Vapor Deposition =====
* [[FlexAL II: Atomic Layer Deposition (ALD)|FlexAL II: Atomic Layer Deposition (ALD)]]
* [[Plasma-Enhanced Chemical Vapor Deposition (PECVD)|Plasma-Enhanced Chemical Vapor Deposition (PECVD)]]

FlexAL II: Atomic Layer Deposition (ALD)

2026-01-22T22:18:29Z

Tkimoto: /* Chemical Vapor Deposition */

{{InstrumentInfoboxOneImage|
|InstrumentName = Atomic Layer Deposition (ALD)
|HeaderColor = #F2682A
|ImageOne = FlexAL-II-ALD.jpg
|ImageTwo =
|InstrumentType = [[Equipment_List#Deposition|Deposition]]
|RoomLocation = B235 Steele
|LabPhone = 626-395-1532
|PrimaryStaff = [[Kelly McKenzie]]
|StaffEmail = kmmckenz@caltech.edu
|StaffPhone = 626-395-5732
|Manufacturer = Oxford Instruments
|Techniques = Atomic Layer Deposition of Oxides and Nitrides
|EmailList = kni-ald
|EmailListName = Oxford FlexAl ALD
|Model = FlexAL II
}}
== Description ==
The Atomic Layer Deposition (ALD) system is an Oxford Instruments Plasma Technology FlexAL II platform that is designed to grow thin films one atomic layer at a time under very precise deposition conditions. It is configured with a 240 mm diameter resistance-heated, RF-biased aluminum electrode with temperature control to 600 °C, and substrate sizes up to 6 inches (150 mm), with optional configuration for 8 inches (200 mm). There is an inductively-coupled plasma (ICP) source for plasma-enhanced ALD, as well as the more traditional thermal processes, with six precursor gases to grow a variety of high-purity oxides and nitrides.

Some film examples by KNI lab members include thermally-grown conductive TiO2 as protective coatings for semiconducting photoanodes in water-splitting cells, thermal and plasma-assisted Al2O3 and HfO2 as gate dielectrics in 2D transition metal dichalcogenide materials, as well as NbN and TiN deposition.

===== Applications =====
* Aluminum oxide and nitride deposition
* Silicon dioxide and nitride deposition
* Titanium oxide and nitride deposition
* Hafnium oxide deposition
* Niobium oxide and nitride deposition
* Deposition of other films can be made available upon request

===== Allowed material in ALD System =====
* Si, SixNy, SiO2, SOI
* Hard masks compatible with process temperature

===== ALD Gas List (links to SDS) =====
* [https://caltech.box.com/s/4ydr6ju2pbvulef7e0vzlb8i58nijkrg SF6]
* [https://caltech.box.com/s/s3oi147iafil7ruil2dwgw5kxn9je2a5 N2]
* [https://caltech.box.com/s/sar0sdkzrjyvzh63gww199558297rzaj O2]
* [https://caltech.box.com/s/f08m19vgz2sir41vzqdkql4wcpcsc7nz O3]
* [https://caltech.box.com/s/g4r8qnbmn4gfdly1knni5rhnubpuq0zv NH3]
* [https://caltech.box.com/s/f6080rhdsuu8mblne62c02oapl7319cg H2]
* [https://caltech.box.com/s/djtj0j1671dvo6to8x0t56g2b8ekvmrz Ar]

===== ALD Precursor List (Links to SDS) =====
* [https://caltech.box.com/s/hff83jq4x96new2sgczzvwgacy7tsl0e TMA (aluminum)]
* [https://caltech.box.com/s/pkjuqifvnzle2eanykhvhe4m8hu6qgye TDMAT (titanium)]
* [https://caltech.box.com/s/jurskhuqjxhpnmtl5iwfmgpj8d3apmy3 BTBAS (silicon)]
* BDEAS (silicon) (SDS coming soon)
* [https://caltech.box.com/s/6zdhb6n1yr78wgy9mtjzqkljo75vxb75 TDMAH (hafnium)]
* [https://caltech.box.com/s/pznx6n00avfmmp47h3esqkkc7hsrw04d TBTDEN (niobium)]
* Others upon request

== Resources ==
===== Equipment Status =====
* [https://labrunr.caltech.edu/Equipment_2.aspx LabRunr Equipment Status] (Select ALD from the dropdown menu)

===== SOPs & Troubleshooting =====
* [https://caltech.box.com/s/97mn2fyncejg6d4uo5lwtyl98w8n9gd2 KNI ALD SOP]
* [https://caltech.box.com/s/0gh89zgxkchj8nkbl1bbrdgvspu31obc Oxfords reservation and use policy]
* [https://caltech.box.com/s/4qbaqhklg9bak0hlgd469d1ixxtttgxp Etcher toxic gas handling SOP]
* [https://caltech.box.com/s/jesslkguhfgdl9pud83mmtm2ruf6vb50 Power Up Oxford ICP-RIE SOP]
* [https://caltech.box.com/s/29e5taof6r80d45lfb4sgbup1k6rebpx Gas Status Board SOP]

===== Process Documents (login to LabRunr required)=====
* [https://labrunr.caltech.edu/machinefiles/154/Oxford%20Instruments%20ALD%20Materials%20Example%20Guide%20-%202017-10-25.pdf Oxford Instruments ALD Materials Example Guide]
* [https://labrunr.caltech.edu/machinefiles/154/OxfordInstruments%20ALD%20-%20gases%20and%20precursors.pdf Oxford Instruments ALD gases and precursors]
* [https://labrunr.caltech.edu/machinefiles/154/CalTech_Process_Visit_Report_Final.pdf Oxford Instruments ALD Process Acceptance report]
* [https://labrunr.caltech.edu/machinefiles/154/process%20infor%20for%20Caltech_v2.pdf Oxford Instruments ALD Process Information guidance]
* [https://labrunr.caltech.edu/machinefiles/154/ALD%20Bias%20Control%20Oxford%20Instruments.pdf Oxford Instruments ALD Bias Control]

===== Process Resources =====
* [https://caltech.box.com/s/rw25s9zzka0adhgclxr9ppxpoyduanx7 Aluminum Nitride (AlN)]
* [https://caltech.box.com/s/o0lmo99pz3p4cjihmytmvqbvmq5pr1yg Aluminum Oxide (Al2O3)]
* [https://caltech.box.com/s/gvmfu3np83ehfwub7ebuuajyia52thv0 Hafnium Oxide (HfO2)]
* [https://caltech.box.com/s/h7x9a3i8uj55hbahpam9fzni967fjnkp Silicon Nitride (Si3N4)]
* [https://caltech.box.com/s/zaloyrsabapa5b7pvnjxglsgfjeux1zx Titanium Nitride (TiN)]
* [https://caltech.box.com/s/knpefm73sdjsnd7zmo78mr6h273eyx2n Titanium Oxide (TiO2)]

===== Manufacturer Manuals =====
* [https://labrunr.caltech.edu/machinefiles/154/FlexAL_II_IDS_EN_10.pdf Oxford FlexAL ALD System manual] (login to LabRunr)
* [https://caltech.box.com/s/tgypp7gvwxtk8um4pmybietd29fj7htj Adixen 4 Series Multistage Roots dry pumps brochure]
* [https://caltech.box.com/s/eubo1b949weunxvwkti50jhi7nuh7mgb NovaSafe exhaust abatement system manual]
* [https://labrunr.caltech.edu/machinefiles/154/OzoneDel_MAN_EN_1A.PDF Oxford Ozone Delivery module manual] (login to LabRunr)
* [https://caltech.box.com/s/8n7k2wiwqzxlpt32uaj2rwvf7maqu9xl Oxford FlexAl system drawings] (login to LabRunr)

== Specifications ==
===== System Features =====
* FlexAL ALD Process Module
* The chamber is electrically heated to 150 °C
* Two ports at 70° angle from normal for ellipsometry and an additional port for analytical equipment such as RGA
* Precursor Multi-Bubbler Cabinet 6 Way
* Standard Gas Pod externally mounted (8 lines max)
* 4 each Standard gasline and MFC for non-toxic gases
* 3 each By-passed gasline and MFC for toxic gases
* Ozone delivery system for ALD with up to 22% w/w ozone concentration
* Chamber turbo pump Pfeiffer/Adixen ATH500M, ISO200 pipework, APC & heated backing valve kit
* Chamber process pump Pfeiffer/Adixen A604H kit
* FlexAL compact single wafer load lock kit
* Load Lock dry pump kit
* PC & 19" monitor
===== System Specifications =====
* ICP 65 plasma source with 600 W 13.56 MHz RF Generator & AMU
* ALD 600 °C biasable Inconel electrode
* Heated 250 mTorr high resolution temperature compensated capacitance manometer
* ALD 100 mm pumping pipework plus 100 mm fast APC
* Process Acceptance criteria for thermal and plasma Al2O3 and TiO2

== Related Instrumentation in the KNI ==
===== Sputtering Systems =====
* [[ATC Orion 8: Dielectric Sputter System|ATC Orion 8: Dielectric Sputter System]]
* [[ATC Orion 8: Chalcogenide Sputter System|ATC Orion 8: Chalcogenide Sputter System]]

===== Electron Beam Evaporation Systems =====
* [[Labline: Electron Beam Evaporator|Labline: Electron Beam Evaporator]]
* [[CHA: Electron Beam Evaporator|CHA: Electron Beam Evaporator]]

===== Chemical Vapor Deposition =====
* [[FlexAL II: Atomic Layer Deposition (ALD)|FlexAL II: Atomic Layer Deposition (ALD)]]
* [[Silicon Deposition: Oxford Instruments Plasmalab System 100 PECVD|Silicon Deposition: Oxford Instruments Plasmalab System 100 PECVD]]

Equipment List

2026-01-22T22:18:03Z

Tkimoto: /* Deposition */

'''NOTE: For EQUIPMENT TRAINING, make a training request via FBS. See link to instructions:''' [[FBS Instructions | FBS Instructions]]

== Lithography ==
===== Electron Beam Lithography =====
* [[EBPG 5200: 100 kV Electron Beam Lithography | Electron Beam Pattern Generator: Raith EBPG 5200 (100 kV)]]
* [[EBPG 5000+: 100 kV Electron Beam Lithography | Electron Beam Pattern Generator: Raith EBPG 5000+ (100 kV)]]
* [[Quanta 200F: SEM, ESEM, Lithography & Probe Station | Nanometer Pattern Generation System: Thermo Fisher Quanta 200F SEM with NPGS (1-30 kV)]]

===== Ion Beam Lithography =====
* [[ORION NanoFab: Helium, Neon & Gallium FIB | He/Ne/Ga-FIB: Zeiss ORION NanoFab with Raith ELPHY MultiBeam Pattern Generator (5-40 kV He & Ne, 1-30 kV Ga)]]
* [[Nova 600 NanoLab: SEM, Ga-FIB, GIS & Omniprobe | Ga-FIB, SEM, GIS & Omniprobe: Thermo Fisher Nova 600 NanoLab]]
===== Optical Lithography =====
* [[Contact Mask Aligners: MA6 & MA6/BA6 | Contact Mask Aligners: Suss MicroTec models MA6 & MA6/BA6]]
* [[Wafer Stepper | i-Line Wafer Stepper: GCA model 6300]]
* [[CNI-PV 2.1: Nano Imprint Lithography | Nano Imprint Lithography: NILT CNI-PV 2.1]]
* [[DWL-66: Direct-Write Laser System | Direct-Write Laser System: Heidelberg Instruments DWL-66]]
* [[Nanoscribe PPGT: Microscale 3D Printer | Two-Photon Lithography (aka Microscale 3D Printing): Nanoscribe Photonic Professional GT]]
* [[Optical Lithography Resources]]

== Deposition ==
===== Evaporation =====
* [[Labline: Electron Beam Evaporator | Metals (Al, Au, Pt & Ti): Kurt J Lesker Labline Electron Beam Evaporator]]

* [[Carbon Evaporator | Conductive thin film deposition: Leica EM ACE600 Carbon Evaporator & Sputter Coater]]
* [[AJA Orion ATC Series Electron Beam Evaporator | Metals & Oxides: AJA Orion ATC Series Electron Beam Evaporator]]

===== Sputtering =====
* [[ATC Orion 8: Dielectric Sputter System | Dielectric Sputter System: AJA International ATC Orion 8]]
* [[ATC Orion 8: Chalcogenide Sputter System | Chalcogenide Sputter System: AJA International ATC Orion 8]]

===== Chemical Vapor Deposition (CVD) =====
* [[FlexAL II: Atomic Layer Deposition (ALD) | Atomic Layer Deposition (ALD): Oxford Instruments FlexAL II]]
* [[Silicon Deposition: Oxford Instruments Plasmalab System 100 PECVD | Silicon Deposition: Oxford Instruments Plasmalab System 100 PECVD]]

===== Dielectric Packaging / Moisture Barrier =====
* [[Parylene Coater | Parylene Coater: Para Tech LabTop 3000]]

== Etching ==
===== Dry Etching =====
* [[DRIE: Bosch & Cryo ICP-RIE for Silicon | Silicon Etcher: Oxford Instruments DRIE System 100 Bosch & Cryo ICP-RIE]]
* [[ICP-RIE: III-V, Metal & Silicon Etcher | III-V Material, Metal & Silicon Etcher: Oxford Instruments System 100 ICP-RIE]]
* [[ICP-RIE: Dielectric Etcher | Dielectric Material Etcher: Oxford Instruments Dielectric System 100 ICP-RIE]]
* [[Dual Chamber RIE: Silicon, III-V Material & Organics Etcher | Silicon, III-V Material & Organics Etcher: Plasma-Therm Dual Chamber RIE]]
* [[Tergeo Plus ICP- & CCP-RIE: Oxygen & Argon Plasma Cleaner | Oxygen & Argon Plasma Cleaner: PIE Scientific Tergeo Plus ICP- & CCP-RIE]]
* [[XeF2 Etcher for Silicon | XeF2 Etcher for Silicon]]

===== Wet Etching =====
* [[Wet Chemistry | Available Wet Etching Techniques]]

== Microscopy ==
===== KNI Microscopy Policies =====
* [https://caltech.box.com/s/rpbtox8l31qi3kw3b014e3e8i4ctjpdy KNI Microscopy Policies]

===== Microscopy High Performance PC =====
*[[Information on the 3D reconstruction PC | Microscopy High Perfomance PC for 3D reconstruction and data processing]]

===== Guide to Choosing KNI SEMs & FIBs =====
*[[Guide to Choosing KNI SEMs & FIBs | Consult this guide for help in choosing the best SEMs and FIBs for your work]]

===== Focused Ion Beam (FIB) Systems =====
* [[ORION NanoFab: Helium, Neon & Gallium FIB | Helium, Neon & Gallium FIB: Zeiss ORION NanoFab]]
* [[Nova 600 NanoLab: SEM, Ga-FIB, GIS & Omniprobe | SEM, Ga-FIB, GIS & Omniprobe: Thermo Fisher Nova 600 NanoLab]]
===== Scanning Electron Microscopes (SEMs) =====

* [[Sirion: SEM & EDS | Sirion: SEM & EDS]]
* [[Quanta 200F: SEM, ESEM, Lithography & Probe Station | SEM, ESEM, Lithography & Probe Station: Thermo Fisher Quanta 200F]]
* [[Nova 600 NanoLab: SEM, Ga-FIB, GIS & Omniprobe|SEM, Ga-FIB, EDS, GIS & Omniprobe: Thermo Fisher Nova 600 NanoLab]]




===== Scanning Probe Microscopes =====
* [[Dimension Icon: Atomic Force Microscope (AFM) | Atomic Force Microscope (AFM): Bruker Dimension Icon]]
* [[Dektak 3ST: Profilometer | Profilometer: Veeco Dektak 3ST]]

===== Optical Characterization =====
* [[Digital Microscope Keyence VHX7000 | Digital Microscope and Camera: Keyence HVX-7000]]
* [[Fluorescence Microscope | Fluorescence Microscope: Olympus IX81]]
* [[Light Microscope with Spectroscopic Reflectometer | Light Microscope: Olympus BX51M with Filmetrics Spectroscopic Reflectometer]]
* [[Spectroscopic Ellipsometer | Spectroscopic Ellipsometer: Woolam M-2000]]
* [[Profilometer: Keyence VK-X3000 | Optical Profilometer: Keyence VK-X3000]]

===== Sample Preparation for Microscopy =====
* [[Carbon Evaporator | Conductive thin film deposition: Leica EM ACE600 Carbon Evaporator & Metal Sputter Coater]]
* [[Tergeo Plus ICP- & CCP-RIE: Oxygen & Argon Plasma Cleaner | Oxygen & Argon Plasma Cleaner (Tergeo Plus ICP- & CCP-RIE) to remove hydrocarbons from surface]]


===== Stubs for specimen mounting =====
* Stubs used for mounting specimens are considered a personal, consumable item in the KNI. There are some stubs at each Microscope which can be used by any KNI microscopy user. You can also buy your own stubs so that you can keep them clean and available to you. There are many stub geometries and configurations. If you chose to buy your own stubs, please show them to the staff microscopist prior to using them: some stubs including stubs with copper clips have large height differences and can only be used safely in specific operating conditions.


== Wet Chemistry ==
===== Wet Chemistry Main page=====
* [[Wet Chemistry | Wet Chemistry page:]]
- Facilities Procedures & Safety

- List of Chemicals Supplied by KNI with Safety Data Sheets

- List of Chemicals Approved for use in the KNI cleanroom (not supplied by KNI) with Safety Data Sheets

- Requesting New Chemicals for use in the KNI cleanroom

===== Wet Chemistry Safety page=====
* [[Wet Chemistry Safety | Wet Chemistry Safety page]]
- PPE Overview

-Hazardous Waste Handling and Labeling

-Decanting Chemicals

-Hot Plate Rules

-KNI Buddy System

-Secondary Containment and Other Best Practices.

===== Wet Chemistry Resources page=====
* [[Wet Chemistry Resources | Wet Chemistry Resources page]]
- Contains fabrication recipes and procedures.

== Support Tools ==
===== Equipment Status =====

===== Thermal Processing =====
* [[Tube Furnaces for Wet & Dry Processing | Tube Furnaces: Tystar Tytan 1 & 2 (Wet & Dry Oxidation and Annealing)]]
* [[Rapid Thermal Processor | Rapid Thermal Processing: Solaris 150]]
===== Substrate Processing =====
* [[Scriber-Breaker | Scriber-Breaker: Dynatex GST-150]]

* [[Critical Point Dryer | Critical Point Dryer: Tousimis Automegasamdri 915B]]
===== Device Processing =====
* [[Wedge-Wedge Wire Bonder | Wedge-Wedge Wire Bonder: Westbond model 7476D-79]]
* [[Electrical Probing Station | Electrical Probing Station: Cascade Microtech M150]]
===== Metrology =====
* [[Profilometer: Keyence VK-X3000 |Optical Profilometer: Keyence VK-X3000]]
* [[Dektak 3ST: Profilometer | Stylus Profilometer: Veeco Dektak 3ST]]
* [[Digital Microscope Keyence VHX7000 | Digital Microscope and Camera: Keyence HVX-7000]]
* [[Electrical Probing Station | Electrical Probing Station: Cascade Microtech M150]]
* [[Spectroscopic Ellipsometer | Spectroscopic Ellipsometer: Woolam M-2000]]
* [[Light Microscope with Spectroscopic Reflectometer | Light Microscope: Olympus BX51M with Filmetrics Spectroscopic Reflectometer]]
* Light Microscope Nikon L200 / Nikon Camera - [https://caltech.box.com/s/3sxmh6pt073a7qgpohgzjdl53acmr2ho Nikon L200/L200D Manual], [https://caltech.box.com/s/4fmfx7mazcdpjy0edqbgi4e1jbb7azdy Nikon L200 Operation Quick Reference]

===== Sample Preparation =====

* [[Carbon Evaporator | Carbon Evaporator (Leica EM ACE600) to make samples conductive]]
* [[Tergeo Plus ICP- & CCP-RIE: Oxygen & Argon Plasma Cleaner | Oxygen & Argon Plasma Cleaner (Tergeo Plus ICP- & CCP-RIE) to remove hydrocarbons from surface]]

Equipment List

2026-01-22T22:17:41Z

Tkimoto: /* Chemical Vapor Deposition (CVD) */

'''NOTE: For EQUIPMENT TRAINING, make a training request via FBS. See link to instructions:''' [[FBS Instructions | FBS Instructions]]

== Lithography ==
===== Electron Beam Lithography =====
* [[EBPG 5200: 100 kV Electron Beam Lithography | Electron Beam Pattern Generator: Raith EBPG 5200 (100 kV)]]
* [[EBPG 5000+: 100 kV Electron Beam Lithography | Electron Beam Pattern Generator: Raith EBPG 5000+ (100 kV)]]
* [[Quanta 200F: SEM, ESEM, Lithography & Probe Station | Nanometer Pattern Generation System: Thermo Fisher Quanta 200F SEM with NPGS (1-30 kV)]]

===== Ion Beam Lithography =====
* [[ORION NanoFab: Helium, Neon & Gallium FIB | He/Ne/Ga-FIB: Zeiss ORION NanoFab with Raith ELPHY MultiBeam Pattern Generator (5-40 kV He & Ne, 1-30 kV Ga)]]
* [[Nova 600 NanoLab: SEM, Ga-FIB, GIS & Omniprobe | Ga-FIB, SEM, GIS & Omniprobe: Thermo Fisher Nova 600 NanoLab]]
===== Optical Lithography =====
* [[Contact Mask Aligners: MA6 & MA6/BA6 | Contact Mask Aligners: Suss MicroTec models MA6 & MA6/BA6]]
* [[Wafer Stepper | i-Line Wafer Stepper: GCA model 6300]]
* [[CNI-PV 2.1: Nano Imprint Lithography | Nano Imprint Lithography: NILT CNI-PV 2.1]]
* [[DWL-66: Direct-Write Laser System | Direct-Write Laser System: Heidelberg Instruments DWL-66]]
* [[Nanoscribe PPGT: Microscale 3D Printer | Two-Photon Lithography (aka Microscale 3D Printing): Nanoscribe Photonic Professional GT]]
* [[Optical Lithography Resources]]

== Deposition ==
===== Evaporation =====
* [[Labline: Electron Beam Evaporator | Metals (Al, Au, Pt & Ti): Kurt J Lesker Labline Electron Beam Evaporator]]

* [[Carbon Evaporator | Conductive thin film deposition: Leica EM ACE600 Carbon Evaporator & Sputter Coater]]
* [[AJA Orion ATC Series Electron Beam Evaporator | Metals & Oxides: AJA Orion ATC Series Electron Beam Evaporator]]

===== Sputtering =====
* [[ATC Orion 8: Dielectric Sputter System | Dielectric Sputter System: AJA International ATC Orion 8]]
* [[ATC Orion 8: Chalcogenide Sputter System | Chalcogenide Sputter System: AJA International ATC Orion 8]]

===== Chemical Vapor Deposition (CVD) =====
* [[FlexAL II: Atomic Layer Deposition (ALD) | Atomic Layer Deposition (ALD): Oxford Instruments FlexAL II]]
* [[Silicon Deposition: Oxford Instruments Plasmalab System 100 PECVD | Plasma-Enhanced Chemical Vapor Deposition (PECVD): Oxford Instruments System 100]]

===== Dielectric Packaging / Moisture Barrier =====
* [[Parylene Coater | Parylene Coater: Para Tech LabTop 3000]]

== Etching ==
===== Dry Etching =====
* [[DRIE: Bosch & Cryo ICP-RIE for Silicon | Silicon Etcher: Oxford Instruments DRIE System 100 Bosch & Cryo ICP-RIE]]
* [[ICP-RIE: III-V, Metal & Silicon Etcher | III-V Material, Metal & Silicon Etcher: Oxford Instruments System 100 ICP-RIE]]
* [[ICP-RIE: Dielectric Etcher | Dielectric Material Etcher: Oxford Instruments Dielectric System 100 ICP-RIE]]
* [[Dual Chamber RIE: Silicon, III-V Material & Organics Etcher | Silicon, III-V Material & Organics Etcher: Plasma-Therm Dual Chamber RIE]]
* [[Tergeo Plus ICP- & CCP-RIE: Oxygen & Argon Plasma Cleaner | Oxygen & Argon Plasma Cleaner: PIE Scientific Tergeo Plus ICP- & CCP-RIE]]
* [[XeF2 Etcher for Silicon | XeF2 Etcher for Silicon]]

===== Wet Etching =====
* [[Wet Chemistry | Available Wet Etching Techniques]]

== Microscopy ==
===== KNI Microscopy Policies =====
* [https://caltech.box.com/s/rpbtox8l31qi3kw3b014e3e8i4ctjpdy KNI Microscopy Policies]

===== Microscopy High Performance PC =====
*[[Information on the 3D reconstruction PC | Microscopy High Perfomance PC for 3D reconstruction and data processing]]

===== Guide to Choosing KNI SEMs & FIBs =====
*[[Guide to Choosing KNI SEMs & FIBs | Consult this guide for help in choosing the best SEMs and FIBs for your work]]

===== Focused Ion Beam (FIB) Systems =====
* [[ORION NanoFab: Helium, Neon & Gallium FIB | Helium, Neon & Gallium FIB: Zeiss ORION NanoFab]]
* [[Nova 600 NanoLab: SEM, Ga-FIB, GIS & Omniprobe | SEM, Ga-FIB, GIS & Omniprobe: Thermo Fisher Nova 600 NanoLab]]
===== Scanning Electron Microscopes (SEMs) =====

* [[Sirion: SEM & EDS | Sirion: SEM & EDS]]
* [[Quanta 200F: SEM, ESEM, Lithography & Probe Station | SEM, ESEM, Lithography & Probe Station: Thermo Fisher Quanta 200F]]
* [[Nova 600 NanoLab: SEM, Ga-FIB, GIS & Omniprobe|SEM, Ga-FIB, EDS, GIS & Omniprobe: Thermo Fisher Nova 600 NanoLab]]




===== Scanning Probe Microscopes =====
* [[Dimension Icon: Atomic Force Microscope (AFM) | Atomic Force Microscope (AFM): Bruker Dimension Icon]]
* [[Dektak 3ST: Profilometer | Profilometer: Veeco Dektak 3ST]]

===== Optical Characterization =====
* [[Digital Microscope Keyence VHX7000 | Digital Microscope and Camera: Keyence HVX-7000]]
* [[Fluorescence Microscope | Fluorescence Microscope: Olympus IX81]]
* [[Light Microscope with Spectroscopic Reflectometer | Light Microscope: Olympus BX51M with Filmetrics Spectroscopic Reflectometer]]
* [[Spectroscopic Ellipsometer | Spectroscopic Ellipsometer: Woolam M-2000]]
* [[Profilometer: Keyence VK-X3000 | Optical Profilometer: Keyence VK-X3000]]

===== Sample Preparation for Microscopy =====
* [[Carbon Evaporator | Conductive thin film deposition: Leica EM ACE600 Carbon Evaporator & Metal Sputter Coater]]
* [[Tergeo Plus ICP- & CCP-RIE: Oxygen & Argon Plasma Cleaner | Oxygen & Argon Plasma Cleaner (Tergeo Plus ICP- & CCP-RIE) to remove hydrocarbons from surface]]


===== Stubs for specimen mounting =====
* Stubs used for mounting specimens are considered a personal, consumable item in the KNI. There are some stubs at each Microscope which can be used by any KNI microscopy user. You can also buy your own stubs so that you can keep them clean and available to you. There are many stub geometries and configurations. If you chose to buy your own stubs, please show them to the staff microscopist prior to using them: some stubs including stubs with copper clips have large height differences and can only be used safely in specific operating conditions.


== Wet Chemistry ==
===== Wet Chemistry Main page=====
* [[Wet Chemistry | Wet Chemistry page:]]
- Facilities Procedures & Safety

- List of Chemicals Supplied by KNI with Safety Data Sheets

- List of Chemicals Approved for use in the KNI cleanroom (not supplied by KNI) with Safety Data Sheets

- Requesting New Chemicals for use in the KNI cleanroom

===== Wet Chemistry Safety page=====
* [[Wet Chemistry Safety | Wet Chemistry Safety page]]
- PPE Overview

-Hazardous Waste Handling and Labeling

-Decanting Chemicals

-Hot Plate Rules

-KNI Buddy System

-Secondary Containment and Other Best Practices.

===== Wet Chemistry Resources page=====
* [[Wet Chemistry Resources | Wet Chemistry Resources page]]
- Contains fabrication recipes and procedures.

== Support Tools ==
===== Equipment Status =====

===== Thermal Processing =====
* [[Tube Furnaces for Wet & Dry Processing | Tube Furnaces: Tystar Tytan 1 & 2 (Wet & Dry Oxidation and Annealing)]]
* [[Rapid Thermal Processor | Rapid Thermal Processing: Solaris 150]]
===== Substrate Processing =====
* [[Scriber-Breaker | Scriber-Breaker: Dynatex GST-150]]

* [[Critical Point Dryer | Critical Point Dryer: Tousimis Automegasamdri 915B]]
===== Device Processing =====
* [[Wedge-Wedge Wire Bonder | Wedge-Wedge Wire Bonder: Westbond model 7476D-79]]
* [[Electrical Probing Station | Electrical Probing Station: Cascade Microtech M150]]
===== Metrology =====
* [[Profilometer: Keyence VK-X3000 |Optical Profilometer: Keyence VK-X3000]]
* [[Dektak 3ST: Profilometer | Stylus Profilometer: Veeco Dektak 3ST]]
* [[Digital Microscope Keyence VHX7000 | Digital Microscope and Camera: Keyence HVX-7000]]
* [[Electrical Probing Station | Electrical Probing Station: Cascade Microtech M150]]
* [[Spectroscopic Ellipsometer | Spectroscopic Ellipsometer: Woolam M-2000]]
* [[Light Microscope with Spectroscopic Reflectometer | Light Microscope: Olympus BX51M with Filmetrics Spectroscopic Reflectometer]]
* Light Microscope Nikon L200 / Nikon Camera - [https://caltech.box.com/s/3sxmh6pt073a7qgpohgzjdl53acmr2ho Nikon L200/L200D Manual], [https://caltech.box.com/s/4fmfx7mazcdpjy0edqbgi4e1jbb7azdy Nikon L200 Operation Quick Reference]

===== Sample Preparation =====

* [[Carbon Evaporator | Carbon Evaporator (Leica EM ACE600) to make samples conductive]]
* [[Tergeo Plus ICP- & CCP-RIE: Oxygen & Argon Plasma Cleaner | Oxygen & Argon Plasma Cleaner (Tergeo Plus ICP- & CCP-RIE) to remove hydrocarbons from surface]]

Plasma-Enhanced Chemical Vapor Deposition (PECVD)

2026-01-22T22:16:39Z

Tkimoto: Tkimoto moved page Plasma-Enhanced Chemical Vapor Deposition (PECVD) to Silicon Deposition: Oxford Instruments Plasmalab System 100 PECVD: adding new PECVD system to wiki

#REDIRECT [[Silicon Deposition: Oxford Instruments Plasmalab System 100 PECVD]]

Silicon Deposition: Oxford Instruments Plasmalab System 100 PECVD

2026-01-22T22:16:39Z

Tkimoto: Tkimoto moved page Plasma-Enhanced Chemical Vapor Deposition (PECVD) to Silicon Deposition: Oxford Instruments Plasmalab System 100 PECVD: adding new PECVD system to wiki

{{InstrumentInfoboxOneImage|
|InstrumentName = PECVD
|HeaderColor = #F2682A
|ImageOne = PECVD_Oxford-System-100.jpg
|ImageTwo =
|InstrumentType = [[Equipment_List#Deposition|Deposition]]
|RoomLocation = B235 Steele
|LabPhone = 626-395-1532
|PrimaryStaff = [[Kelly McKenzie]]
|StaffEmail = kmmckenz@caltech.edu
|StaffPhone = 626-395-5732
|Manufacturer = Oxford Instruments
|Model = Plasmalab System 100
|Techniques = Amorphous Silicon Deposition, Silicon Dioxide Deposition, Silicon Nitride Deposition
|EmailList = kni-oxfordpecvd
|EmailListName = Oxford PECVD
}}
== Description ==
The Plasma-Enhanced Chemical Vapor Deposition (PECVD) system is an Oxford Instruments Plasma Technology Plasmalab System 100 platform that is optimized for amorphous silicon, silicon dioxide, and silicon nitride deposition. The PECVD has a variable temperature stage (RT to 600 °C). This system supports wafer sizes up to 6 inches, and provides PECVD film growth over a wide range of process conditions.
===== Applications =====
* Amorphous Silicon Deposition
* Silicon Dioxide Deposition
* Silicon Nitride Deposition
===== Allowed material in PECVD System =====
* Si, SixNy, SiO2, SOI
* Hard masks compatible with process temperature
===== PECVD Gas List =====
* 5% SiH4 in N2
* 5% SiH4 in Ar
* NH3
* N2O
* N2
* Mixture of CF4 and O2 (4:1) for Plasma Clean

== Resources ==
===== SOPs & Troubleshooting =====
* [https://caltech.box.com/s/c8qx3ikzjb05x44o4updpqs36ra39ytw KNI SOP]
* [https://caltech.box.com/s/0gh89zgxkchj8nkbl1bbrdgvspu31obc Oxfords reservation and use policy]
* [https://caltech.box.com/s/4qbaqhklg9bak0hlgd469d1ixxtttgxp Etcher toxic gas handling SOP]
* [https://caltech.box.com/s/jesslkguhfgdl9pud83mmtm2ruf6vb50 Power Up Oxford ICP-RIE SOP]
* [https://caltech.box.com/s/29e5taof6r80d45lfb4sgbup1k6rebpx Gas Status Board SOP]

===== Process Documents =====
* [https://caltech.box.com/s/qnxzioeoudzbnow9aopguf9xkysxsey3 KNI's Amorphous Silicon recipe]
* [https://caltech.box.com/s/gy10uau7tikhvhakgpjvlzalb7boavbv KNI's 350C SiO2 recipe]
* [https://caltech.box.com/s/0e14n82o7o9yziqmlygkakfcv1lp65iu Process Standards]
* [https://caltech.box.com/s/6b2ivuuguflqjaqby5werlcslmmudryf High rate SiOx]
* [https://caltech.box.com/s/vi6vb1nz8thm3sflt5ncoyhi62tomi82 High rate SiNx]
* [https://caltech.box.com/s/tc4j0yr2jazv0rd6ey22ri8jd1asl326 Low Rate SiOx]
* [https://caltech.box.com/s/r3socf5rslp7qs9rb5o7vvpyp12qf0ps Low rate SiNx]
* [https://caltech.box.com/s/6acyh95hslt0q711makbllgqjrexpew1 Amorphous Silicon Deposition (Silane/helium)]
* [https://caltech.box.com/s/ymt2wqtkkjwcyw5c71f2adm2a1u041zn Etch chamber cleaning recipes]

===== Manufacturer Manuals =====
* [https://labrunr.caltech.edu/machinefiles/116/System%20Manual%20for%20Caltech%2094-219848.pdf Oxford PECVD System Manual]
* [https://caltech.box.com/s/zqfonyv64m2m76mo8b4xn63ljz9ee4i5 Alcatel ADS 602P dry vacuum pump Manual]

== Specifications ==
===== Manufacturer Specifications =====
* [https://caltech.box.com/s/kvgp7d7zx9gczapf7iun791m234vevod Manufacturer Data Sheet]
===== System Features =====
* Universal base console that houses the electronic sub systems, control units, pneumatics, and turbomolecular pump
* PC 2000 Operating system
* PECVD process chamber with 160 mm pumping port, view port, and an additional rear port for optical emission end-point-detection
* Heated upper electrode to prevent condensation of low vapor pressure precursors
* PECVD 205 mm electrically heated (700 °C) lower electrode with central wafer lift mechanism
* Parameter ramping software
* 5 Torr capacitance manometer for process control, and penning for base pressure measurement
* Process chamber pumping with 63 mm branch to APC, and isolation valve; chamber base pressure turbo, backed by a refurbished dry pump with roots
* Twelve line gas pod with two non-toxic and three toxic digital mass-flow-controlled gas lines and cleaning gas
* Chamber Gas ring, with split gas manifold
* Liquid vapor delivery system
* Single-wafer automatic insertion load lock with soft pump option
===== System Specifications =====
* Chamber wall heating 80 °C
* 30/300 W RF generator close-coupled to the upper electrode through an automatic matching unit; the generator is configured to operate in a low-power mode (0-30 W) for higher accuracy during low-rate deposition processes
* 600 W solid-state 50-460 kHz LF generator

== Related Instrumentation in the KNI ==
===== Sputtering Systems =====
* [[ATC Orion 8: Dielectric Sputter System|ATC Orion 8: Dielectric Sputter System]]
* [[ATC Orion 8: Chalcogenide Sputter System|ATC Orion 8: Chalcogenide Sputter System]]

===== Electron Beam Evaporation Systems =====
* [[Labline: Electron Beam Evaporator|Labline: Electron Beam Evaporator]]
* [[CHA: Electron Beam Evaporator|CHA: Electron Beam Evaporator]]

===== Chemical Vapor Deposition =====
* [[FlexAL II: Atomic Layer Deposition (ALD)|FlexAL II: Atomic Layer Deposition (ALD)]]
* [[Plasma-Enhanced Chemical Vapor Deposition (PECVD)|Plasma-Enhanced Chemical Vapor Deposition (PECVD)]]

Equipment List

2026-01-07T23:13:59Z

Tkimoto: /* Metrology */

'''NOTE: For EQUIPMENT TRAINING, make a training request via FBS. See link to instructions:''' [[FBS Instructions | FBS Instructions]]

== Lithography ==
===== Electron Beam Lithography =====
* [[EBPG 5200: 100 kV Electron Beam Lithography | Electron Beam Pattern Generator: Raith EBPG 5200 (100 kV)]]
* [[EBPG 5000+: 100 kV Electron Beam Lithography | Electron Beam Pattern Generator: Raith EBPG 5000+ (100 kV)]]
* [[Quanta 200F: SEM, ESEM, Lithography & Probe Station | Nanometer Pattern Generation System: Thermo Fisher Quanta 200F SEM with NPGS (1-30 kV)]]

===== Ion Beam Lithography =====
* [[ORION NanoFab: Helium, Neon & Gallium FIB | He/Ne/Ga-FIB: Zeiss ORION NanoFab with Raith ELPHY MultiBeam Pattern Generator (5-40 kV He & Ne, 1-30 kV Ga)]]
===== Optical Lithography =====
* [[Contact Mask Aligners: MA6 & MA6/BA6 | Contact Mask Aligners: Suss MicroTec models MA6 & MA6/BA6]]
* [[Wafer Stepper | i-Line Wafer Stepper: GCA model 6300]]
* [[CNI-PV 2.1: Nano Imprint Lithography | Nano Imprint Lithography: NILT CNI-PV 2.1]]
* [[DWL-66: Direct-Write Laser System | Direct-Write Laser System: Heidelberg Instruments DWL-66]]
* [[Nanoscribe PPGT: Microscale 3D Printer | Two-Photon Lithography (aka Microscale 3D Printing): Nanoscribe Photonic Professional GT]]
* [[Optical Lithography Resources]]

== Deposition ==
===== Evaporation =====
* [[Labline: Electron Beam Evaporator | Metals (Al, Au, Pt & Ti): Kurt J Lesker Labline Electron Beam Evaporator]]

* [[Carbon Evaporator | Conductive thin film deposition: Leica EM ACE600 Carbon Evaporator & Metal Sputter Coater]]
* [[AJA Orion ATC Series Electron Beam Evaporator | Metals & Oxides: AJA Orion ATC Series Electron Beam Evaporator]]

===== Sputtering =====
* [[ATC Orion 8: Dielectric Sputter System | Dielectric Sputter System: AJA International ATC Orion 8]]
* [[ATC Orion 8: Chalcogenide Sputter System | Chalcogenide Sputter System: AJA International ATC Orion 8]]

===== Chemical Vapor Deposition (CVD) =====
* [[FlexAL II: Atomic Layer Deposition (ALD) | Atomic Layer Deposition (ALD): Oxford Instruments FlexAL II]]
* [[Plasma-Enhanced Chemical Vapor Deposition (PECVD) | Plasma-Enhanced Chemical Vapor Deposition (PECVD): Oxford Instruments System 100]]
===== Dielectric Packaging / Moisture Barrier =====
* [[Parylene Coater | Parylene Coater: Para Tech LabTop 3000]]

== Etching ==
===== Dry Etching =====
* [[DRIE: Bosch & Cryo ICP-RIE for Silicon | Silicon Etcher: Oxford Instruments DRIE System 100 Bosch & Cryo ICP-RIE]]
* [[ICP-RIE: III-V, Metal & Silicon Etcher | III-V Material, Metal & Silicon Etcher: Oxford Instruments System 100 ICP-RIE]]
* [[ICP-RIE: Dielectric Etcher | Dielectric Material Etcher: Oxford Instruments Dielectric System 100 ICP-RIE]]
* [[Dual Chamber RIE: Silicon, III-V Material & Organics Etcher | Silicon, III-V Material & Organics Etcher: Plasma-Therm Dual Chamber RIE]]
* [[Tergeo Plus ICP- & CCP-RIE: Oxygen & Argon Plasma Cleaner | Oxygen & Argon Plasma Cleaner: PIE Scientific Tergeo Plus ICP- & CCP-RIE]]
* [[XeF2 Etcher for Silicon | XeF2 Etcher for Silicon]]

===== Wet Etching =====
* [[Wet Chemistry | Available Wet Etching Techniques]]

== Microscopy ==
===== KNI Microscopy Policies =====
* [https://caltech.box.com/s/rpbtox8l31qi3kw3b014e3e8i4ctjpdy KNI Microscopy Policies]

===== Microscopy High Performance PC =====
*[[Information on the 3D reconstruction PC | Microscopy High Perfomance PC for 3D reconstruction and data processing]]

===== Guide to Choosing KNI SEMs & FIBs =====
*[[Guide to Choosing KNI SEMs & FIBs | Consult this guide for help in choosing the best SEMs and FIBs for your work]]

===== Focused Ion Beam (FIB) Systems =====
* [[ORION NanoFab: Helium, Neon & Gallium FIB | Helium, Neon & Gallium FIB: Zeiss ORION NanoFab]]
* [[Nova 600 NanoLab: SEM, Ga-FIB, GIS & Omniprobe | SEM, Ga-FIB, GIS & Omniprobe: Thermo Fisher Nova 600 NanoLab]]
===== Scanning Electron Microscopes (SEMs) =====

* [[Sirion: SEM & EDS | Sirion: SEM & EDS]]
* [[Quanta 200F: SEM, ESEM, Lithography & Probe Station | SEM, ESEM, Lithography & Probe Station: Thermo Fisher Quanta 200F]]
* [[Nova 600 NanoLab: SEM, Ga-FIB, GIS & Omniprobe|SEM, Ga-FIB, EDS, GIS & Omniprobe: Thermo Fisher Nova 600 NanoLab]]




===== Scanning Probe Microscopes =====
* [[Dimension Icon: Atomic Force Microscope (AFM) | Atomic Force Microscope (AFM): Bruker Dimension Icon]]
* [[Dektak 3ST: Profilometer | Profilometer: Veeco Dektak 3ST]]

===== Optical Characterization =====
* [[Digital Microscope Keyence VHX7000 | Digital Microscope and Camera: Keyence HVX-7000]]
* [[Fluorescence Microscope | Fluorescence Microscope: Olympus IX81]]
* [[Light Microscope with Spectroscopic Reflectometer | Light Microscope: Olympus BX51M with Filmetrics Spectroscopic Reflectometer]]
* [[Spectroscopic Ellipsometer | Spectroscopic Ellipsometer: Woolam M-2000]]

===== Sample Preparation for Microscopy =====
* [[Carbon Evaporator | Conductive thin film deposition: Leica EM ACE600 Carbon Evaporator & Metal Sputter Coater]]
* [[Tergeo Plus ICP- & CCP-RIE: Oxygen & Argon Plasma Cleaner | Oxygen & Argon Plasma Cleaner (Tergeo Plus ICP- & CCP-RIE) to remove hydrocarbons from surface]]


===== Stubs for specimen mounting =====
* Stubs used for mounting specimens are considered a personal, consumable item in the KNI. There are some stubs at each Microscope which can be used by any KNI microscopy user. You can also buy your own stubs so that you can keep them clean and available to you. There are many stub geometries and configurations. If you chose to buy your own stubs, please show them to the staff microscopist prior to using them: some stubs including stubs with copper clips have large height differences and can only be used safely in specific operating conditions.


== Wet Chemistry ==
===== Wet Chemistry Main page=====
* [[Wet Chemistry | Wet Chemistry page:]]
- Facilities Procedures & Safety

- List of Chemicals Supplied by KNI with Safety Data Sheets

- List of Chemicals Approved for use in the KNI cleanroom (not supplied by KNI) with Safety Data Sheets

- Requesting New Chemicals for use in the KNI cleanroom

===== Wet Chemistry Safety page=====
* [[Wet Chemistry Safety | Wet Chemistry Safety page]]
- PPE Overview

-Hazardous Waste Handling and Labeling

-Decanting Chemicals

-Hot Plate Rules

-KNI Buddy System

-Secondary Containment and Other Best Practices.

===== Wet Chemistry Resources page=====
* [[Wet Chemistry Resources | Wet Chemistry Resources page]]
- Contains fabrication recipes and procedures.

== Support Tools ==
===== Equipment Status =====

===== Thermal Processing =====
* [[Tube Furnaces for Wet & Dry Processing | Tube Furnaces: Tystar Tytan 1 & 2 (Wet & Dry Oxidation and Annealing)]]
* [[Rapid Thermal Processor | Rapid Thermal Processing: Solaris 150]]
===== Substrate Processing =====
* [[Scriber-Breaker | Scriber-Breaker: Dynatex GST-150]]

* [[Critical Point Dryer | Critical Point Dryer: Tousimis Automegasamdri 915B]]
===== Device Processing =====
* [[Wedge-Wedge Wire Bonder | Wedge-Wedge Wire Bonder: Westbond model 7476D-79]]
* [[Electrical Probing Station | Electrical Probing Station: Cascade Microtech M150]]
===== Metrology =====
* [[Profilometer: Keyence VK-X3000 | Profilometer: Keyence VK-X3000]]
* [[Dektak 3ST: Profilometer | Profilometer: Veeco Dektak 3ST]]
* [[Digital Microscope Keyence VHX7000 | Digital Microscope and Camera: Keyence HVX-7000]]
* [[Electrical Probing Station | Electrical Probing Station: Cascade Microtech M150]]
* [[Spectroscopic Ellipsometer | Spectroscopic Ellipsometer: Woolam M-2000]]
* [[Light Microscope with Spectroscopic Reflectometer | Light Microscope: Olympus BX51M with Filmetrics Spectroscopic Reflectometer]]
* Light Microscope Nikon L200 / Nikon Camera - [https://caltech.box.com/s/3sxmh6pt073a7qgpohgzjdl53acmr2ho Nikon L200/L200D Manual], [https://caltech.box.com/s/4fmfx7mazcdpjy0edqbgi4e1jbb7azdy Nikon L200 Operation Quick Reference]

===== Sample Preparation =====

* [[Carbon Evaporator | Carbon Evaporator (Leica EM ACE600) to make samples conductive]]
* [[Tergeo Plus ICP- & CCP-RIE: Oxygen & Argon Plasma Cleaner | Oxygen & Argon Plasma Cleaner (Tergeo Plus ICP- & CCP-RIE) to remove hydrocarbons from surface]]

Equipment List

2026-01-07T23:12:51Z

Tkimoto:

'''NOTE: For EQUIPMENT TRAINING, make a training request via FBS. See link to instructions:''' [[FBS Instructions | FBS Instructions]]

== Lithography ==
===== Electron Beam Lithography =====
* [[EBPG 5200: 100 kV Electron Beam Lithography | Electron Beam Pattern Generator: Raith EBPG 5200 (100 kV)]]
* [[EBPG 5000+: 100 kV Electron Beam Lithography | Electron Beam Pattern Generator: Raith EBPG 5000+ (100 kV)]]
* [[Quanta 200F: SEM, ESEM, Lithography & Probe Station | Nanometer Pattern Generation System: Thermo Fisher Quanta 200F SEM with NPGS (1-30 kV)]]

===== Ion Beam Lithography =====
* [[ORION NanoFab: Helium, Neon & Gallium FIB | He/Ne/Ga-FIB: Zeiss ORION NanoFab with Raith ELPHY MultiBeam Pattern Generator (5-40 kV He & Ne, 1-30 kV Ga)]]
===== Optical Lithography =====
* [[Contact Mask Aligners: MA6 & MA6/BA6 | Contact Mask Aligners: Suss MicroTec models MA6 & MA6/BA6]]
* [[Wafer Stepper | i-Line Wafer Stepper: GCA model 6300]]
* [[CNI-PV 2.1: Nano Imprint Lithography | Nano Imprint Lithography: NILT CNI-PV 2.1]]
* [[DWL-66: Direct-Write Laser System | Direct-Write Laser System: Heidelberg Instruments DWL-66]]
* [[Nanoscribe PPGT: Microscale 3D Printer | Two-Photon Lithography (aka Microscale 3D Printing): Nanoscribe Photonic Professional GT]]
* [[Optical Lithography Resources]]

== Deposition ==
===== Evaporation =====
* [[Labline: Electron Beam Evaporator | Metals (Al, Au, Pt & Ti): Kurt J Lesker Labline Electron Beam Evaporator]]

* [[Carbon Evaporator | Conductive thin film deposition: Leica EM ACE600 Carbon Evaporator & Metal Sputter Coater]]
* [[AJA Orion ATC Series Electron Beam Evaporator | Metals & Oxides: AJA Orion ATC Series Electron Beam Evaporator]]

===== Sputtering =====
* [[ATC Orion 8: Dielectric Sputter System | Dielectric Sputter System: AJA International ATC Orion 8]]
* [[ATC Orion 8: Chalcogenide Sputter System | Chalcogenide Sputter System: AJA International ATC Orion 8]]

===== Chemical Vapor Deposition (CVD) =====
* [[FlexAL II: Atomic Layer Deposition (ALD) | Atomic Layer Deposition (ALD): Oxford Instruments FlexAL II]]
* [[Plasma-Enhanced Chemical Vapor Deposition (PECVD) | Plasma-Enhanced Chemical Vapor Deposition (PECVD): Oxford Instruments System 100]]
===== Dielectric Packaging / Moisture Barrier =====
* [[Parylene Coater | Parylene Coater: Para Tech LabTop 3000]]

== Etching ==
===== Dry Etching =====
* [[DRIE: Bosch & Cryo ICP-RIE for Silicon | Silicon Etcher: Oxford Instruments DRIE System 100 Bosch & Cryo ICP-RIE]]
* [[ICP-RIE: III-V, Metal & Silicon Etcher | III-V Material, Metal & Silicon Etcher: Oxford Instruments System 100 ICP-RIE]]
* [[ICP-RIE: Dielectric Etcher | Dielectric Material Etcher: Oxford Instruments Dielectric System 100 ICP-RIE]]
* [[Dual Chamber RIE: Silicon, III-V Material & Organics Etcher | Silicon, III-V Material & Organics Etcher: Plasma-Therm Dual Chamber RIE]]
* [[Tergeo Plus ICP- & CCP-RIE: Oxygen & Argon Plasma Cleaner | Oxygen & Argon Plasma Cleaner: PIE Scientific Tergeo Plus ICP- & CCP-RIE]]
* [[XeF2 Etcher for Silicon | XeF2 Etcher for Silicon]]

===== Wet Etching =====
* [[Wet Chemistry | Available Wet Etching Techniques]]

== Microscopy ==
===== KNI Microscopy Policies =====
* [https://caltech.box.com/s/rpbtox8l31qi3kw3b014e3e8i4ctjpdy KNI Microscopy Policies]

===== Microscopy High Performance PC =====
*[[Information on the 3D reconstruction PC | Microscopy High Perfomance PC for 3D reconstruction and data processing]]

===== Guide to Choosing KNI SEMs & FIBs =====
*[[Guide to Choosing KNI SEMs & FIBs | Consult this guide for help in choosing the best SEMs and FIBs for your work]]

===== Focused Ion Beam (FIB) Systems =====
* [[ORION NanoFab: Helium, Neon & Gallium FIB | Helium, Neon & Gallium FIB: Zeiss ORION NanoFab]]
* [[Nova 600 NanoLab: SEM, Ga-FIB, GIS & Omniprobe | SEM, Ga-FIB, GIS & Omniprobe: Thermo Fisher Nova 600 NanoLab]]
===== Scanning Electron Microscopes (SEMs) =====

* [[Sirion: SEM & EDS | Sirion: SEM & EDS]]
* [[Quanta 200F: SEM, ESEM, Lithography & Probe Station | SEM, ESEM, Lithography & Probe Station: Thermo Fisher Quanta 200F]]
* [[Nova 600 NanoLab: SEM, Ga-FIB, GIS & Omniprobe|SEM, Ga-FIB, EDS, GIS & Omniprobe: Thermo Fisher Nova 600 NanoLab]]




===== Scanning Probe Microscopes =====
* [[Dimension Icon: Atomic Force Microscope (AFM) | Atomic Force Microscope (AFM): Bruker Dimension Icon]]
* [[Dektak 3ST: Profilometer | Profilometer: Veeco Dektak 3ST]]

===== Optical Characterization =====
* [[Digital Microscope Keyence VHX7000 | Digital Microscope and Camera: Keyence HVX-7000]]
* [[Fluorescence Microscope | Fluorescence Microscope: Olympus IX81]]
* [[Light Microscope with Spectroscopic Reflectometer | Light Microscope: Olympus BX51M with Filmetrics Spectroscopic Reflectometer]]
* [[Spectroscopic Ellipsometer | Spectroscopic Ellipsometer: Woolam M-2000]]

===== Sample Preparation for Microscopy =====
* [[Carbon Evaporator | Conductive thin film deposition: Leica EM ACE600 Carbon Evaporator & Metal Sputter Coater]]
* [[Tergeo Plus ICP- & CCP-RIE: Oxygen & Argon Plasma Cleaner | Oxygen & Argon Plasma Cleaner (Tergeo Plus ICP- & CCP-RIE) to remove hydrocarbons from surface]]


===== Stubs for specimen mounting =====
* Stubs used for mounting specimens are considered a personal, consumable item in the KNI. There are some stubs at each Microscope which can be used by any KNI microscopy user. You can also buy your own stubs so that you can keep them clean and available to you. There are many stub geometries and configurations. If you chose to buy your own stubs, please show them to the staff microscopist prior to using them: some stubs including stubs with copper clips have large height differences and can only be used safely in specific operating conditions.


== Wet Chemistry ==
===== Wet Chemistry Main page=====
* [[Wet Chemistry | Wet Chemistry page:]]
- Facilities Procedures & Safety

- List of Chemicals Supplied by KNI with Safety Data Sheets

- List of Chemicals Approved for use in the KNI cleanroom (not supplied by KNI) with Safety Data Sheets

- Requesting New Chemicals for use in the KNI cleanroom

===== Wet Chemistry Safety page=====
* [[Wet Chemistry Safety | Wet Chemistry Safety page]]
- PPE Overview

-Hazardous Waste Handling and Labeling

-Decanting Chemicals

-Hot Plate Rules

-KNI Buddy System

-Secondary Containment and Other Best Practices.

===== Wet Chemistry Resources page=====
* [[Wet Chemistry Resources | Wet Chemistry Resources page]]
- Contains fabrication recipes and procedures.

== Support Tools ==
===== Equipment Status =====

===== Thermal Processing =====
* [[Tube Furnaces for Wet & Dry Processing | Tube Furnaces: Tystar Tytan 1 & 2 (Wet & Dry Oxidation and Annealing)]]
* [[Rapid Thermal Processor | Rapid Thermal Processing: Solaris 150]]
===== Substrate Processing =====
* [[Scriber-Breaker | Scriber-Breaker: Dynatex GST-150]]

* [[Critical Point Dryer | Critical Point Dryer: Tousimis Automegasamdri 915B]]
===== Device Processing =====
* [[Wedge-Wedge Wire Bonder | Wedge-Wedge Wire Bonder: Westbond model 7476D-79]]
* [[Electrical Probing Station | Electrical Probing Station: Cascade Microtech M150]]
===== Metrology =====
* [[Keyence VK-X3000: Profilometer | Profilometer: Keyence VK-X3000]]
* [[Dektak 3ST: Profilometer | Profilometer: Veeco Dektak 3ST]]
* [[Digital Microscope Keyence VHX7000 | Digital Microscope and Camera: Keyence HVX-7000]]
* [[Electrical Probing Station | Electrical Probing Station: Cascade Microtech M150]]
* [[Spectroscopic Ellipsometer | Spectroscopic Ellipsometer: Woolam M-2000]]
* [[Light Microscope with Spectroscopic Reflectometer | Light Microscope: Olympus BX51M with Filmetrics Spectroscopic Reflectometer]]
* Light Microscope Nikon L200 / Nikon Camera - [https://caltech.box.com/s/3sxmh6pt073a7qgpohgzjdl53acmr2ho Nikon L200/L200D Manual], [https://caltech.box.com/s/4fmfx7mazcdpjy0edqbgi4e1jbb7azdy Nikon L200 Operation Quick Reference]

===== Sample Preparation =====

* [[Carbon Evaporator | Carbon Evaporator (Leica EM ACE600) to make samples conductive]]
* [[Tergeo Plus ICP- & CCP-RIE: Oxygen & Argon Plasma Cleaner | Oxygen & Argon Plasma Cleaner (Tergeo Plus ICP- & CCP-RIE) to remove hydrocarbons from surface]]

Profilometer: Keyence VK-X3000

2026-01-07T23:12:02Z

Tkimoto: Created page with "{{InstrumentInfoboxOneImage| |InstrumentName = Keyence VK-X3000 Profilometer |HeaderColor = #F5A81C |ImageOne = Dektak-3ST-Profilometer.jpg |ImageTwo = |InstrumentType = Metrology |RoomLocation = B235 Steele |LabPhone = 626-395-1539 |PrimaryStaff = Yonghwi Kim |StaffEmail = ykim@caltech.edu |StaffPhone = 626-395-5994 |Manufacturer = Keyence |Model = VK-X3000 |Techniques = Surface Profiling }} == Description == The Keyence VK-X3000 profil..."

{{InstrumentInfoboxOneImage|
|InstrumentName = Keyence VK-X3000 Profilometer
|HeaderColor = #F5A81C
|ImageOne = Dektak-3ST-Profilometer.jpg
|ImageTwo =
|InstrumentType = [[Equipment_List#Metrology|Metrology]]
|RoomLocation = B235 Steele
|LabPhone = 626-395-1539
|PrimaryStaff = [[Yonghwi Kim]]
|StaffEmail = ykim@caltech.edu
|StaffPhone = 626-395-5994
|Manufacturer = Keyence
|Model = VK-X3000
|Techniques = Surface Profiling
}}
== Description ==
The Keyence VK-X3000 profilometer is a stylus-type surface profiler. It is equipped with a camera for locating the region of interest, manual sample manipulation & tilt correction, and profile analysis software. It can be used to get a rough idea of the topography of features by scanning a single line across the surface. Features as small as 100 nm in height can be determined with some approximation.

===== Applications =====
* Surface Profiling

== Resources ==
===== SOPs =====
* [https://caltech.box.com/s/hdic8scc882tkrcjqsbaruqph9jgo75t KNI SOP]
* [https://caltech.box.com/s/j6br8jpkr7ov0k9dwx7wzyzt9f5fj3rt Dektak Operations Manual]
 
 

== Related Instrumentation in the KNI ==
===== Scanning Probe Microscopes =====
* [[Dimension Icon: Atomic Force Microscope (AFM) | Dimension Icon: Atomic Force Microscope (AFM)]]
* [[Dektak 3ST: Profilometer | Dektak 3ST: Profilometer]]

Usage Rates

2025-11-11T20:11:49Z

Tkimoto: /* Caltech & JPL User Rates */

'''Overview of KNI Lab User Fees''' 
''Rates below are valid beginning October 1, 2025 and are subject to change''

* Fees are incurred on a pay-as-you-go basis (tools are charged by the hour or portion thereof).
* Lab users do '''NOT''' incur lab fees during days or months of non-use.
*Invoices are issued monthly.

'''Note: New users must submit a [[Membership_Forms | New User Form]] and attend general KNI Lab safety training before lab access is granted.'''

==Caltech & JPL User Rates==
Below is a table of ''direct'' hourly rates for lab and equipment use in the KNI Laboratory. Hourly rates are applied to an individual's actual usage in the KNI Lab. Rates do '''not''' include any applicable indirect charges, such as F&A fees. F&A (overhead) will be applied separately based on the customer's PTA type. Rates are valid beginning October 1, 2025 and are subject to change.

{| class="wikitable" style="width: 90%;"
|-
! scope="col" style="text-align:left; width: 40%" |Tool Name
! scope="col" style="text-align:left; width: 40%" |Resource Area
! scope="col" style="text-align:center; width: 20%" |Hourly Rate
|-
! scope="col" style="text-align:left; background-color:#ffd8b4;" |General Lab
! scope="col" style="text-align:left; background-color:#ffe7d1;" |See details below
! scope="col" style="text-align:center; background-color:#FFFFFF;" |$43/hr
|-
! scope="col" style="text-align:left; background-color:#ffd8b4;" |Raith EBPG 5000+ and 5200 Electron Beam Writers
! scope="col" style="text-align:left; background-color:#ffe7d1;" |Electron Beam Lithography (EBL)
! scope="col" style="text-align:center; background-color:#FFFFFF;" |$130/hr
|-
! scope="col" style="text-align:left; background-color:#ffd8b4;" |FEI Nova 600 Dualbeam Focused Ion Beam
! scope="col" style="text-align:left; background-color:#ffe7d1;" | Microscopy, Focused Ion Beam (FIB)
! scope="col" style="text-align:center; background-color:#FFFFFF;" |$75/hr
|-
! scope="col" style="text-align:left; background-color:#ffd8b4;" |Oxford Cobra III-V ALE Etch System (TBA)
! scope="col" style="text-align:left; background-color:#ffe7d1;" |Deposition, Chemical Vapor
! scope="col" style="text-align:center; background-color:#FFFFFF;" |$60/hr
|-
! scope="col" style="text-align:left; background-color:#ffd8b4;" |Oxford PECVD "2" System (TBA)
! scope="col" style="text-align:left; background-color:#ffe7d1;" | Microscopy, Focused Ion Beam (FIB)
! scope="col" style="text-align:center; background-color:#FFFFFF;" |$60/hr
|-
! scope="col" style="text-align:left; background-color:#ffd8b4;" |Oxford FlexAl ALD/ALE System
! scope="col" style="text-align:left; background-color:#ffe7d1;" |Deposition, Chemical Vapor
! scope="col" style="text-align:center; background-color:#FFFFFF;" |$50/hr
|-
! scope="col" style="text-align:left; background-color:#ffd8b4;" |Oxford III-V Etch System
! scope="col" style="text-align:left; background-color:#ffe7d1;" | Microscopy, Focused Ion Beam (FIB)
! scope="col" style="text-align:center; background-color:#FFFFFF;" |$40/hr
|-
! scope="col" style="text-align:left; background-color:#ffd8b4;" |Oxford Dielectric Etch System
! scope="col" style="text-align:left; background-color:#ffe7d1;" | Microscopy, Focused Ion Beam (FIB)
! scope="col" style="text-align:center; background-color:#FFFFFF;" |$40/hr
|-
! scope="col" style="text-align:left; background-color:#ffd8b4;" |Oxford DRIE Etch System
! scope="col" style="text-align:left; background-color:#ffe7d1;" | Microscopy, Focused Ion Beam (FIB)
! scope="col" style="text-align:center; background-color:#FFFFFF;" |$40/hr
|-
! scope="col" style="text-align:left; background-color:#ffd8b4;" |Oxford PECVD System (legacy)
! scope="col" style="text-align:left; background-color:#ffe7d1;" | Microscopy, Focused Ion Beam (FIB)
! scope="col" style="text-align:center; background-color:#FFFFFF;" |$40/hr
|-
! scope="col" style="text-align:left; background-color:#ffd8b4;" |Nanoscribe PPGT
! scope="col" style="text-align:left; background-color:#ffe7d1;" | 2D/3D Print
! scope="col" style="text-align:center; background-color:#FFFFFF;" |$5/hr
|}

'''Academic Discount on General Cleanroom Usage'''

A 50% discount will be applied to the General Cleanroom rate for any cleanroom usage accrued ''after'' 40 hours per calendar month. The discounted hourly rate, $21.50, is only applied to the hours that exceed 40 in a given month.

Example: A user logs 50 hours in the cleanroom during the month of October. Their invoice will be: (40 x $43) + (10 x $21.50) = $1,935

'''General Lab use is counted as time in the KNI cleanroom facility. It includes access to:'''
*Atomic Force Microscope
*Critical Point Dryer
*Electron Beam Evaporators
*Laser Interference Lithography System
*He-Ne-Ga Ion Microscope (Orion Nanofab)
*Mask Aligners
*Parylene Coater
*Profilometer
*Rapid Thermal Processor
*Scanning Electron Microscopes (Quanta, Sirion)
*Scriber Breaker
*Spectroscopic Ellipsometer
*Tube Furnaces (Wet, Dry Oxide + Annealing)
*Wafer Stepper
*Wet Chemistry Room/general supplies
*Wire Bonder
*XeF2 Silicon Etcher
*Other tools not listed in the table above

'''Miscellaneous Rates'''
* Precious Metal (gold, platinum, etc.) usage will be billed the market rate, per gram.Staff-approved full service work is $100/hr.

==Full-Service Work Requests ==
KNI lab members and non-lab members can submit a request for full-service work performed by KNI technical staff using KNI equipment. The project will incur costs based on the actual usage of equipment (refer to rates above), as well as charges for the following:
{| class="wikitable"
|Fees
|Price
|-
|Technical Staff Effort (hourly)
|$ 100.00
|-
|Equipment Hourly Use Fees (see pricing list above)
|$ varies
|-
|Administrative Fee (per transaction)
|$ 100.00
|}
'''To submit a request for full-service work''', contact the technical staff member in charge of the equipment you are interested in using, or send an email to [mailto:kni@caltech.edu kni@caltech.edu]. Requests will be reviewed and selected based on staff availability, agreement of scope, and turnaround timeline. A PTA must be provided in advance in order for work to begin. KNI offers no guarantees for the end product.

'''Note:''' The rates above are the direct costs. Overhead fees will be applied.

==Overhead/Indirect Cost Rate ==
The KNI Lab charges for Non-Caltech Academic, Government, and Corporate KNI lab members are subject to Caltech's F&A (indirect/"overhead") rate. The F&A rate for fiscal year 2026 is 70%.
Internal (Caltech and JPL) users will also have overhead applied to their charges. The overhead is accounted for in the back end of the internal charging process and the overhead rate is dependent on the PTA used to pay for the KNI Lab fees. If you have questions about this, please discuss with your grants manager.

==External/Corporate Memberships==

The KNI Lab is open to external academic, government, industry, and startup organizations. Rates for industry and startups differ from the posted rates (above) for our internal academic users. All external users will be billed for Caltech's fiscal year overhead rate.

For information on the KNI external lab membership plan, please send an email to [mailto:tkimoto@caltech.edu tkimoto@caltech.edu] with details regarding 1) the number of people looking to join as KNI lab members, 2) equipment needs, 3) anticipated start date, and 4) information about the company. Startup companies may qualify for limited-term reduced rates.

'''Additional paperwork is required, including a Facilities Use Agreement, certificate of liability insurance that meets Caltech requirements, a purchase order, and an External Affiliate appointment.''' This process can take up to a few weeks, and all steps must be completed before an external user is able to start in the KNI Lab.

Usage Rates

2025-10-24T16:20:09Z

Tkimoto:

'''Overview of KNI Lab User Fees''' 
''Rates below are valid beginning October 1, 2025 and are subject to change''

* Fees are incurred on a pay-as-you-go basis (tools are charged by the hour or portion thereof).
* Lab users do '''NOT''' incur lab fees during days or months of non-use.
*Invoices are issued monthly.

'''Note: New users must submit a [[Membership_Forms | New User Form]] and attend general KNI Lab safety training before lab access is granted.'''

==Caltech & JPL User Rates==
Below is a table of ''direct'' hourly rates for lab and equipment use in the KNI Laboratory. Hourly rates are applied to an individual's actual usage in the KNI Lab. Rates do '''not''' include any applicable indirect charges, such as F&A fees. F&A (overhead) will be applied separately based on the customer's PTA type. Rates are valid beginning October 1, 2025 and are subject to change.

{| class="wikitable" style="width: 90%;"
|-
! scope="col" style="text-align:left; width: 40%" |Tool Name
! scope="col" style="text-align:left; width: 40%" |Resource Area
! scope="col" style="text-align:center; width: 20%" |Hourly Rate
|-
! scope="col" style="text-align:left; background-color:#ffd8b4;" |General Lab
! scope="col" style="text-align:left; background-color:#ffe7d1;" |See details below
! scope="col" style="text-align:center; background-color:#FFFFFF;" |$43/hr
|-
! scope="col" style="text-align:left; background-color:#ffd8b4;" |Raith EBPG 5000+ and 5200 Electron Beam Writers
! scope="col" style="text-align:left; background-color:#ffe7d1;" |Electron Beam Lithography (EBL)
! scope="col" style="text-align:center; background-color:#FFFFFF;" |$130/hr
|-
! scope="col" style="text-align:left; background-color:#ffd8b4;" |FEI Nova 600 Dualbeam Focused Ion Beam
! scope="col" style="text-align:left; background-color:#ffe7d1;" | Microscopy, Focused Ion Beam (FIB)
! scope="col" style="text-align:center; background-color:#FFFFFF;" |$75/hr
|-
! scope="col" style="text-align:left; background-color:#ffd8b4;" |Oxford Cobra III-V ALE Etch System (TBA)
! scope="col" style="text-align:left; background-color:#ffe7d1;" |Deposition, Chemical Vapor
! scope="col" style="text-align:center; background-color:#FFFFFF;" |$60/hr
|-
! scope="col" style="text-align:left; background-color:#ffd8b4;" |Oxford PECVD "2" System (TBA)
! scope="col" style="text-align:left; background-color:#ffe7d1;" | Microscopy, Focused Ion Beam (FIB)
! scope="col" style="text-align:center; background-color:#FFFFFF;" |$60/hr
|-
! scope="col" style="text-align:left; background-color:#ffd8b4;" |Oxford FlexAl ALD/ALE System
! scope="col" style="text-align:left; background-color:#ffe7d1;" |Deposition, Chemical Vapor
! scope="col" style="text-align:center; background-color:#FFFFFF;" |$40/hr
|-
! scope="col" style="text-align:left; background-color:#ffd8b4;" |Oxford III-V Etch System
! scope="col" style="text-align:left; background-color:#ffe7d1;" | Microscopy, Focused Ion Beam (FIB)
! scope="col" style="text-align:center; background-color:#FFFFFF;" |$40/hr
|-
! scope="col" style="text-align:left; background-color:#ffd8b4;" |Oxford Dielectric Etch System
! scope="col" style="text-align:left; background-color:#ffe7d1;" | Microscopy, Focused Ion Beam (FIB)
! scope="col" style="text-align:center; background-color:#FFFFFF;" |$40/hr
|-
! scope="col" style="text-align:left; background-color:#ffd8b4;" |Oxford DRIE Etch System
! scope="col" style="text-align:left; background-color:#ffe7d1;" | Microscopy, Focused Ion Beam (FIB)
! scope="col" style="text-align:center; background-color:#FFFFFF;" |$40/hr
|-
! scope="col" style="text-align:left; background-color:#ffd8b4;" |Oxford PECVD System (legacy)
! scope="col" style="text-align:left; background-color:#ffe7d1;" | Microscopy, Focused Ion Beam (FIB)
! scope="col" style="text-align:center; background-color:#FFFFFF;" |$40/hr
|-
! scope="col" style="text-align:left; background-color:#ffd8b4;" |Nanoscribe PPGT
! scope="col" style="text-align:left; background-color:#ffe7d1;" | 2D/3D Print
! scope="col" style="text-align:center; background-color:#FFFFFF;" |$5/hr
|}

'''Academic Discount on General Cleanroom Usage'''

A 50% discount will be applied to the General Cleanroom rate for any cleanroom usage accrued ''after'' 40 hours per calendar month. The discounted hourly rate, $21.50, is only applied to the hours that exceed 40 in a given month.

Example: A user logs 50 hours in the cleanroom during the month of October. Their invoice will be: (40 x $43) + (10 x $21.50) = $1,935

'''General Lab use is counted as time in the KNI cleanroom facility. It includes access to:'''
*Atomic Force Microscope
*Critical Point Dryer
*Electron Beam Evaporators
*Laser Interference Lithography System
*He-Ne-Ga Ion Microscope (Orion Nanofab)
*Mask Aligners
*Parylene Coater
*Profilometer
*Rapid Thermal Processor
*Scanning Electron Microscopes (Quanta, Sirion)
*Scriber Breaker
*Spectroscopic Ellipsometer
*Tube Furnaces (Wet, Dry Oxide + Annealing)
*Wafer Stepper
*Wet Chemistry Room/general supplies
*Wire Bonder
*XeF2 Silicon Etcher
*Other tools not listed in the table above

'''Miscellaneous Rates'''
* Precious Metal (gold, platinum, etc.) usage will be billed the market rate, per gram.Staff-approved full service work is $100/hr.

==Full-Service Work Requests ==
KNI lab members and non-lab members can submit a request for full-service work performed by KNI technical staff using KNI equipment. The project will incur costs based on the actual usage of equipment (refer to rates above), as well as charges for the following:
{| class="wikitable"
|Fees
|Price
|-
|Technical Staff Effort (hourly)
|$ 100.00
|-
|Equipment Hourly Use Fees (see pricing list above)
|$ varies
|-
|Administrative Fee (per transaction)
|$ 100.00
|}
'''To submit a request for full-service work''', contact the technical staff member in charge of the equipment you are interested in using, or send an email to [mailto:kni@caltech.edu kni@caltech.edu]. Requests will be reviewed and selected based on staff availability, agreement of scope, and turnaround timeline. A PTA must be provided in advance in order for work to begin. KNI offers no guarantees for the end product.

'''Note:''' The rates above are the direct costs. Overhead fees will be applied.

==Overhead/Indirect Cost Rate ==
The KNI Lab charges for Non-Caltech Academic, Government, and Corporate KNI lab members are subject to Caltech's F&A (indirect/"overhead") rate. The F&A rate for fiscal year 2026 is 70%.
Internal (Caltech and JPL) users will also have overhead applied to their charges. The overhead is accounted for in the back end of the internal charging process and the overhead rate is dependent on the PTA used to pay for the KNI Lab fees. If you have questions about this, please discuss with your grants manager.

==External/Corporate Memberships==

The KNI Lab is open to external academic, government, industry, and startup organizations. Rates for industry and startups differ from the posted rates (above) for our internal academic users. All external users will be billed for Caltech's fiscal year overhead rate.

For information on the KNI external lab membership plan, please send an email to [mailto:tkimoto@caltech.edu tkimoto@caltech.edu] with details regarding 1) the number of people looking to join as KNI lab members, 2) equipment needs, 3) anticipated start date, and 4) information about the company. Startup companies may qualify for limited-term reduced rates.

'''Additional paperwork is required, including a Facilities Use Agreement, certificate of liability insurance that meets Caltech requirements, a purchase order, and an External Affiliate appointment.''' This process can take up to a few weeks, and all steps must be completed before an external user is able to start in the KNI Lab.

Carbon Evaporator

2025-10-21T23:35:26Z

Tkimoto:

{{InstrumentInfoboxOneImage|
|InstrumentName = Carbon Evaporator
|HeaderColor = #F2682A
|ImageOne = EM-ACE600-Carbon-Evaporator.jpg
|ImageTwo = EM-ACE600-Carbon-Evaporator.jpg
|InstrumentType = [[Equipment_List#Deposition|Deposition]], [[Equipment_List#Sample_Preparation_for_Microscopy|Sample Prep for Microscopy]]
|RoomLocation = B233 Steele
|LabPhone = 626-395-5885
|PrimaryStaff = [[Yonghwi Kim]]
|StaffEmail = ykim@caltech.edu
|StaffPhone = 626-395-5994
|Manufacturer = Leica
|Model = EM ACE600
|Techniques = Carbon Deposition and Gold Sputtering
|EmailList = kni-sem-fib
|EmailListName = SEM-FIB
}}
== Description ==
For non-conductive specimens that cannot be effectively SEM- or FIB-imaged with some combination of low voltage, low current, zero detector bias, and scanning filters, depositing a thin (e.g. 2-10 nm), conductive layer of carbon on the surface can help. This carbon evaporator produces amorphous, conductive films, the morphology of which is not detectable in an SEM or FIB image. After imaging is complete, the carbon can be gently removed with an O2 plasma using, for example, the lab's [[Tergeo Plus ICP- & CCP-RIE: Oxygen & Argon Plasma Cleaner | Tergeo Plus Plasma Cleaner]].
===== Applications =====
* Coat material surface to make sample conductive for use in an SEM or FIB
* Coat resist surface to make sample conductive for use with e-beam lithography
* Apply carbon to a specimen or device for any other fabrication use

== Resources ==
===== Equipment Data =====

[[Image:Carbon-Evaporator-Source-Thread.jpg|thumb|top|upright=0.9|The Carbon Evaporator source needs to be periodically disconnected from the instrument by the user so that the carbon thread can be changed; see the SOP and notes in the SOP section on this page for instructions on how to change the thread]]

===== SOP & Troubleshooting =====
* [https://caltech.box.com/s/1l8kxgkiti1kgmvysl2tpu68r1desi8m SOP & Troubleshooting Guide]
* The procedure to install a new carbon thread can be found on [https://www.manualslib.com/manual/1525180/Leica-Em-Ace600.html?page=43#manual Page 39 of the Operating Manual]
** Note: always install as a "double thread," i.e. double the thread back over itself before installing – a thread length that is approximately twice the length of the evaporator's door width is long enough to double over and install.

===== Video =====
* [https://www.youtube.com/watch?v=Qj3Y-WfNbvM Leica's Product Overview Video]

===== Technical Notes =====
* [https://www.leica-microsystems.com/products/sample-preparation-for-electron-microscopy/p/leica-em-ace600/downloads/ Technical Notes Provided by Leica]
===== Manufacturer Manual =====
* [https://caltech.box.com/s/xx5psvz8u0jqszdqhh44fd5xkxmhz4a6 Operating Manual]

== Specifications ==
===== Manufacturer Specifications =====
* [https://www.leica-microsystems.com/fileadmin/downloads/Leica%20EM%20ACE600/Brochures/EMACECoaters_Brochure_09_17_EN.pdf Manufacturer Product Guide]

===== Carbon Evaporation Specifications =====
* Average Deposition Rate: ~1 nm per pulse, when using a double thread (i.e. a thread that is doubled over on itself; see notes in SOP section above)
* Monitor deposition thickness using the quartz crystal thickness monitor, or simply program the number of pulses that you want
 
 
== Related Instrumentation in the KNI ==
===== Sample Preparation for Microscopy =====
* [[Tergeo Plus ICP- & CCP-RIE: Oxygen & Argon Plasma Cleaner | Oxygen & Argon Plasma Cleaner (Tergeo Plus ICP- & CCP-RIE) to remove hydrocarbons from surface]]
* [[Carbon Evaporator | Carbon Evaporator (Leica EM ACE600) to make samples conductive]]
* [[TEM Sample Preparation Equipment | TEM Sample Preparation Equipment: Polishing Stations, 3 mm Disk Cutter, Dimpler, Argon Ion Mill]]
===== Scanning Electron & Ion Microscopes =====
* [[Nova 600 NanoLab: SEM, Ga-FIB, GIS & Omniprobe|Nova 600 NanoLab: SEM, Ga-FIB, GIS & Omniprobe]]
* [[Nova 200 NanoLab: SEM, EDS & WDS | Nova 200 NanoLab: SEM, EDS & WDS]]
* [[Sirion: SEM & EDS | Sirion: SEM & EDS]]
* [[Quanta 200F: SEM, ESEM, Lithography & Probe Station | Quanta 200F: SEM, ESEM, Lithography & Probe Station]]
* [[ORION NanoFab: Helium, Neon & Gallium FIB | ORION NanoFab: Helium, Neon & Gallium FIB]]